Abstract: Provided is a sealed shutter device including: a shutter door for opening and closing an opening on a front surface of a chamber; and a shutter driving unit for moving the shutter door to a first position to close the opening, a second position facing the opening but spaced apart from the front surface, and a third position not facing the opening, in which the shutter driving unit includes: a cam follower provided on the shutter door; and a cam guide having a track into which the cam follower is fitted so that the shutter door moves along the first position, the second position, and the third position; and an elastic member for providing elastic force so that the cam follower is in contact with only one predetermined surface of the track.

Abstract: The present invention provides a substrate treating method of treating a substrate including a plurality of cells, the substrate treating method including: a liquid treating operation of supplying a treatment liquid to the substrate; and a heating operation of heating the substrate by supplying the treatment liquid and irradiating laser light to a specific region located outside a region in which the plurality of cells is provided, in which the laser light is formed to cover the specific region when viewed from the top.

Abstract: Provided is a substrate processing apparatus including: a liquid treating chamber for processing a substrate with multiple types of treatment liquids; an individual exhaust pipe connected to the liquid treating chamber to exhaust an atmosphere in the liquid treating chamber; a plurality of collective exhaust pipes connected to the individual exhaust pipes; and an exhaust switching unit which is disposed between the individual exhaust pipe and the collective exhaust pipe, and switches an exhaust path of the exhaust gas to a corresponding collective exhaust pipe according to the property of the exhaust gas flowing in the individual exhaust pipe, in which the exhaust switching unit includes an exhaust switching module disposed between the individual exhaust pipe and each of the collective exhaust pipes.

Abstract: Provided is an apparatus for processing a substrate. The apparatus includes a cleaning unit for cleaning a nozzle. The cleaning unit includes: a body having an inner space; a first inner plate for dividing the inner space into a first space and a first buffer space; a cleaning liquid supply pipe for supplying a cleaning liquid to clean the nozzle into the first buffer space; a first driver for rotating the first inner plate; a second inner plate for dividing the inner space into a second space and a second buffer space; a second gas supply pipe for supplying gas to dry the nozzle into the second buffer space; and a second driver for rotating the second inner plate.

Abstract: The present invention relates to a substrate treating apparatus and a substrate treating method using the same, and a first driving unit, which is a structure that allows a chuck pin and a guide ring unit to move at the same time, includes a bearing, thereby reducing damage to a puddle and ensuring substrate treatment uniformity by rotating the substrater even when a guide ring is lowered and the chuck pin is separated from the substrate.

Abstract: A method of processing a substrate includes an etchant supplying operation of supplying an etchant to a substrate; a puddle operation of, by rotating the substrate at a first rotational speed, forming a liquid film of the etchant supplied to the substrate in a puddle shape; and a thickness adjusting operation of changing a rotational speed of the substrate to a rotational speed different from the first rotational speed to adjust a thickness of the liquid film of the etchant. Using the method, dispersion of the etching rate may be effectively controlled.

Abstract: The present invention provides a substrate treating apparatus including: a support unit supporting and rotating the substrate in a treatment space; a liquid supply unit supplying a liquid to the substrate supported by the support unit; and an irradiating module irradiating light to the substrate supported by the support unit, in which the irradiating module includes: a housing having an accommodation space; a laser unit located in the accommodation space, and including a laser irradiation unit irradiating laser light, and an irradiation end having one end protruding from the housing and irradiating the laser light irradiated from the laser irradiation unit to the substrate supported by the support unit; and a cooling unit located in the accommodation space and cooling the laser irradiation unit.

Abstract: The moving assembly for a recovery guard includes a recovery vessel, including a first recovery vessel surrounding a substrate support, a second recovery vessel, and a lifting driver connected to the first and second recovery vessels and elevating the first and second recovery vessels. The lifting driver includes a first motor and a second motor, a first shaft connected to the first motor and the first recovery vessel and moving in a first direction by driving the first motor, a second shaft connected to the second motor and the second recovery vessel and moving in the first direction by driving the second motor, a first connecting portion connecting the first shaft and the first recovery vessel, and a second connecting portion connecting the second shaft and the second recovery vessel, the second connecting portion including a passage hole through which the first shaft passes.

Abstract: Provided is an apparatus for treating a substrate including: a processing vessel having a processing space; a support unit for supporting the substrate in the processing space and rotating the substrate; a liquid supply unit for supplying a processing liquid to the substrate; and a heating unit for heating the substrate, wherein the support unit includes: a spin chuck; a rotation driver for rotating the spin chuck; a chuck pin installed on the spin chuck to be rotated with the spin chuck; a chuck pin moving unit for moving the chuck pin between a contact position wherein the chuck pin is in contact with a side portion of the substrate and an open position at which the chuck pin is spaced apart from the side portion of the substrate, and the chuck pin moving unit moves the chuck pin while the substrate is rotated by the spin chuck.

Abstract: Provided is an apparatus for treating a substrate including: a processing vessel having a processing space; a support unit for supporting the substrate in the processing space and rotating the substrate; a liquid supply unit for supplying a processing liquid to the substrate; and a heating unit for heating the substrate, wherein the support unit includes: a spin chuck; a rotation driver for rotating the spin chuck; a chuck pin installed on the spin chuck to be rotated together with the spin chuck; a chuck pin moving unit for moving the chuck pin between a contact position wherein the chuck pin is in contact with a side portion of the substrate and an open position at which the chuck pin is spaced apart from the side portion of the substrate, and the chuck pin moving unit moves the chuck pin while the substrate is being rotated by the spin chuck.

Abstract: Provided is an apparatus for treating a substrate including: a processing vessel having a processing space; a support unit for supporting the substrate in the processing space and rotating the substrate; a liquid supply unit for supplying a processing liquid to the substrate; and a heating unit for heating the substrate, wherein the support unit includes: a spin chuck; a driver for rotating the spin chuck; a chuck pin installed on the spin chuck to be rotated together with the spin chuck; and a chuck pin moving unit for moving the chuck pin between a contact position wherein the chuck pin is in contact with a side portion of the substrate and an open position wherein the chuck pin is spaced apart from the side portion of the substrate.

Abstract: The moving assembly for a recovery guard includes a recovery vessel including a first recovery vessel disposed to surround a substrate support and a second recovery vessel disposed inside of the first recovery vessel, concentrically with respect to the first recovery vessel, and a lifting driver connected to the first and second recovery vessels and elevating the first and second recovery vessels. The lifting driver includes a motor, a drive shaft connected to the motor and rotated in a first direction, a first shaft connected to the first recovery vessel and extending in a second direction, perpendicular to the first direction, a second shaft connected to the second recovery vessel and extending in the second direction, a first clutch connecting the drive shaft and the first shaft, and a second clutch connecting the drive shaft and the second shaft.

Abstract: A substrate processing apparatus using a supercritical fluid that can remove floating particles is provided. The substrate processing apparatus comprises a vessel including a processing space for processing a substrate, and a first vessel and a second vessel configured to be combined to be open and closed, wherein the first vessel and the second vessel seal the processing space in a closed position, and the first vessel and the second vessel open the processing space in an open position; a clamping unit configured to clamp the first vessel and the second vessel in the closed position; and an intake unit configured to intake a particle by including an intake member positioned to correspond to an open space between the first vessel and the second vessel in the open position.

Abstract: The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes treating modules having an opening for taking in and taking out a substrate and which are stacked on each other; and an air flow generating member for generating a downward airflow at each treating module, and wherein the air flow generating member includes: a pan unit configured to supply an air; a spray unit configured to be provided above the treating module and which sprays an air supplied from the pan unit; and an exhaust unit configured to exhaust an air sprayed by the spray unit to outside of the treating module.

Abstract: A method of processing a substrate includes an etchant supplying operation of supplying an etchant to a substrate; a puddle operation of, by rotating the substrate at a first rotational speed, forming a liquid film of the etchant supplied to the substrate in a puddle shape; and a thickness adjusting operation of changing a rotational speed of the substrate to a rotational speed different from the first rotational speed to adjust a thickness of the liquid film of the etchant. Using the method, dispersion of the etching rate may be effectively controlled.

Abstract: The moving assembly for a recovery guard includes a recovery vessel including a first recovery vessel disposed to surround a substrate support and a second recovery vessel disposed inside of the first recovery vessel, concentrically with respect to the first recovery vessel, and a lifting driver connected to the first and second recovery vessels and elevating the first and second recovery vessels. The lifting driver includes a motor, a drive shaft connected to the motor and rotated in a first direction, a first shaft connected to the first recovery vessel and extending in a second direction, perpendicular to the first direction, a second shaft connected to the second recovery vessel and extending in the second direction, a first clutch connecting the drive shaft and the first shaft, and a second clutch connecting the drive shaft and the second shaft.

Abstract: The moving assembly for a recovery guard includes a recovery vessel, including a first recovery vessel surrounding a substrate support, a second recovery vessel, and a lifting driver connected to the first and second recovery vessels and elevating the first and second recovery vessels. The lifting driver includes a first motor and a second motor, a first shaft connected to the first motor and the first recovery vessel and moving in a first direction by driving the first motor, a second shaft connected to the second motor and the second recovery vessel and moving in the first direction by driving the second motor, a first connecting portion connecting the first shaft and the first recovery vessel, and a second connecting portion connecting the second shaft and the second recovery vessel, the second connecting portion including a passage hole through which the first shaft passes.

Abstract: The inventive concept provides a mask treating method. The mask treating method includes treating a mask by supplying a liquid to the mask, and irradiating a laser to a region of the mask on which a specific pattern is formed while the liquid remains on the mask; moving an optical module including a laser unit configured to irradiate the laser between a process position for treating the substrate and a standby position deviating from the process position; and adjusting a state of the optical module at an inspection port provided at the standby position to a set condition before the optical module is moved to the process position.

Abstract: The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a housing; a support unit positioned within the housing and configured to support a substrate; a liquid supply unit configured to supply a treating liquid to the substrate supported on the support unit; and a laser module configured to irradiate a laser to the substrate to which the treating liquid is supplied; and a vision module for monitoring a point at which the laser is irradiated among the substrate.

Abstract: The present invention provides a substrate treating method of treating a substrate including a plurality of cells, the substrate treating method including: a liquid treating operation of supplying a treatment liquid to the substrate; and a heating operation of heating the substrate by supplying the treatment liquid and irradiating laser light to a specific region located outside a region in which the plurality of cells is provided, in which the laser light is formed to cover the specific region when viewed from the top.