Patents by Inventor Won-ju Kim

Won-ju Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20070236910
    Abstract: A covering member for a display device includes a supporting part, a sidewall part and a plurality of contact parts. The supporting part is extended along a surface of the display device. The sidewall part is extended from the supporting part along a side surface of the display device, and an opening is formed at the sidewall part. A plurality of contact parts is inclined with respect to the sidewall part and extended from an edge of the opening, each of the contact parts bent a plurality of times. Contact parts contact another component of the display device. Therefore, the number of components of the display device is reduced, so that the manufacturing process of the display device may be simplified.
    Type: Application
    Filed: April 5, 2007
    Publication date: October 11, 2007
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Su-Young YUN, Won-Ju KIM, Jae-Hwan CHUN, Min-Ho OK
  • Publication number: 20070109767
    Abstract: A backlight assembly includes a receiving container, lamps, a diffusion plate and a lamp-fixing member. The receiving container includes a bottom plate and sidewalls together providing a receiving space. The lamps are arranged substantially parallel to each other on the bottom plate. The diffusion plate is disposed over the lamps. The lamp-fixing member includes a body portion extending substantially perpendicular to the lamps, a buffer protruding upwardly from the body portion, a diffusion plate supporting portion protruding from the buffer to support the diffusion plate and a lamp-fixing portion formed at the body portion to fix the lamps. Therefore, the buffer having elasticity is formed at an area at which the diffusion plate supporting portion is formed, so that rubbing between the diffusion plate and the diffusion plate supporting portion may be reduced.
    Type: Application
    Filed: November 2, 2006
    Publication date: May 17, 2007
    Applicant: SAMSUNG ELECTRONICS CO., LTD
    Inventors: Sang-Sun HAN, Jae-Hwan CHUN, Jong-Ho WON, Hyun-Chul JEONG, Won-Ju KIM, Young-Nam KIM
  • Publication number: 20060274552
    Abstract: A backlight assembly includes a plurality of lamps, a receiving container and a conductive member. Each of the lamps includes a lamp body, a first electrode part disposed at a first end portion of the lamp body and a second electrode part disposed at a second end portion of the lamp body, the second end portion being opposite to the first end portion. The receiving container includes a bottom plate on which the lamps are disposed and a sidewall disposed at edge portions of the bottom plate to define a receiving space. The receiving container has a plurality of grounding portions formed on the bottom plate or the sidewalls. The conductive member electrically connects the second electrode part to one of the grounding portions.
    Type: Application
    Filed: May 18, 2006
    Publication date: December 7, 2006
    Inventors: Won-Ju Kim, Min-Ho Ok, Yoon-Soo Kwon, Jung-Tae Kang, Sang-Hoon Park, Jin-Ho Ha, Woong-Jae Chang
  • Patent number: 6753652
    Abstract: An ion implanter having means for scanning an ion beam on a wafer is provided, wherein the scanning means, on which the wafer is mounted, moves the wafer in a region where the ion beam is irradiated. A detecting means, which is fixedly mounted adjacent to the scanning means, detects the ion beam that is overly scanned out of the scanning means. The detecting means has an inclined surface so that a portion of the detecting means adjacent to the scanning means is positioned below a surface of the wafer that is disposed on the scanning means. Accordingly, the ion implanter may prevent the wafer in the scanning means from being polluted with sputtering particles generated from a surface of the scanning means.
    Type: Grant
    Filed: May 30, 2002
    Date of Patent: June 22, 2004
    Assignee: Samsung Electronics Co., Ltd.
    Inventor: Won-Ju Kim
  • Publication number: 20020180366
    Abstract: An ion implanter having means for scanning an ion beam on a wafer is provided, wherein the scanning means, on which the wafer is mounted, moves the wafer in a region where the ion beam is irradiated. A detecting means, which is fixedly mounted adjacent to the scanning means, detects the ion beam that is overly scanned out of the scanning means. The detecting means has an inclined surface so that a portion of the detecting means adjacent to the scanning means is positioned below a surface of the wafer that is disposed on the scanning means. Accordingly, the ion implanter may prevent the wafer in the scanning means from being polluted with sputtering particles generated from a surface of the scanning means.
    Type: Application
    Filed: May 30, 2002
    Publication date: December 5, 2002
    Inventor: Won-Ju Kim
  • Patent number: 6175396
    Abstract: A liquid crystal display module in which a series of overlying sheets can be prevented from wrinkling by fixing the sheets to a mold frame using a fixing member such as the positioner and the earth clips without using the fixing tape and the sheets are provided with an appropriate level of thermal expansion space, thereby eliminating wrinkling. As a result, displaying performance of the LCD device can be significantly enhanced.
    Type: Grant
    Filed: January 22, 1999
    Date of Patent: January 16, 2001
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Hee-sun Kim, Young-jae Lee, Swang-hwan Lee, Tae-gil Kang, Swang-hee Lee, Won-ju Kim
  • Patent number: 6124202
    Abstract: A silicide layer is formed on a conductive layer in a microelectronic device by forming a first silicide layer on the conductive layer. A second silicide layer is then formed on the first silicide layer, the second silicide layer having a concentration of silicon that is less than the first silicide layer. Preferably, the first silicide layer and the second silicide layer are formed of tungsten silicide. The first silicide layer and the second silicide layer are preferably annealed to form a merged silicide layer. According to another aspect, a contact structure for contacting a microelectronic layer in a microelectronic device is formed by forming an insulation layer on the microelectronic layer, the insulation layer having a contact hole therethrough that exposes a portion of the microelectronic layer. A conductive layer is then formed on the insulation layer, the conductive layer extending through the contact hole to contact the exposed portion of the microelectronic layer.
    Type: Grant
    Filed: January 22, 1998
    Date of Patent: September 26, 2000
    Assignee: Samsung Electronics Co.
    Inventors: Jin-ho Jeon, Won-ju Kim
  • Patent number: 5973329
    Abstract: An ion generating apparatus for semiconductor fabricating equipment includes a device for reversing the orientation of a magnetic field. In this manner, the potential energy of a plurality of filaments in the ion generating apparatus are maintained at a substantially equal level, and consequently, asymmetric damage to one of the plurality of filaments due to concentration and collision of the thermal electrons is prevented, thereby prolonging the maintenance cycle of the ion generating apparatus.
    Type: Grant
    Filed: April 22, 1998
    Date of Patent: October 26, 1999
    Assignee: Samsung Electronics Co., Ltd.
    Inventor: Won-ju Kim