Patents by Inventor Won-Jong HWANG

Won-Jong HWANG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250076477
    Abstract: The present invention description relates to a technology for calibrating an assembly error in a laser range finder, and more specifically, to a software technology for calibrating an assembly error between a laser component and an optical component. According to one aspect of the proposed invention, in order to calibrate a difference between a position of a center of a captured image and a position of a laser point due to an assembly error, the laser point is positioned at a center of a preview screen image output on a display of a laser range finder.
    Type: Application
    Filed: August 23, 2024
    Publication date: March 6, 2025
    Applicant: MCNEX CO., LTD.
    Inventors: Young Bong PARK, Seung Jun RO, Dae Ki KIM, Dong Jin KIM, Il Jun HWANG, Won Jong LEE, Yun Su HAN, Jin Su LEE
  • Publication number: 20230101786
    Abstract: Provided are a hardmask composition including a polymer including a structural unit represented by Chemical Formula 1 and a structural unit represented by Chemical Formula 2, and a solvent, a hardmask layer manufactured from the hardmask composition, and a method of forming patterns from the hardmask composition, wherein the definitions of Chemical Formula 1 and Chemical Formula 2 are as described in the specification.
    Type: Application
    Filed: August 23, 2022
    Publication date: March 30, 2023
    Inventors: Hyejeong KIM, Soohee KIM, Yoona KIM, Hyungseok PARK, Huichan YUN, Jaechul LEE, Jonghwa LEE, Seulgi JEONG, Yunju CHAE, Won Jong HWANG
  • Patent number: 10312074
    Abstract: A method of producing a layer structure includes forming a first organic layer by applying a first composition including an organic compound on a substrate having a plurality of patterns, applying a solvent on the first organic layer to remove a part of the first organic layer, and applying a second composition including an organic compound on a remaining part of the first organic layer and forming a second organic layer through a curing process.
    Type: Grant
    Filed: June 16, 2015
    Date of Patent: June 4, 2019
    Assignee: SAMSUNG SDI CO., LTD.
    Inventors: Min-Soo Kim, Hyun-Ji Song, Sun-Hae Kang, Sung-Min Kim, Sung-Hwan Kim, Young-Min Kim, Yun-Jun Kim, Hea-Jung Kim, Youn-Hee Nam, Jae-Yeol Baek, Byeri Yoon, Yong-Woon Yoon, Chung-Heon Lee, Seulgi Jeong, Yeon-Hee Jo, Seung-Hee Hong, Sun-Min Hwang, Won-Jong Hwang, Songse Yi, MyeongKoo Kim, Naery Yu
  • Publication number: 20160126088
    Abstract: A method of producing a layer structure includes forming a first organic layer by applying a first composition including an organic compound on a substrate having a plurality of patterns, applying a solvent on the first organic layer to remove a part of the first organic layer, and applying a second composition including an organic compound on a remaining part of the first organic layer and forming a second organic layer through a curing process.
    Type: Application
    Filed: June 16, 2015
    Publication date: May 5, 2016
    Inventors: Min-Soo KIM, Hyun-Ji SONG, Sun-Hae KANG, Sung-Min KIM, Sung-Hwan KIM, Young-Min KIM, Yun-Jun KIM, Hea-Jung KIM, Youn-Hee NAM, Jae-Yeol BAEK, Byeri YOON, Yong-Woon YOON, Chung-Heon LEE, Seulgi JEONG, Yeon-Hee JO, Seung-Hee HONG, Sun-Min HWANG, Won-Jong HWANG, Songse YI, MyeongKoo KIM, Naery YU