Patents by Inventor Won-Bong Baek
Won-Bong Baek has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240021627Abstract: A display device includes a substrate having a first surface in which a light-emitting element is disposed, a second surface, and a first lateral side; a connecting electrode disposed on the first surface; a first insulating layer disposed on the connecting electrode and including a contact hole; a first upper pad electrode electrically connected to the connecting electrode, the first upper pad electrode having a first thickness in an area not overlapping the contact hole and having a second thickness in an area overlapping the contact hole; a second upper pad electrode disposed on the first upper pad electrode and having a substantially flat profile; a lower pad disposed on the second surface of the substrate; and a side wiring electrically connecting the second upper pad electrode and the lower pad, the side wiring surrounding the first surface, the first lateral side, and the second surface of the substrate.Type: ApplicationFiled: April 14, 2023Publication date: January 18, 2024Applicant: Samsung Display Co., LTD.Inventors: Ki Hyun KIM, Young Gil PARK, Won Bong BAEK, Young Uook LEE
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Publication number: 20230326932Abstract: A display device includes, a substrate including a first surface and a second surface opposite to the first surface; a light emitting element on the first surface of the substrate; a top surface pad on the first surface of the substrate and spaced from the light emitting element; a driving circuit on the second surface of the substrate to apply a driving signal for driving the light emitting element; a top surface connection line between the first surface of the substrate and the top surface pad to electrically connect the top surface pad to the light emitting element; an interlayer insulating layer between the top surface connection line and the top surface pad; and a side wiring on the top surface pad to connect the top surface pad to the driving circuit.Type: ApplicationFiled: March 15, 2023Publication date: October 12, 2023Inventors: Yong Duck SON, Won Bong BAEK, Sang Woo AN, Kye Uk LEE, Won Ho JANG, Nak Cho CHOI
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Patent number: 9034156Abstract: Provided is a sputtering apparatus which deposits a metal catalyst on an amorphous silicon layer at an extremely low concentration in order to crystallize amorphous silicon, and particularly minimizes non-uniformity of the metal catalyst caused by a pre-sputtering process without reducing process efficiency. This sputtering apparatus improves the uniformity of the metal catalyst deposited on the amorphous silicon layer at an extremely low concentration. The sputtering apparatus includes a process chamber having first and second regions, a metal target located inside the process chamber, a target transfer unit moving the metal target and having a first shield for controlling a traveling direction of a metal catalyst discharged from the metal target, and a substrate holder disposed in the second region to be capable of facing the metal target.Type: GrantFiled: November 17, 2010Date of Patent: May 19, 2015Assignee: Samsung Display Co., Ltd.Inventors: Tae-Hoon Yang, Ki-Yong Lee, Jin-Wook Seo, Byoung-Keon Park, Yun-Mo Chung, Dong-Hyun Lee, Kil-Won Lee, Jae-Wan Jung, Jong-Ryuk Park, Bo-Kyung Choi, Won-Bong Baek, Byung-Soo So, Jong-Won Hong, Min-Jae Jeong, Heung-Yeol Na, Ivan Maidanchuk, Eu-Gene Kang, Seok-Rak Chang
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Patent number: 8992749Abstract: Provided is a sputtering apparatus which deposits a metal catalyst on an amorphous silicon layer at an extremely low concentration in order to crystallize amorphous silicon, and particularly minimizes non-uniformity of the metal catalyst caused by a pre-sputtering process without reducing process efficiency. This sputtering apparatus improves the uniformity of the metal catalyst deposited on the amorphous silicon layer at an extremely low concentration. The sputtering apparatus includes a process chamber having first and second regions, a metal target located inside the process chamber, a target transfer unit moving the metal target and having a first shield for controlling a traveling direction of a metal catalyst discharged from the metal target, and a substrate holder disposed in the second region to be capable of facing the metal target.Type: GrantFiled: November 17, 2010Date of Patent: March 31, 2015Assignee: Samsung Display Co., Ltd.Inventors: Tae-Hoon Yang, Ki-Yong Lee, Jin-Wook Seo, Byoung-Keon Park, Yun-Mo Chung, Dong-Hyun Lee, Kil-Won Lee, Jae-Wan Jung, Jong-Ryuk Park, Bo-Kyung Choi, Won-Bong Baek, Byung-Soo So, Jong-Won Hong, Min-Jae Jeong, Heung-Yeol Na, Ivan Maidanchuk, Eu-Gene Kang, Seok-Rak Chang
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Patent number: 8894768Abstract: A substrate processing apparatus that simultaneously forms thin films on a plurality of substrates and performs heat treatment includes: a plurality of substrate holders, each including a substrate support that supports a substrate and a first gas pipe having one or a plurality of injection holes; a boat where the plurality of substrate holders are stacked and including a second gas pipe connected with the first gas pipe of each of the substrate holders; a process chamber providing a space in which the substrates stacked in the boat are processed; a conveying unit that carries the boat into/out of the process chamber; a first heating unit disposed outside the process chamber; and a gas supply unit including a third gas pipe connected with the second gas pipe and supplying a heated or cooled gas into the second gas pipe.Type: GrantFiled: January 6, 2011Date of Patent: November 25, 2014Assignee: Samsung Display Co., Ltd.Inventors: Byoung-Keon Park, Ki-Yong Lee, Jin-Wook Seo, Min-Jae Jeong, Jong-Won Hong, Heung-Yeol Na, Tae-Hoon Yang, Yun-Mo Chung, Eu-Gene Kang, Seok-Rak Chang, Dong-Hyun Lee, Kil-Won Lee, Jong-Ryuk Park, Bo-Kyung Choi, Won-Bong Baek, Ivan Maidanchuk, Byung-Soo So, Jae-Wan Jung
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Patent number: 8890067Abstract: An inspection system using a scanning electron microscope includes a scanning electron microscope chamber inspecting an object to be inspected by using an electron beam and maintaining a vacuum condition, a stage positioned below the scanning electron microscope chamber to be separated therefrom and mounted with the object to be inspected, and a transverse guide transferring the scanning electron microscope chamber on the stage. Atmospheric conditions are maintained between the scanning electron microscope chamber and the object to be inspected. Accordingly, object to be inspected a large size of an object to be inspected may be inspected without damage to the object to be inspected such that a cost reduction and a yield improvement may be realized.Type: GrantFiled: May 30, 2013Date of Patent: November 18, 2014Assignee: Samsung Display Co., Ltd.Inventors: Young-Gil Park, Won-Bong Baek, Ki-Won Oh
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Publication number: 20140308445Abstract: A deposition apparatus, and a canister for the deposition apparatus capable of maintaining a predetermined amount of source material contained in a reactive gas supplied to a deposition chamber when the source material is deposited on a substrate by atomic layer deposition includes a main body, a source storage configured to store a source material, a heater disposed outside the main body, and a first feed controller configured to control the source material supplied to the main body from the source storage.Type: ApplicationFiled: June 27, 2014Publication date: October 16, 2014Inventors: Heung-Yeol Na, Ki-Yong Lee, Jin-Wook Seo, Min-Jae Jeong, Jong-Won Hong, Eu-Gene Kang, Seok-Rak Chang, Tae-Hoon Yang, Yun-Mo Chung, Byung-Soo So, Byoung-Keon Park, Ivan Maidanchuk, Dong-Hyun Lee, Kii-Won Lee, Won-Bong Baek, Jong-Ryuk Park, Bo-Kyung Choi, Jae-Wan Jung
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Patent number: 8771420Abstract: A substrate processing apparatus that forms thin films on a plurality of substrates and thermally processes the substrates, by uniformly heating the substrates. The substrate processing apparatus includes a processing chamber, a boat in which substrates are stacked, an external heater located outside of the processing chamber, a feeder to move the boat into and out of the processing chamber, a lower heater located below the feeder, and a central heater located in the center of the boat.Type: GrantFiled: February 26, 2010Date of Patent: July 8, 2014Assignee: Samsung Display Co., Ltd.Inventors: Heung-Yeol Na, Ki-Yong Lee, Jin-Wook Seo, Min-Jae Jeong, Jong-Won Hong, Eu-Gene Kang, Seok-Rak Chang, Yun-Mo Chung, Tae-Hoon Yang, Byung-Soo So, Byoung-Keon Park, Dong-Hyun Lee, Kil-Won Lee, Jong-Ryuk Park, Bo-Kyung Choi, Ivan Maidanchuk, Won-Bong Baek, Jae-Wan Jung
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Publication number: 20130320211Abstract: An inspection system using a scanning electron microscope includes a scanning electron microscope chamber inspecting an object to be inspected by using an electron beam and maintaining a vacuum condition, a stage positioned below the scanning electron microscope chamber to be separated therefrom and mounted with the object to be inspected, and a transverse guide transferring the scanning electron microscope chamber on the stage. Atmospheric conditions are maintained between the scanning electron microscope chamber and the object to be inspected. Accordingly, object to be inspected a large size of an object to be inspected may be inspected without damage to the object to be inspected such that a cost reduction and a yield improvement may be realized.Type: ApplicationFiled: May 30, 2013Publication date: December 5, 2013Inventors: Young-Gil Park, Won-Bong Baek, Ki-Won Oh
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Patent number: 8373097Abstract: An apparatus for thermally processing a plurality of substrates including a process chamber into which a boat having a plurality of substrates stacked thereon is loaded, and a heater chamber separate from the process chamber and having a plurality of heaters to apply heat to the process chamber. Here, the heaters are installed to correspond to all sides of the plurality of substrates. Therefore, it is possible to minimize a temperature distribution in the process chamber and uniformly supply heat to the entire region of the plurality of substrates.Type: GrantFiled: February 26, 2010Date of Patent: February 12, 2013Assignee: Samsung Display Co., Ltd.Inventors: Heung-Yeol Na, Min-Jae Jeong, Jong-Won Hong, Eu-Gene Kang, Seok-Rak Chang, Ki-Yong Lee, Jin-Wook Seo, Tae-Hoon Yang, Yun-Mo Chung, Byung-Soo So, Byoung-Keon Park, Dong-Hyun Lee, Kil-Won Lee, Won-Bong Baek, Jong-Ryuk Park, Bo-Kyung Choi, Ivan Maidanchuk, Jae-Wan Jung
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Publication number: 20120000425Abstract: A substrate processing apparatus that simultaneously forms thin films on a plurality of substrates and performs heat treatment includes: a plurality of substrate holders, each including a substrate support that supports a substrate and a first gas pipe having one or a plurality of injection holes; a boat where the plurality of substrate holders are stacked and including a second gas pipe connected with the first gas pipe of each of the substrate holders; a process chamber providing a space in which the substrates stacked in the boat are processed; a conveying unit that carries the boat into/out of the process chamber; a first heating unit disposed outside the process chamber; and a gas supply unit including a third gas pipe connected with the second gas pipe and supplying a heated or cooled gas into the second gas pipe.Type: ApplicationFiled: January 6, 2011Publication date: January 5, 2012Applicant: Samsung Mobile Display Co., Ltd.Inventors: Byoung-Keon Park, Ki-Yong Lee, Jin-Wook Seo, Min-Jae Jeong, Jong-Won Hong, Heung-Yeol Na, Tae-Hoon Yang, Yun-Mo Chung, Eu-Gene Kang, Seok-Rak Chang, Dong-Hyun Lee, Kil-Won Lee, Jong-Ryuk Park, Bo-Kyung Choi, Won-Bong Baek, Ivan Maidanchuk, Byung-Soo So, Jae-Wan Jung
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Publication number: 20120000986Abstract: A canister for a deposition apparatus and a deposition apparatus using the same, and more particularly, a canister for a deposition apparatus that can provide a uniform amount of source material contained in a reaction gas supplied into a deposition chamber and improve safety in the supply of the source material, and a deposition apparatus using the canister. The deposition apparatus includes a deposition chamber; a canister supplying a reaction gas into the deposition chamber; and a carrier gas supplier for supplying a carrier gas into the canister, in which the canister includes a main body, a heating unit heating the main body and a temperature measuring unit disposed under the main body.Type: ApplicationFiled: January 19, 2011Publication date: January 5, 2012Applicant: Samsung Mobile Display Co., LtdInventors: Min-Jae JEONG, Ki-Yong Lee, Jong-Won Hong, Heung-Yeol Na, Eu-Gene Kang, Seok-Rak Chang, Jin-Wook Seo, Tae-Hoon Yang, Yun-Mo Chung, Byung-Soo Soo, Byoung-Keon Park, Dong-Hyun Lee, Kil-Won Lee, Won-Bong Baek, Jong-Ryuk Park, Bo-Kyung Choi, Ivan Maidanchuk, Jae-Wan Jung
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Publication number: 20110120859Abstract: Provided is a sputtering apparatus which deposits a metal catalyst on an amorphous silicon layer at an extremely low concentration in order to crystallize amorphous silicon, and particularly minimizes non-uniformity of the metal catalyst caused by a pre-sputtering process without reducing process efficiency. This sputtering apparatus improves the uniformity of the metal catalyst deposited on the amorphous silicon layer at an extremely low concentration. The sputtering apparatus includes a process chamber having first and second regions, a metal target located inside the process chamber, a target transfer unit moving the metal target and having a first shield for controlling a traveling direction of a metal catalyst discharged from the metal target, and a substrate holder disposed in the second region to be capable of facing the metal target.Type: ApplicationFiled: November 17, 2010Publication date: May 26, 2011Applicant: SAMSUNG MOBILE DISPLAY CO., LTD.Inventors: Tae-Hoon Yang, Ki-Yong Lee, Jin-Wook Seo, Byoung-Keon Park, Yun-Mo Chung, Dong-Hyun Lee, Kil-Won Lee, Jae-Wan Jung, Jong-Ryuk Park, Bo-Kyung Choi, Won-Bong Baek, Byung-Soo So, Jong-Won Hong, Min-Jae Jeong, Heung-Yeol Na, Ivan Maidanchuk, Eu-Gene Kang, Seok-Rak Chang
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Publication number: 20110100973Abstract: An apparatus for thermally processing a plurality of substrates including a process chamber into which a boat having a plurality of substrates stacked thereon is loaded, and a heater chamber separate from the process chamber and having a plurality of heaters to apply heat to the process chamber. Here, the heaters are installed to correspond to all sides of the plurality of substrates. Therefore, it is possible to minimize a temperature distribution in the process chamber and uniformly supply heat to the entire region of the plurality of substrates.Type: ApplicationFiled: February 26, 2010Publication date: May 5, 2011Applicant: Samsung Mobile Display Co., Ltd.Inventors: Heung-Yeol NA, Min-Jae Jeong, Jong-Won Hong, Eu-Gene Kang, Seok-Rak Chang, Ki-Yong Lee, Jin-Wook Seo, Tae-Hoon Yang, Yun-Mo Chung, Byung-Soo So, Byoung-Keon Park, Dong-Hyun Lee, Kil-Won Lee, Won-Bong Baek, Jong-Ryuk Park, Bo-Kyung Choi, Ivan Maidanchuk, Jae-Wan Jung
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Publication number: 20110083960Abstract: A sputtering apparatus that is capable of uniformly depositing an ultra-low concentration metal catalyst on a substrate having an amorphous silicon layer in order to crystallize the amorphous silicon layer. The sputtering apparatus includes a process chamber, a metal target located inside the process chamber, a substrate holder located opposite the metal target, and a vacuum pump connected with an exhaust pipe of the process chamber. An area of the metal target is more than 1.3 times an area of a substrate placed on the substrate holder.Type: ApplicationFiled: October 12, 2010Publication date: April 14, 2011Applicant: SAMSUNG MOBILE DISPLAY CO., LTD.Inventors: TAE-HOON YANG, KI-YONG LEE, JIN-WOOK SEO, BYOUNG-KEON PARK, YUN-MO CHUNG, DONG-HYUN LEE, KIL-WON LEE, JAE-WAN JUNG, JONG-RYUK PARK, BO-KYUNG CHOI, WON-BONG BAEK, BYUNG-SOO SO, JONG-WON HONG, MIN-JAE JEONG, HEUNG-YEOL NA, IVAN MAIDANCHUK, EU-GENE KANG, SEOK-RAK CHANG
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Publication number: 20110041767Abstract: A metal capturing apparatus and an atomic layer deposition apparatus, which are capable of discharging an exhaust gas from a process chamber, in which a metal atomic layer is deposited on a substrate using a reaction gas containing a metal catalyst, without a scrubber, and easily reusing the metal catalyst contained in the exhaust gas. The metal capturing apparatus includes a capturing chamber having a capturing space, a capturing plate disposed at one side of the capturing chamber and partially inserted into the capturing chamber, a refrigerant source feeding a refrigerant cooling the capturing plate, and an attachment unit attaching the capturing plate to the capturing chamber. The atomic layer deposition apparatus includes a process chamber, a vacuum pump connected to an exhaust port of the process chamber, and a metal capturing apparatus disposed between the process chamber and the vacuum pump.Type: ApplicationFiled: February 26, 2010Publication date: February 24, 2011Applicant: Samsung Mobile Display Co., Ltd.Inventors: Heung-Yeol Na, Ki-Yong Lee, Jin-Wook Seo, Min-Jae Jeong, Jong-Won Hong, Eu-Gene Kang, Seok-Rak Chang, Yun-Mo Chung, Tae-Hoon Yang, Byoung-Keon Park, Dong-Hyun Lee, Kil-Won Lee, Jong-Ryuk Park, Bo-Kyung Choi, Jae-Wan Jung, Byung-Soo So, Won-Bong Baek, Ivan Maidanchuk
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Publication number: 20110008540Abstract: A deposition apparatus, and a canister for the deposition apparatus capable of maintaining a predetermined amount of source material contained in a reactive gas supplied to a deposition chamber when the source material is deposited on a substrate by atomic layer deposition includes a main body, a source storage configured to store a source material, a heater disposed outside the main body, and a first feed controller configured to control the source material supplied to the main body from the source storage.Type: ApplicationFiled: July 7, 2010Publication date: January 13, 2011Applicant: Samsung Mobile Display Co., Ltd.Inventors: Heung-Yeol Na, Ki-Yong Lee, Jin-Wook Seo, Min-Jae Jeong, Jong-Won Hong, Eu-Gene Kang, Seok-Rak Chang, Tae-Hoon Yang, Yun-Mo Chung, Byung-Soo So, Byoung-Keon Park, Ivan Maidanchuk, Dong-Hyun Lee, Kil-Won Lee, Won-Bong Baek, Jong-Ryuk Park, Bo-Kyung Choi, Jae-Wan Jung
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Publication number: 20100263594Abstract: A substrate processing apparatus that forms thin films on a plurality of substrates and thermally processes the substrates, by uniformly heating the substrates. The substrate processing apparatus includes a processing chamber, a boat in which substrates are stacked, an external heater located outside of the processing chamber, a feeder to move the boat into and out of the processing chamber, a lower heater located below the feeder, and a central heater located in the center of the boat.Type: ApplicationFiled: February 26, 2010Publication date: October 21, 2010Applicant: Samsung Mobile Display Co., Ltd.Inventors: Heung-Yeol NA, Ki-Yong Lee, Jin-Wook Seo, Min-Jae Jeong, Jong-Won Hong, Seok-Rak Chang, Yun-Mo Chung, Tae-Hoon Yang, Byung-Soo So, Byoung-Keon Park, Dong-Hyun Lee, Kil-Won Lee, Jong-Ryuk Park, Bo-Kyung Choi, Ivan Maidanchuk, Won-Bong Baek, Jae-Wan Jung