Patents by Inventor Won Woong PARK

Won Woong PARK has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10480076
    Abstract: A plasma enhanced chemical vapor deposition (PECVD) apparatus including a chamber; an upper electrode in the chamber; a spray unit in the upper electrode to spray a gas introduced from outside the chamber toward a substrate inside the chamber; a susceptor on which the substrate is mountable; a plurality of mask supports in a mask frame at an edge of the susceptor, the mask supports being formed of a conductive material that provides elastic force by supporting a mask to maintain and control a level of the mask; and a power supply unit to supply power to the upper electrode.
    Type: Grant
    Filed: February 22, 2016
    Date of Patent: November 19, 2019
    Assignee: Samsung Display Co., Ltd.
    Inventors: Jai Hyuk Choi, Won Woong Park, Sung Hun Key, Min Soo Kim, Byeong Chun Lee, Suk Won Jung, Hyun Woo Joo, Myung Soo Huh
  • Publication number: 20170002468
    Abstract: A plasma enhanced chemical vapor deposition (PECVD) apparatus including a chamber; an upper electrode in the chamber; a spray unit in the upper electrode to spray a gas introduced from outside the chamber toward a substrate inside the chamber; a susceptor on which the substrate is mountable; a plurality of mask supports in a mask frame at an edge of the susceptor, the mask supports being formed of a conductive material that provides elastic force by supporting a mask to maintain and control a level of the mask; and a power supply unit to supply power to the upper electrode.
    Type: Application
    Filed: February 22, 2016
    Publication date: January 5, 2017
    Inventors: Jai Hyuk CHOI, Won Woong PARK, Sung Hun KEY, Min Soo KIM, Byeong Chun LEE, Suk Won JUNG, Hyun Woo JOO, Myung Soo HUH