Abstract: A method to determine a patterning process parameter, the method comprising: for a target, calculating a first value for an intermediate parameter from data obtained by illuminating the target with radiation comprising a central wavelength; for the target, calculating a second value for the intermediate parameter from data obtained by illuminating the target with radiation comprising two different central wavelengths; and calculating a combined measurement for the patterning process parameter based on the first and second values for the intermediate parameter.

Abstract: Disclosed are a method, computer program and a metrology apparatus for measuring a process effect parameter relating to a manufacturing process for manufacturing integrated circuits on a substrate. The method comprises determining for a structure, a first quality metric value for a quality metric from a plurality of measurement values each relating to a different measurement condition while cancelling or mitigating for the effect of the process effect parameter on the plurality of measurement values and a second quality metric value for the quality metric from at least one measurement value relating to at least one measurement condition without cancelling or mitigating for the effect of the process effect parameter on the at least one measurement value. The process effect parameter value for the process effect parameter can then be calculated from the first quality metric value and the second quality metric value, for example by calculating their difference.

Abstract: A method to determine a patterning process parameter, the method comprising: for a target, calculating a first value for an intermediate parameter from data obtained by illuminating the target with radiation comprising a central wavelength; for the target, calculating a second value for the intermediate parameter from data obtained by illuminating the target with radiation comprising two different central wavelengths; and calculating a combined measurement for the patterning process parameter based on the first and second values for the intermediate parameter.

Abstract: Disclosed are a method, computer program and a metrology apparatus for measuring a process effect parameter relating to a manufacturing process for manufacturing integrated circuits on a substrate. The method comprises determining for a structure, a first quality metric value for a quality metric from a plurality of measurement values each relating to a different measurement condition while cancelling or mitigating for the effect of the process effect parameter on the plurality of measurement values and a second quality metric value for the quality metric from at least one measurement value relating to at least one measurement condition without cancelling or mitigating for the effect of the process effect parameter on the at least one measurement value. The process effect parameter value for the process effect parameter can then be calculated from the first quality metric value and the second quality metric value, for example by calculating their difference.

Abstract: A hermetic vessel capable of preventing noise caused by fluid flow, and an oil separator, a gas-liquid separator, and an air conditioning system using the same. The hermetic vessel having a vessel body includes an inlet through which a fluid flows into the vessel body, and a discharge pipe which is inserted into the vessel body to discharge the fluid. The discharge pipe includes a first discharge pipe which guides a flow of the fluid in a first direction and causes a wave of a higher frequency than an audible frequency, and a second discharge pipe which is connected to the first discharge pipe to guide a flow of the fluid from the first discharge pipe in a second direction which is different from the first direction.

Abstract: A hermetic vessel capable of preventing noise caused by fluid flow, and an oil separator, a gas-liquid separator, and an air conditioning system using the same. The hermetic vessel having a vessel body includes an inlet through which a fluid flows into the vessel body, and a discharge pipe which is inserted into the vessel body to discharge the fluid. The discharge pipe includes a first discharge pipe which guides a flow of the fluid in a first direction and causes a wave of a higher frequency than an audible frequency, and a second discharge pipe which is connected to the first discharge pipe to guide a flow of the fluid from the first discharge pipe in a second direction which is different from the first direction.