Patents by Inventor Won-joon Kim

Won-joon Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20150325148
    Abstract: A CPR training simulation system is provided. The system obtains signals from various sensor installed in a dummy. Specifically, the system obtains signals representing pressure applied to the dummy, bending degree of an air pocket, and expansion of airway in the dummy. Using the obtained data, the system calculates a flow rate representing air flow via the airway of the dummy and compares with a reference flow rate. The system may include an portable terminal for displaying various guide for a trainee during CPR training.
    Type: Application
    Filed: June 11, 2014
    Publication date: November 12, 2015
    Inventors: Won Joon Kim, Ye Ram Kwon, Sung Won Lee, Ji Hoon Jeong, Noh Young Park, Woon Tack Woo
  • Patent number: 8308531
    Abstract: Disclosed are a polishing pad used in a CMP process of a planar material such as a silicon wafer, plate glass for a display, etc. and a method for manufacturing the same. The polishing pad comprises a non-woven fabric consisting of ultrafine fibers and elastomeric polymer impregnated into the fabric, on which the ultrafine fibers are raised and arranged to simultaneously satisfy the following conditions (I) to (III) such that the ultrafine fibers are oriented in a longitudinal direction to a central axis: The polishing pad of the present invention includes ultrafine fibers, which are arranged at a relatively wide orientation angle and have pores formed therebetween without requiring alternative processes for forming the pores, thus, exhibits excellent polishing performance and low occurrence of scratches during a polishing process.
    Type: Grant
    Filed: June 28, 2008
    Date of Patent: November 13, 2012
    Assignee: Kolon Industries, Inc.
    Inventors: Won-Joon Kim, Yeong-Nam Hwang
  • Publication number: 20100173573
    Abstract: Disclosed are a polishing pad used in a CMP process of a planar material such as a silicon wafer, plate glass for a display, etc. and a method for manufacturing the same. The polishing pad comprises a non-woven fabric consisting of ultrafine fibers and elastomeric polymer impregnated into the fabric, on which the ultrafine fibers are raised and arranged to simultaneously satisfy the following conditions (I) to (III) such that the ultrafine fibers are oriented in a longitudinal direction to a central axis: The polishing pad of the present invention includes ultrafine fibers, which are arranged at a relatively wide orientation angle and have pores formed therebetween without requiring alternative processes for forming the pores, thus, exhibits excellent polishing performance and low occurrence of scratches during a polishing process.
    Type: Application
    Filed: June 28, 2008
    Publication date: July 8, 2010
    Inventors: Won-Joon Kim, Yeong-Nam Hwang
  • Patent number: 5395693
    Abstract: A binary conjugated filament comprising one polymer component (A) and a polymer component (B) which is more soluble than polymer (A), the cross-sectional configuration of the filament being such that the polymer component (A) is divided into not less than five segments by the polymer component (B) and one of these segments is disposed in the center of the other segments, the areal center of the central segment residing on the line (r) in the range of: R/300.ltoreq.r.ltoreq.R/2 wherein R is the radius of the circular cross-section of the conjugated filament and r is the length from the areal center of the cross-section of the conjugated filament to the areal center of the segment disposed in the center of the other segments. The filament may be made into a woven or knitted fabric which is treated to remove the more soluble polymer component (B) to provide a fabric product exhibiting good handle characteristics.
    Type: Grant
    Filed: June 28, 1993
    Date of Patent: March 7, 1995
    Assignee: Kolon Industries, Inc.
    Inventors: Dae-hyun Cho, Won-joon Kim