Abstract: A system for laminating an optical film according to an exemplary embodiment of the present disclosure includes a panel transfer unit to transfer a panel, a first laminating unit to laminate an optical film full-cut into a predetermined length on a first surface of the panel along a first direction parallel to a transfer direction of the panel, and a second laminating unit to laminate an optical film full-cut into a predetermined length on a second surface of the panel along a second direction equal or opposite to the first direction, the second laminating unit rotating the optical film supplied in a full-cut state along the second direction in a horizontal direction and laminating the optical film.

Abstract: A system for laminating an optical film according to an exemplary embodiment of the present disclosure includes a panel transfer unit to transfer a panel, a first laminating unit installed on a transfer line of the panel to laminate an optical film on a first surface of the panel along a first direction parallel to a transfer direction of the panel, and a second laminating unit installed on the transfer line of the panel to laminate an optical film on a second surface of the panel along a direction perpendicular to the first direction.

Abstract: A system for laminating an optical film according to an exemplary embodiment of the present disclosure includes a panel transfer unit to transfer a panel, a first laminating unit installed on a transfer line of the panel to laminate an optical film on a first surface of the panel along a first direction parallel to a transfer direction of the panel, and a second laminating unit installed on the transfer line of the panel to laminate an optical film full-cut into a predetermined length on a second surface of the panel along a direction perpendicular to the first direction.

Abstract: A system for laminating an optical film according to an exemplary embodiment of the present disclosure includes a panel transfer unit to transfer a panel, a first laminating unit installed on a transfer line of the panel to laminate an optical film on a first surface of the panel along a first direction parallel to a transfer direction of the panel, and a second laminating unit installed on the transfer line of the panel to laminate an optical film on a second surface of the panel, wherein the second laminating unit includes a laminating drum to laminate an optical film after adsorbing and rotating the optical film in a horizontal direction.

Abstract: A light irradiation apparatus and a method of manufacture a photo-aligning layer are disclosed. A mask included in a light irradiation apparatus according to one embodiment is configured to irradiate the light having straightness at a high level of illumination to a subject that is apart from the mask with a certain distance. A photo-aligning layer with a desired alignment pattern can be fabricated using the mask.

Abstract: A system for laminating an optical film according to an exemplary embodiment of the present disclosure includes a panel transfer unit to transfer a panel, a first laminating unit installed on a transfer line of the panel to laminate an optical film on a first surface of the panel along a first direction parallel to a transfer direction of the panel, and a second laminating unit installed on the transfer line of the panel to laminate an optical film on a second surface of the panel, wherein the second laminating unit includes a laminating drum to laminate an optical film after adsorbing and rotating the optical film in a horizontal direction.

Abstract: A system for laminating an optical film according to an exemplary embodiment of the present disclosure includes a panel transfer unit to transfer a panel, a first laminating unit installed on a transfer line of the panel to laminate an optical film on a first surface of the panel along a first direction parallel to a transfer direction of the panel, and a second laminating unit installed on the transfer line of the panel to laminate an optical film full-cut into a predetermined length on a second surface of the panel along a direction perpendicular to the first direction.

Abstract: A system for laminating an optical film according to an exemplary embodiment of the present disclosure includes a panel transfer unit to transfer a panel, a first laminating unit installed on a transfer line of the panel to laminate an optical film on a first surface of the panel along a first direction parallel to a transfer direction of the panel, and a second laminating unit installed on the transfer line of the panel to laminate an optical film on a second surface of the panel along a direction perpendicular to the first direction.

Abstract: A system for laminating an optical film according to an exemplary embodiment of the present disclosure includes a panel transfer unit to transfer a panel, a first laminating unit to laminate an optical film full-cut into a predetermined length on a first surface of the panel along a first direction parallel to a transfer direction of the panel, and a second laminating unit to laminate an optical film full-cut into a predetermined length on a second surface of the panel along a second direction equal or opposite to the first direction, the second laminating unit rotating the optical film supplied in a full-cut state along the second direction in a horizontal direction and laminating the optical film.

Abstract: A mask and an optical filter manufacturing apparatus having the same are provided. The optical filter manufacturing apparatus includes a roll used in a roll-to-roll process, a base film wound around the roll, a light source that generates light for exposure, a polarizing plate that is installed at an emission side of the light source and polarizes light generated from the light source, and a mask that causes a pattern to be formed on the base film and includes a plurality of guide slits that are opened to have a predetermined thickness and a predetermined width. According to the present invention, the entire surface of the base film can be irradiated with a uniform light quantity. Thus, a pattern can be uniformly formed on the base film, the quality of a product can be improved, and the characteristics of the base film can be accurately realized.

Abstract: A light irradiation apparatus and a method of manufacture a photo-aligning layer are disclosed. A mask included in a light irradiation apparatus according to one embodiment is configured to irradiate the light having straightness at a high level of illumination to a subject that is apart from the mask with a certain distance. A photo-aligning layer with a desired alignment pattern can be fabricated using the mask.

Abstract: A light irradiation apparatus and a method of manufacture a photo-aligning layer are disclosed. A mask included in a light irradiation apparatus according to one embodiment is configured to irradiate the light having straightness at a high level of illumination to a subject that is apart from the mask with a certain distance. A photo-aligning layer with a desired alignment pattern can be fabricated using the mask.

Abstract: A mask and an optical filter manufacturing apparatus having the same are provided. The optical filter manufacturing apparatus includes a roll used in a roll-to-roll process, a base film wound around the roll, a light source that generates light for exposure, a polarizing plate that is installed at an emission side of the light source and polarizes light generated from the light source, and a mask that causes a pattern to be formed on the base film and includes a plurality of guide slits that are opened to have a predetermined thickness and a predetermined width. According to the present invention, the entire surface of the base film can be irradiated with a uniform light quantity. Thus, a pattern can be uniformly formed on the base film, the quality of a product can be improved, and the characteristics of the base film can be accurately realized.

Abstract: A light irradiation apparatus and a method of manufacture a photo-aligning layer are disclosed. A mask included in a light irradiation apparatus according to one embodiment is configured to irradiate the light having straightness at a high level of illumination to a subject that is apart from the mask with a certain distance. A photo-aligning layer with a desired alignment pattern can be fabricated using the mask.