Patents by Inventor Won Jin Chung
Won Jin Chung has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11961794Abstract: An electronic package includes a substrate having a plurality of lands embedded within an insulating layer. Conductive patterns are disposed on at least a portion of a respective land top surface. An electronic device is electrically connected to the conductive patterns, wherein the land bottom surfaces are exposed to the outside. In another embodiment, the top land surfaces and the top surface of the insulating layer are substantially co-planar and the conductive patterns further overlap portions of the top surface of the insulating layer. In one embodiment, a package body encapsulates the top surface of the insulating material and the electronic device, wherein the land bottom surfaces are exposed to the outside of the package body.Type: GrantFiled: December 22, 2020Date of Patent: April 16, 2024Assignee: Amikor Technology Singapore Holding Pte. Ltd.Inventors: Won Bae Bang, Byong Jin Kim, Gi Jeong Kim, Ji Young Chung
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Patent number: 10943194Abstract: A computer-implemented system and method for obtaining product related information. Information related to a product obtained from a plurality of different sources is transformed into processed product data with a plurality of levels. Callouts and contexts are identified in the processed product data. A product-to-chemical continuum is generated by creating callout-context pathway segments between the plurality of levels of the processed product data based on the callouts and contexts identified. A query request for product information is transformed into a set of context search parameters, which is used to traverse the product-to-chemical continuum through the callout-context pathway segments that span the plurality of levels. The product information that matches the set of context search parameters is extracted from the product-to-chemical continuum. The callout-context pathway segments reduce processing resources and time needed to obtain the product information.Type: GrantFiled: September 5, 2014Date of Patent: March 9, 2021Assignee: The Boeing CompanyInventors: Jay Kenji Yoshinaga, Frank Samuel Holman, III, Mark Arnold Dahl, John Michael Caddick, Philip Won Jin Chung, Fred Milton Cruz, Brian Byungkyu Kim, Elizabeth Thelma Montague, Michael Mark Scheiern, Patric Roy Gillies, John Terry Monahan, Richard Loran Williams
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Publication number: 20150120363Abstract: A computer-implemented system and method for obtaining product related information. Information related to a product obtained from a plurality of different sources is transformed into processed product data with a plurality of levels. Callouts and contexts are identified in the processed product data. A product-to-chemical continuum is generated by creating callout-context pathway segments between the plurality of levels of the processed product data based on the callouts and contexts identified. A query request for product information is transformed into a set of context search parameters, which is used to traverse the product-to-chemical continuum through the callout-context pathway segments that span the plurality of levels. The product information that matches the set of context search parameters is extracted from the product-to-chemical continuum. The callout-context pathway segments reduce processing resources and time needed to obtain the product information.Type: ApplicationFiled: September 5, 2014Publication date: April 30, 2015Inventors: Jay Kenji Yoshinaga, Frank Samuel Holman, III, Mark Arnold Dahl, John Michael Caddick, Philip Won Jin Chung, Fred Milton Cruz, Brian Byungkyu Kim, Elizabeth Thelma Montague, Michael Mark Scheiern, Patric Roy Gillies, John Terry Monahan
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Patent number: 8871430Abstract: The present invention relates to a photoactive compound having a novel structure and a photosensitive resin composition including the same, and the photoactive compound according to the present invention has excellent sensitivity due to efficient absorption to a UV light source by including a nitro group and a phosphonate structure, and has excellent retention rate, mechanical strength, heat resistance, chemical resistance and developing resistance by improving solubility of the photosensitive resin composition by excellent compatibility of the phosphonate structure and a binder resin. Therefore, the photosensitive resin composition according to the present invention is useful to cure a column spacer, an overcoat, a passivation material and the like of a liquid crystal display device, and is useful in view of a high temperature process property.Type: GrantFiled: May 14, 2012Date of Patent: October 28, 2014Assignee: LG Chem, Ltd.Inventors: Changho Cho, Won Jin Chung, Raisa Kharbash, Sunghyun Kim, Dongchang Choi, Sang Chul Lee, Han Soo Kim, Yoon Hee Heo, Sunhwa Kim
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Patent number: 8829068Abstract: The present invention relates to a polymer having a novel structure and a photosensitive resin composition comprising the same. A photosensitive resin composition comprising a polymer according to the present invention has a high taper angle and excellent adhesion strength. Accordingly, the photosensitive resin composition comprising the polymer according to the present invention may be applied to various photosensitive materials, and particularly, may be preferably applied when a color filter pattern for LCD is manufactured.Type: GrantFiled: April 20, 2012Date of Patent: September 9, 2014Assignee: LG Chem, Ltd.Inventors: Sunhwa Kim, Ho Chan Ji, Dongchang Choi, Han Soo Kim, Yoon Hee Heo, Changho Cho, Won Jin Chung
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Publication number: 20140220491Abstract: The present invention relates to a photoactive compound having a novel structure and a photosensitive resin composition including the same, and the photoactive compound according to the present invention has excellent sensitivity due to efficient absorption to a UV light source by including a nitro group and a phosphonate structure, and has excellent retention rate, mechanical strength, heat resistance, chemical resistance and developing resistance by improving solubility of the photosensitive resin composition by excellent compatibility of the phosphonate structure and a binder resin. Therefore, the photosensitive resin composition according to the present invention is useful to cure a column spacer, an overcoat, a passivation material and the like of a liquid crystal display device, and is useful in view of a high temperature process property.Type: ApplicationFiled: May 14, 2012Publication date: August 7, 2014Applicant: LG CHEM, LTD.Inventors: Changho Cho, Won Jin Chung, Raisa Kharbash, Sunghyun Kim, Dongchang Choi, Sang Chul Lee, Han Soo Kim, Yoon Hee Heo, Sunhwa Kim
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Patent number: 8791169Abstract: The present invention relates to a fluorene-based resin polymer, and a photosensitive resin composition including the same, and the fluorene-based resin polymer according to the exemplary embodiment of the present invention has a high molecular weight, a low acid value, and excellent developing property, adhesive property and stability.Type: GrantFiled: January 27, 2012Date of Patent: July 29, 2014Assignee: LG Chem, Ltd.Inventors: Yoon Hee Heo, Kwang Han Park, Han Soo Kim, Changho Cho, Sunhwa Kim, Won Jin Chung
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Patent number: 8691492Abstract: The present application relates to a new silane-based compound, a photosensitive resin composition including the same, and a photosensitive material including the same. The photosensitive resin composition including the silane-based compound according to the exemplary embodiment of the present application increases adhesion strength to a substrate, such that a developing property is excellent and there are no surface stains or defects during a subsequent process. Accordingly, a photosensitive material, a color filter and the like having excellent quality may be manufactured by using the photosensitive resin composition according to the exemplary embodiment of the present application.Type: GrantFiled: August 3, 2012Date of Patent: April 8, 2014Assignee: LG Chem, Ltd.Inventors: Changho Cho, Yoon Hee Heo, Sunghyun Kim, Han Soo Kim, Sunhwa Kim, Won Jin Chung
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Patent number: 8399176Abstract: Disclosed is a photosensitive resin composition suitable for use in a transflective liquid crystal display (LCD). The photosensitive resin composition uses, as an alkali-soluble binder resin, a blend of two kinds of binder resins. The first binder resin has a weight average molecular weight greater than or equal to 1,000 but lower than 20,000 and contains no reactive group. The second binder resin has a weight average molecular weight greater than or equal to 20,000 but lower than 80,000 and contains reactive groups. The photosensitive resin composition has good adhesion to an underlying substrate while forming a high resolution fine pattern.Type: GrantFiled: February 26, 2010Date of Patent: March 19, 2013Assignee: LG Chem, Ltd.Inventors: Han Kook Kim, Sung Hyun Kim, Jae Joon Kim, Bog Ki Hong, Mi Ae Kim, Seung Jin Yang, Sang Moon Yoo, Sun Hwa Kim, Won Jin Chung
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Publication number: 20130034814Abstract: The present application relates to a new silane-based compound, a photosensitive resin composition including the same, and a photosensitive material including the same. The photosensitive resin composition including the silane-based compound according to the exemplary embodiment of the present application increases adhesion strength to a substrate, such that a developing property is excellent and there are no surface stains or defects during a subsequent process. Accordingly, a photosensitive material, a color filter and the like having excellent quality may be manufactured by using the photosensitive resin composition according to the exemplary embodiment of the present application.Type: ApplicationFiled: August 3, 2012Publication date: February 7, 2013Applicant: LG CHEM, LTD.Inventors: Changho CHO, Yoon Hee HEO, Sunghyun KIM, Han Soo KIM, Sunhwa KIM, Won Jin CHUNG
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Publication number: 20130030077Abstract: The present invention relates to a polymer having a novel structure and a photosensitive resin composition comprising the same. A photosensitive resin composition comprising a polymer according to the present invention has a high taper angle and excellent adhesion strength. Accordingly, the photosensitive resin composition comprising the polymer according to the present invention may be applied to various photosensitive materials, and particularly, may be preferably applied when a color filter pattern for LCD is manufactured.Type: ApplicationFiled: April 20, 2012Publication date: January 31, 2013Applicant: LG CHEM, LTD.Inventors: Sunhwa Kim, Ho Chan JI, Dongchang Choi, Han Soo Kim, Yoon Hee Heo, Changho Cho, Won Jin Chung
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Publication number: 20120196949Abstract: The present invention relates to a fluorene-based resin polymer, and a photosensitive resin composition including the same, and the fluorene-based resin polymer according to the exemplary embodiment of the present invention has a high molecular weight, a low acid value, and excellent developing property, adhesive property and stability.Type: ApplicationFiled: January 27, 2012Publication date: August 2, 2012Applicant: LG CHEM, LTD.Inventors: Yoon Hee HEO, Kwang Han PARK, Han Soo KIM, Changho CHO, Sunhwa KIM, Won Jin CHUNG
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Patent number: 8168369Abstract: The present invention relates to a photoactive compound of a novel structure represented by Chemical Formula 1 below In Chemical Formula 1, R1 and R2, R3, and A are as defined in the specification, and a photosensitive resin composition comprising the same. The photoactive compound of the present invention comprises a nitro group and a phosphonate structure and thus exhibits excellent sensitivity through efficient absorption for UV light, excellent compatibility between the photoactive compound and the alkali-soluble binder resin, and an improved solubility of the photosensitive resin composition. Furthermore, the photosensitive resin composition of the present invention has excellent residual film thickness and mechanical strength characteristics and heat-resistant, chemical-resistant, and development-resistant properties.Type: GrantFiled: February 12, 2010Date of Patent: May 1, 2012Assignee: LG Chem, Ltd.Inventors: Chang Ho Cho, Sung Hyun Kim, Raisa Kharbash, Keon Woo Lee, Dong Kung Oh, Won Jin Chung, Sang Kyu Kwak, Chang Soon Lee
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Publication number: 20120004341Abstract: Provided are an alkali soluble binder resin that includes a monomer including an unsaturated double bond, an unsaturated double bond character monomer including a carboxylic acid and an unsaturated double bond character monomer including an allyl group as a repeating unit, in which a molecular weight distribution (Mw/Mn) is in a range of about 2.0 to about 3.5, and a negative-type photosensitive resin composition including the alkali soluble binder resin. Re-solubility, fine-patterned substrate adhesion and dispersion stability may be improved by including the alkali soluble binder resin according to the present invention.Type: ApplicationFiled: July 5, 2011Publication date: January 5, 2012Applicant: LG CHEM, LTD.Inventors: Han Soo KIM, Hee Kwan PARK, Ki Youl LEE, Sang Kyu KWAK, Yoon Hee HEO, Chang Soon LEE, Chang Ho CHO, Sun Hwa KIM, Won Jin CHUNG
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Publication number: 20100216073Abstract: Disclosed is a photosensitive resin composition suitable for use in a transflective liquid crystal display (LCD). The photosensitive resin composition uses, as an alkali-soluble binder resin, a blend of two kinds of binder resins. The first binder resin has a weight average molecular weight greater than or equal to 1,000 but lower than 20,000 and contains no reactive group. The second binder resin has a weight average molecular weight greater than or equal to 20,000 but lower than 80,000 and contains reactive groups. The photosensitive resin composition has good adhesion to an underlying substrate while forming a high resolution fine pattern.Type: ApplicationFiled: February 26, 2010Publication date: August 26, 2010Applicant: LG CHEM, LTD.Inventors: Han Kook KIM, Sung Hyun KIM, Jae Joon KIM, Bog Ki HONG, Mi Ae KIM, Seung Jin YANG, Sang Moon YOO, Sun Hwa KIM, Won Jin CHUNG
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Patent number: 5993353Abstract: A shift lever device of the automatic transmission of a vehicle comprising a shift lever pivotally mounted at one end portion thereof and containing an operating means at the other end portion thereof, a detent pin disposed intermediate the end portion for displacement in response to the operating means, a detent plate operatively associated with the shift lever and containing a plurality of grooves for selectively receiving the detent pin by the operation of the operating means and the pivotal rotation of the shift lever, and a shift lock release lever pivotally mounted at one end, relative to the shift lever, the shift lock release lever containing a locking means pivotally mounted at the other end thereof for selectively securing the detent pin in the detent plate or releasing the detent pin for movement to the other grooves of said detent plate.Type: GrantFiled: December 15, 1997Date of Patent: November 30, 1999Assignee: Hyundai Motor Company, Ltd.Inventor: Won-Jin Chung