Patents by Inventor Won-taek Park
Won-taek Park has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240090805Abstract: According to one embodiment, a method by which a device provides a service so as to enable cognitive function rehabilitation by using a virtual object model comprises the steps of: generating a virtual object model in a virtual space matched to correspond to a real space where a subject is located; generating a plurality of first preliminary stimuli for identifying egocentric neglect in the visual range of the subject on the basis of the virtual object model; obtaining and collecting first reaction information about whether the subject has recognized the first preliminary stimuli; determining an egocentric cognition range in which the subject can egocentrically recognize visual stimuli on the basis of the first reaction information; sequentially generating a plurality of second preliminary stimuli for identifying allocentric neglect in the egocentric cognition range on the basis of the virtual object model; obtaining and collecting second reaction information about whether the subject has recognized the seconType: ApplicationFiled: November 5, 2021Publication date: March 21, 2024Inventors: Sung Min CHO, Won Seok KIM, Jung Taek PARK, Young Hoo CHO
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Patent number: 7355357Abstract: A plasma accelerator is provided. The plasma accelerator includes a chamber having a closed top, an opened bottom and a lateral surface, a first coil section comprising a plurality of coils that are connected to one another in series and are wound around the lateral surface of the chamber in opposite directions, and a second coil section comprising a plurality of coils that are wound around the lateral surface of the chamber between coils of the first coil section in opposite directions. Accordingly, it is possible to make the mutual inductance between the coils small, to accurately adjust levels and phase differences of currents to be applied to the coils, and also to simplify the driving circuit.Type: GrantFiled: April 27, 2006Date of Patent: April 8, 2008Assignee: Samsung Electronics Co., Ltd.Inventors: Won-taek Park, Vasily Pashkovski, Yuri Tolmachev
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Patent number: 7309961Abstract: A plasma accelerator (300) is disclosed that has three separate sections of coils (301-316) disposed outside the plasma chamber (321). The separate sections of coils include an initial discharge section (309-316), an acceleration section (303-308), and a nozzle section (301-302). Each section of coils is driven by signals of a different frequency to more efficiently discharge and accelerate a plasma in the plasma accelerator (300).Type: GrantFiled: November 16, 2005Date of Patent: December 18, 2007Assignee: Samsung Electronics Co., Ltd.Inventors: Won-taek Park, Vladimir Volynets
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Patent number: 7276140Abstract: A plasma accelerating apparatus and a plasma processing system having the same are provided. The apparatus includes a circular channel comprising an inner wall, an outer wall, and an end wall connected to an end of the inner wall and the outer wall to form an outlet port at the other ends of the inner and outer walls; a gas supply portion to supply a gas to an inside of the channel; and a plasma generating and accelerating portion to supply ionization energy to the gas inside the channel to generate a plasma beam, and to accelerate the generated plasma beam toward the outlet port, wherein one of the inner wall and outer wall of the channel is inclined at an angle so that the other end of the wall is located closer to a center of the plasma accelerating apparatus.Type: GrantFiled: May 18, 2006Date of Patent: October 2, 2007Assignee: Samsung Electronics Co., Ltd.Inventors: Jin-woo Yoo, Won-taek Park
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Patent number: 7253572Abstract: An electromagnetic induced accelerator based on coil-turn modulation, including inner and outer cylinders with different diameters, the cylinders being coaxially disposed to form a channel which is a spatial portion therebetween; a discharging coil wound spirally inward along the upper surface of the channel for generating plasma by inducing a magnetic field and secondary current in the channel; and inner and outer coils wound helically around along the inner surface of the inner cylinder and the outer surface of the outer cylinder in parallel with each other for accelerating plasma in the direction of a common axis of the inner and outer cylinders by offsetting the magnetic field induced in the direction of the axis.Type: GrantFiled: November 29, 2005Date of Patent: August 7, 2007Assignee: Samsung Electronics Co., Ltd.Inventors: Won-taek Park, Vladimir Volynets, Young-eal Kim
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Publication number: 20070068457Abstract: A plasma accelerator is provided. The plasma accelerator includes a chamber having a closed top, an opened bottom and a lateral surface, a first coil section comprising a plurality of coils that are connected to one another in series and are wound around the lateral surface of the chamber in opposite directions, and a second coil section comprising a plurality of coils that are wound around the lateral surface of the chamber between coils of the first coil section in opposite directions. Accordingly, it is possible to make the mutual inductance between the coils small, to accurately adjust levels and phase differences of currents to be applied to the coils, and also to simplify the driving circuit.Type: ApplicationFiled: April 27, 2006Publication date: March 29, 2007Applicant: SAMSUNG ELECTRONICS CO., LTD.Inventors: Won-taek Park, Vasily Pashkovski, Yuri Tolmachev
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Publication number: 20060284563Abstract: A plasma accelerating apparatus and a plasma processing system having the same are provided. The apparatus includes a circular channel comprising an inner wall, an outer wall, and an end wall connected to an end of the inner wall and the outer wall to form an outlet port at the other ends of the inner and outer walls; a gas supply portion to supply a gas to an inside of the channel; and a plasma generating and accelerating portion to supply ionization energy to the gas inside the channel to generate a plasma beam, and to accelerate the generated plasma beam toward the outlet port, wherein one of the inner wall and outer wall of the channel is inclined at an angle so that the other end of the wall is located closer to a center of the plasma accelerating apparatus.Type: ApplicationFiled: May 18, 2006Publication date: December 21, 2006Inventors: Jin-woo Yoo, Won-taek Park
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Publication number: 20060113182Abstract: A plasma accelerator (300) is disclosed that has three separate sections of coils (301-316) disposed outside the plasma chamber (321). The separate sections of coils include an initial discharge section (309-316), an acceleration section (303-308), and a nozzle section (301-302). Each section of coils is driven by signals of a different frequency to more efficiently discharge and accelerate a plasma in the plasma accelerator (300).Type: ApplicationFiled: November 16, 2005Publication date: June 1, 2006Applicant: Samsung Electronics Co., Ltd.Inventors: Won-taek Park, Vladimir Volynets
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Publication number: 20060113928Abstract: An electromagnetic induced accelerator based on coil-turn modulation, including inner and outer cylinders with different diameters, the cylinders being coaxially disposed to form a channel which is a spatial portion therebetween; a discharging coil wound spirally inward along the upper surface of the channel for generating plasma by inducing a magnetic field and secondary current in the channel; and inner and outer coils wound helically around along the inner surface of the inner cylinder and the outer surface of the outer cylinder in parallel with each other for accelerating plasma in the direction of a common axis of the inner and outer cylinders by offsetting the magnetic field induced in the direction of the axis.Type: ApplicationFiled: November 29, 2005Publication date: June 1, 2006Inventors: Won-taek Park, Vladimir Volynets, Young-eal Kim
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Publication number: 20060108931Abstract: An electromagnetic accelerator having a nozzle part. The electromagnetic accelerator includes an initial discharge part for generating a plasma, an acceleration part and a nozzle part for accelerating the plasma. A composite wave, which is synthesized from a plasma generation frequency and a plasma acceleration frequency, is applied as a current to the electromagnetic accelerator. Accordingly, the uniformity among the plasma generation, the plasma acceleration, and the plasma flow can be ensured, and the plasma generation efficiency and the plasma acceleration efficiency can be maximized.Type: ApplicationFiled: November 18, 2005Publication date: May 25, 2006Inventors: Won-taek Park, Jin-woo Yoo, Vladimir Volynets
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Patent number: 6903521Abstract: An electromagnetic induced accelerator includes internal and external circular loop inductors for inducing a magnetic field when a current is applied to the internal and external circular loop inductors in a same direction, the internal and external circular loop inductors being spaced apart from each other by a predetermined distance and disposed coaxially and parallel to each other; a channel, which includes dielectric layers contacting the internal and external circular loop inductors, disposed between the internal and external circular loop inductors, wherein a secondary current is induced in the channel between the dielectric layers by the induced, magnetic field; and a discharging coil for supplying a pulse energy to the channel and for generating a plasma.Type: GrantFiled: December 15, 2003Date of Patent: June 7, 2005Assignee: Samsung Electronics Co., Ltd.Inventor: Won-taek Park
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Publication number: 20040124793Abstract: An electromagnetic induced accelerator includes internal and external circular loop inductors for inducing a magnetic field when a current is applied to the internal and external circular loop inductors in a same direction, the internal and external circular loop inductors being spaced apart from each other by a predetermined distance and disposed coaxially and parallel to each other; a channel, which includes dielectric layers contacting the internal and external circular loop inductors, disposed between the internal and external circular loop inductors, wherein a secondary current is induced in the channel between the dielectric layers by the induced, magnetic field; and a discharging coil for supplying a pulse energy to the channel and for generating a plasma.Type: ApplicationFiled: December 15, 2003Publication date: July 1, 2004Inventor: Won-Taek Park