Abstract: The present invention is related to a manufacturing method of high purity and refined Ru (Ruthenium) powder produced by using a waste Ru target. Yield of the target and physical properties of a thin film are improved by producing tremendously refined in which oxygen content of the target is decreased, and a crystal particle size is reduced. In order to obtain these merits, powder having a hollow inside is produced by applying plasma to a waste Ru target. Carbon impurities are selectively removed through a atmospheric heat process and Ru powder is oxidized. Thereby, Ru oxide (RuOx) powder is produced. High purity and refined Ru powder is acquired through a hydrogen atmospheric heat process after pulverizing the produced Ru oxide (RuOx) powder into refined shape.

Abstract: The present invention is related to a method for manufacturing Ru powder and a target which are frequently used in a seed layer for forming a magnetic layer. When producing Ru powder and a target by using a conventional wet method, it takes terribly much time to produce powder and to perform dissolution of a waste target and it also required much expensive cost. Further, since large quantity of chemical products were used, an environmental pollution problem such as disposal of waste water was generated. Thus, the present invention is devised to solve such a drawback. In order to improve this problem, the present invention is characterized in that it simply removes surface pollutants and foreign substances on a surface of a waste Ru target by using a chemical method or a mechanical method, Ru is produced by using plasma, refined High purity Ru powder is produced through a heat process and pulverization, and a Ru target of high density by sintering is acquired.