Patents by Inventor Won Min

Won Min has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20070228506
    Abstract: An electronic assembly (98) includes a substrate (20), a capacitor having first and second conductors (38,54) formed over the substrate, a first set of conductive members (76) formed over the substrate and being electrically connected to the first conductor of the capacitor, and a second set of conductive members (78) formed over the substrate and being electrically connected to the second conductor of the capacitor.
    Type: Application
    Filed: April 3, 2006
    Publication date: October 4, 2007
    Inventors: Won Min, Geno Fallico, Amanda Kroll, Hongning Yang, Jiang-Kai Zuo
  • Publication number: 20060292754
    Abstract: An antifuse element (102, 152, 252, 302, 352, 402, 602, 652, 702) and method of fabricating the antifuse element, including a substrate material (101) having an active area (106) formed in an upper surface, a gate electrode (104) having at least a portion positioned above the active area (106), and a gate oxide layer (110) disposed between the gate electrode (104) and the active area (106). The gate oxide layer (110) including the fabrication of one of a gate oxide dip (128) or a gate oxide undercut (614). During operation a voltage applied between the gate electrode (104) and the active area (106) creates a current path through the gate oxide layer (110) and a rupture of the gate oxide layer (110) in a rupture region (130). The rupture region (130) defined by the oxide structure and the gate oxide dip (128) or the gate oxide undercut (614).
    Type: Application
    Filed: June 28, 2005
    Publication date: December 28, 2006
    Inventors: Won Min, Robert Baird, Jiang-Kai Zuo, Gordon Lee
  • Publication number: 20060226509
    Abstract: An antifuse element (102) having end corners (120, 122) of a gate electrode (104) positioned directly above an active area (106) or bottom electrode. The minimum programming voltage between the gate electrode (104) and the active area (106) creates a current path through an insulating layer (110) positioned therebetween. The high electric field created at the end corners (120, 122) of the gate electrode (104) results in a breakdown and rupture of the insulating layer (110) at points directly beneath the end corners (120, 122). This localization of the insulating layer (110) at the corners (120,122) provides for lower post program resistance and variation, and faster programming at a lower programming power. The antifuse elements (102) when integrated into an array (300, 320, 400, 550) provide for increased packing density. The array is fabricated to include multiple active areas (304) for individual antifuse element (302) programming or a common active area (324,405,426,506) for multi-element programming.
    Type: Application
    Filed: March 31, 2005
    Publication date: October 12, 2006
    Inventors: Won Min, Robert Baird, Jiang-Kai Zuo, Gordon Lee