Patents by Inventor Won Chul Joo

Won Chul Joo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • NANOPOROUS ANTIREFLECTION THIN FILM AND METHOD OF PRODUCING THE SAME USING BLOCK COPOLYMERS
    Publication number: 20110120970
    Abstract: Disclosed herein is a method of producing an antireflection thin film using a block copolymer and an antireflection thin film prepared by the method. Specifically, the present invention relates to a method of producing a nanoporous antireflection film by spin-coating using a block copolymer solution and subsequent processing and a preparation by the method. The antireflection film of the present invention is prepared by coating a substrate with a block copolymer and selectively removing at least one block in the coated block copolymer to produce a nanoporous thin film with a pore size of 5 to 100 nm. When the thin film is applied to a substrate, an antireflection substrate which has a very low reflectance within a broad range of wavelength can be prepared.
    Type: Application
    Filed: November 30, 2007
    Publication date: May 26, 2011
    Applicant: Postech Academy-Industry Foundation
    Inventors: Won Chul Joo, Jin Kon Kim, Min Soo Park