Patents by Inventor Won Soung Park

Won Soung Park has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for fabricating semiconductor device by using etching polymer
    Patent number: 6426300
    Abstract: The present invention discloses a method for fabricating a semiconductor device using an etch-resistant polymer. The method includes a step for the in-situ generation of a polymer layer on the exposed surfaces of a photoresist film pattern, a pad oxide film, and a hard mask layer. This polymer acts as a protective film and prevents photoresist erosion during trench etching processes and improves the etch selectivity. As a result, trench structures can be formed more easily and with improved dimensional control.
    Type: Grant
    Filed: January 2, 2001
    Date of Patent: July 30, 2002
    Assignee: Hyundai Electronics Industries Co., Ltd.
    Inventors: Won Soung Park, Phil Goo Kong, Ho Seok Lee, Dong Duk Lee
  • Method for fabricating semiconductor device by using etching polymer
    Publication number: 20010018252
    Abstract: The present invention discloses a method for fabricating a semiconductor device using an etch-resistant polymer. The method includes a step for the in-situ generation of a polymer layer on the exposed surfaces of a photoresist film pattern, a pad oxide film, and a hard mask layer. This polymer acts as a protective film and prevents photoresist erosion during trench etching processes and improves the etch selectivity. As a result, trench structures can be formed more easily and with improved dimensional control.
    Type: Application
    Filed: January 2, 2001
    Publication date: August 30, 2001
    Inventors: Won Soung Park, Phil Goo Kong, Ho Seok Lee, Dong Duk Lee