Patents by Inventor Won-Hyuk Lee

Won-Hyuk Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12294571
    Abstract: Disclosed are an apparatus for managing quantum keys and a method of operating the same to rapidly and flexibly provide quantum keys for network services by effectively and efficiently distributing quantum keys in a quantum-secured network.
    Type: Grant
    Filed: February 4, 2022
    Date of Patent: May 6, 2025
    Assignee: KOREA INSTITUTE OF SCIENCE & TECHNOLOGY INFORMATION
    Inventors: Chan Kyun Lee, Yong Hwan Kim, Kyu Seok Shim, Won Hyuk Lee
  • Patent number: 12244407
    Abstract: The present disclosure relates to a fiber network operation apparatus for providing a method of determining a physical path in consideration of network performance and resource efficiency in a space division multiplexing-based fiber network and allocating optical resources according thereto, and an operation method thereof.
    Type: Grant
    Filed: September 15, 2022
    Date of Patent: March 4, 2025
    Assignee: KOREA INSTITUTE OF SCIENCE & TECHNOLOGY INFORMATION
    Inventors: Chan Kyun Lee, Won Hyuk Lee
  • Publication number: 20240340170
    Abstract: The present disclosure relates to a scheme of managing and operating a multi-class quantum key provided in a unit of a quantum key length in a quantum cryptography communication network.
    Type: Application
    Filed: November 29, 2023
    Publication date: October 10, 2024
    Inventors: Chan Kyun LEE, Yong Hwan KIM, Kyu Seok SHIM, Won Hyuk LEE
  • Patent number: 12095574
    Abstract: The present disclosure relates to an eavesdropper detection apparatus and an operating method thereof, capable of effectively detecting an eavesdropper existing between a transmitter and a receiver in bit transmission by a quantum key distribution scheme.
    Type: Grant
    Filed: August 5, 2021
    Date of Patent: September 17, 2024
    Assignee: KOREA INSTITUTE OF SCIENCE & TECHNOLOGY INFORMATION
    Inventors: Chan Kyun Lee, Il Kwon Sohn, Eun Joo Lee, Won Hyuk Lee
  • Publication number: 20240297869
    Abstract: Disclosed are an apparatus for managing quantum keys and a method of operating the same to rapidly and flexibly provide quantum keys for network services by effectively and efficiently distributing quantum keys in a quantum-secured network.
    Type: Application
    Filed: February 4, 2022
    Publication date: September 5, 2024
    Inventors: Chan Kyun LEE, Yong Hwan Kim, Kyu Seok SHIM, Won Hyuk LEE
  • Publication number: 20240235825
    Abstract: The present disclosure according to at least one embodiment provides a quantum key distribution (QKD)-based quantum digital signature method using a trusted node, the QKD-based quantum digital signature method being performed by a trusted node. The method comprises sharing a first secret key with a message-sending node, sharing a second secret key with a message-receiving node, generating a first trusted-node signature by performing a partial QKD process together with the message-sending node, generating a second trusted-node signature by performing a partial QKD process together with the message-receiving node, and verifying a first message with the shared first and second secret keys and with the first and second trusted-node signatures.
    Type: Application
    Filed: June 20, 2023
    Publication date: July 11, 2024
    Applicant: KOREA INSTITUTE OF SCIENCE & TECHNOLOGY INFORMATION
    Inventors: Il Kwon SOHN, Kwang Il BAE, Eun Joo LEE, Won Hyuk LEE
  • Publication number: 20240072140
    Abstract: A semiconductor device includes, first and second source/drain patterns on an active pattern and spaced apart from each other, a first source/drain contact on the first source/drain pattern and including a first source/drain barrier film and a first source/drain filling film on the first source/drain barrier film, a second source/drain contact on the second source/drain pattern, and a gate structure on the active pattern between the first and second source/drain contacts and including a gate electrode, wherein a top surface of the first source/drain contact is lower than a top surface of the gate structure, and a height from a top surface of the active pattern to a top surface of the first source/drain barrier film is less than a height from the top surface of the active pattern to a top surface of the first source/drain filling film.
    Type: Application
    Filed: November 6, 2023
    Publication date: February 29, 2024
    Inventors: Won Hyuk Lee, Jong Chul Park, Sang Duk Park, Hong Sik Shin, Do Haing Lee
  • Publication number: 20240007277
    Abstract: The present disclosure relates to a quantum key distribution network apparatus and an operation method for a quantum key distribution network, for independently operating a data transfer path and a quantum key consumption path on which a quantum key is consumed to encrypt corresponding data in a quantum key distribution network.
    Type: Application
    Filed: September 26, 2022
    Publication date: January 4, 2024
    Inventors: Chan Kyun LEE, Yong Hwan KIM, Kyu Seok SHIM, Won Hyuk LEE
  • Patent number: 11848364
    Abstract: A semiconductor device includes, first and second source/drain patterns on an active pattern and spaced apart from each other, a first source/drain contact on the first source/drain pattern and including a first source/drain barrier film and a first source/drain filling film on the first source/drain barrier film, a second source/drain contact on the second source/drain pattern, and a gate structure on the active pattern between the first and second source/drain contacts and including a gate electrode, wherein a top surface of the first source/drain contact is lower than a top surface of the gate structure, and a height from a top surface of the active pattern to a top surface of the first source/drain barrier film is less than a height from the top surface of the active pattern to a top surface of the first source/drain filling film.
    Type: Grant
    Filed: May 12, 2021
    Date of Patent: December 19, 2023
    Inventors: Won Hyuk Lee, Jong Chul Park, Sang Duk Park, Hong Sik Shin, Do Haing Lee
  • Publication number: 20230283397
    Abstract: The present disclosure relates to a fiber network operation apparatus for providing a method of determining a physical path in consideration of network performance and resource efficiency in a space division multiplexing-based fiber network and allocating optical resources according thereto, and an operation method thereof.
    Type: Application
    Filed: September 15, 2022
    Publication date: September 7, 2023
    Inventors: Chan Kyun LEE, Won Hyuk LEE
  • Publication number: 20220225916
    Abstract: The present invention can provide an apparatus and a method for non-contact measuring momentum, the apparatus and the method being capable of quantitatively measuring the dynamic activity and static activity of a subject by using a plurality of IR-UWB radars and, particularly, capable of measuring, in real time, some activities of the human body and general activity of the human body by distinguishing moving activity of the subject from non-moving activity. Therefore, the activity of a subject is non-contact measured so as to minimize user inconvenience, thereby facilitating performance of an ADHD test even for a subject in a young age group, and thus ADHD can be diagnosed early.
    Type: Application
    Filed: May 15, 2020
    Publication date: July 21, 2022
    Applicant: IUCF-HYU (INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY)
    Inventors: Sung Ho CHO, Hyun Kyung PARK, Won Hyuk LEE, Dae Hyeon YIM
  • Publication number: 20220224458
    Abstract: The present disclosure relates to an eavesdropper detection apparatus and an operating method thereof, capable of effectively detecting an eavesdropper existing between a transmitter and a receiver in bit transmission by a quantum key distribution scheme.
    Type: Application
    Filed: August 5, 2021
    Publication date: July 14, 2022
    Inventors: Chan Kyun LEE, Il Kwon SOHN, Eun Joo LEE, Won Hyuk LEE
  • Publication number: 20220109055
    Abstract: A semiconductor device includes, first and second source/drain patterns on an active pattern and spaced apart from each other, a first source/drain contact on the first source/drain pattern and including a first source/drain barrier film and a first source/drain filling film on the first source/drain barrier film, a second source/drain contact on the second source/drain pattern, and a gate structure on the active pattern between the first and second source/drain contacts and including a gate electrode, wherein a top surface of the first source/drain contact is lower than a top surface of the gate structure, and a height from a top surface of the active pattern to a top surface of the first source/drain barrier film is less than a height from the top surface of the active pattern to a top surface of the first source/drain filling film.
    Type: Application
    Filed: May 12, 2021
    Publication date: April 7, 2022
    Inventors: Won Hyuk Lee, Jong Chul Park, Sang Duk Park, Hong Sik Shin, Do Haing Lee
  • Patent number: 10381345
    Abstract: Provided is a semiconductor device having an enhanced characteristic and a resistor structure satisfying a desired target resistor value of a resistor device. A semiconductor device includes: a lower interlayer insulating layer disposed on a substrate comprising a resistor area; a resistor structure comprising a resistor layer and an etch stop pattern sequentially stacked on the lower interlayer insulating layer of the resistor area; an upper interlayer insulating layer configured to cover the resistor structure and disposed on the lower interlayer insulating layer; a resistor contact structure configured to pass through the upper interlayer insulating layer and the etch stop pattern and contact the resistor layer; and a resistor contact spacer disposed between the upper interlayer insulating layer, the etch stop pattern, and the resistor contact structure.
    Type: Grant
    Filed: December 21, 2017
    Date of Patent: August 13, 2019
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Hong-sik Shin, Do-hyoung Kim, Doo-young Lee, Hyon-wook Ra, Seo-bum Lee, Won-hyuk Lee
  • Publication number: 20180211952
    Abstract: Provided is a semiconductor device having an enhanced characteristic and a resistor structure satisfying a desired target resistor value of a resistor device. A semiconductor device includes: a lower interlayer insulating layer disposed on a substrate comprising a resistor area; a resistor structure comprising a resistor layer and an etch stop pattern sequentially stacked on the lower interlayer insulating layer of the resistor area; an upper interlayer insulating layer configured to cover the resistor structure and disposed on the lower interlayer insulating layer; a resistor contact structure configured to pass through the upper interlayer insulating layer and the etch stop pattern and contact the resistor layer; and a resistor contact spacer disposed between the upper interlayer insulating layer, the etch stop pattern, and the resistor contact structure.
    Type: Application
    Filed: December 21, 2017
    Publication date: July 26, 2018
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Hong-sik Shin, Do-hyoung Kim, Doo-young Lee, Hyon-wook Ra, Seo-bum Lee, Won-hyuk Lee
  • Patent number: 9605738
    Abstract: A torque converter includes a torsional damper assembly. The torsional damper assembly includes a damper. The damper has an electromagnetic coil and a magnetorheological fluid. The electromagnetic coil is positioned such that a magnetic field from the electromagnetic coil adjusts a viscosity of the magnetorheological fluid when a current flows through the electromagnetic coil.
    Type: Grant
    Filed: July 9, 2015
    Date of Patent: March 28, 2017
    Assignee: ZF FRIEDRICHSHAFEN AG
    Inventors: Odilo Raphael Nawratil, James Frederick Vorberger, II, Won Hyuk Lee
  • Publication number: 20170009865
    Abstract: A torque converter includes a torsional damper assembly. The torsional damper assembly includes a damper. The damper has an electromagnetic coil and a magnetorheological fluid. The electromagnetic coil is positioned such that a magnetic field from the electromagnetic coil adjusts a viscosity of the magnetorheological fluid when a current flows through the electromagnetic coil.
    Type: Application
    Filed: July 9, 2015
    Publication date: January 12, 2017
    Inventors: Odilo Raphael Nawratil, James Frederick Vorberger, II, Won Hyuk Lee
  • Patent number: 9429233
    Abstract: A brake clutch for an automatic transmission includes a piston that is positioned adjacent a multi-disc clutch pack and is movable between an engaged configuration and a disengaged configuration relative to the multi-disc clutch pack. Teeth of a plurality of ratcheting teeth of the piston are meshed with teeth of a plurality of ratcheting teeth of a retaining assembly of the brake clutch. A related automatic transmission is also provided.
    Type: Grant
    Filed: June 3, 2015
    Date of Patent: August 30, 2016
    Assignee: ZF FRIEDRICHSHAFEN AG
    Inventors: Odilo Raphael Nawratil, James Frederick Vorberger, II, Won Hyuk Lee
  • Patent number: 5527719
    Abstract: A process for formation of an MOS semiconductor device having an LDD structure is disclosed, which may include the steps of: forming an active region and an isolation region on a semiconductor substrate; forming a first insulating layer on the surface of the substrate; forming a gate electrode on the first insulating layer in the active region; foxing a layer of a heat sensitive fluid material on the gate electrode; carrying out a first ion implantation into the substrate; carrying out a first heat treatment on the heat sensitive layer; carrying out a second ion implantation into the substrate; removing the residual fluid material; forming a second insulating layer on the whole surface of the wafer; and carrying out a second heat treatment on the wafer.
    Type: Grant
    Filed: December 16, 1994
    Date of Patent: June 18, 1996
    Assignee: Goldstar Electron Co., Ltd.
    Inventors: Gum-Jin Park, Chang-Jae Lee, Won-Hyuk Lee