Patents by Inventor Won Ceak Pak

Won Ceak Pak has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Apparatus and method to generate plasma
    Patent number: 7804250
    Abstract: An apparatus and method to generate plasma which can be applied to semiconductor processing. The apparatus includes a chamber having a plasma generating space defined therein, a lower electrode positioned within the chamber, an upper electrode facing the lower electrode and disposed within the chamber to constitute a first plasma generating source, a second plasma generating source positioned at a higher location than that of a lower surface of the upper electrode and disposed at an outer circumference of the upper electrode, and a power supply to supply power to the first and second plasma generating sources.
    Type: Grant
    Filed: March 9, 2007
    Date of Patent: September 28, 2010
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Andrey Ushakov, Yuri Tolmachev, Vladimir Volynets, Won Ceak Pak, Vasily Pashkovskiy, Sung Chang Park, Yung Hee Lee
  • APPARATUS AND METHOD TO GENERATE PLASMA
    Publication number: 20080061702
    Abstract: An apparatus and method to generate plasma which can be applied to semiconductor processing. The apparatus includes a chamber having a plasma generating space defined therein, a lower electrode positioned within the chamber, an upper electrode facing the lower electrode and disposed within the chamber to constitute a first plasma generating source, a second plasma generating source positioned at a higher location than that of a lower surface of the upper electrode and disposed at an outer circumference of the upper electrode, and a power supply to supply power to the first and second plasma generating sources.
    Type: Application
    Filed: March 9, 2007
    Publication date: March 13, 2008
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Andrey Ushakov, Yuri Tolmachev, Vladimir Volynets, Won Ceak Pak, Vasily Pashkovskiy, Sung Chang Park, Yung Hee Lee
  • ION ANALYSIS SYSTEM BASED ON ANALYZER OF ION ENERGY DISTRIBUTION USING RETARDED ELECTRIC FIELD
    Publication number: 20080032427
    Abstract: An ion analysis system to measure ion energy distribution at several points during a process of manufacturing a semiconductor circuit includes at least two ion flux sensors combined in a single system to measure an ion energy distribution function, each of the ion flux sensors having cells including an opening of 50 micrometers or less.
    Type: Application
    Filed: May 22, 2007
    Publication date: February 7, 2008
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Yung Hee Lee, Andrey Ushakov, Yuri Tolmachev, Vladimir Volynets, Won Ceak Pak, Vasily Pashkovskiy