Abstract: A radio frequency generator system for plasma excitation for a plasma process includes a signal generator unit configured to generate at least three radio frequency signals having different frequencies. The system also includes a broadband amplifier stage configured to amplify the radio frequency signals to output amplified radio frequency signals at an amplifier stage output of the amplifier stage. The system further includes a matching network that is configured to set a predefined impedance for the amplifier stage output of the amplifier stage, the impedance between the amplifier stage output and the matching network being different than (e.g., not equal to) 50 ohms. The system also includes a plasma process impedance acquisition unit configured to acquire a complex-valued impedance of the plasma process, and a control unit configured to control the signal generator unit, the amplifier stage, and/or the matching network based on the acquired complex-valued impedance.

Abstract: The invention relates to a broadband high power amplifier that comprises a signal input adapted to receive an input signal, at least one amplifier stage adapted to amplify the received input signal, a signal output adapted to output the signal amplified by the at least one amplifier stage as an output signal, a monitoring unit adapted to monitor signal characteristics of the input signal and the output signal and a control unit adapted to operate the at least one amplifier stage at an optimal operating point depending on the current signal characteristics monitored by said monitoring unit.

Abstract: The invention relates to a broadband high power amplifier that comprises a signal input adapted to receive an input signal, at least one amplifier stage adapted to amplify the received input signal, a signal output adapted to output the signal amplified by the at least one amplifier stage as an output signal, a monitoring unit adapted to monitor signal characteristics of the input signal and the output signal and a control unit adapted to operate the at least one amplifier stage at an optimal operating point depending on the current signal characteristics monitored by said monitoring unit.