Patents by Inventor Won-Hee Nam

Won-Hee Nam has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Organometal complex and method of depositing a metal silicate thin layer using same
    Patent number: 6774038
    Abstract: The present invention relates to an organometal complex and a chemical vapor deposition (CVD) or atomic layer deposition (ALD) method for preparing a metal silicate thin layer using same. The inventive method can easily prepare the metal silicate thin layer having a desired composition which can be effectively used as a gate insulating layer for various semiconductor devices.
    Type: Grant
    Filed: April 25, 2003
    Date of Patent: August 10, 2004
    Assignee: Postech Foundation
    Inventors: Shi-Woo Rhee, Sang-Woo Kang, Won-Hee Nam
  • Organometal complex and method of depositing a metal silicate thin layer using same
    Publication number: 20030203126
    Abstract: The present invention relates to an organometal complex and a chemical vapor deposition (CVD) or atomic layer deposition (ALD) method for preparing a metal silicate thin layer using same. The inventive method can easily prepare the metal silicate thin layer having a desired composition which can be effectively used as a gate insulating layer for various semiconductor devices.
    Type: Application
    Filed: April 25, 2003
    Publication date: October 30, 2003
    Inventors: Shi-Woo Rhee, Sang-Woo Kang, Won-Hee Nam