Patents by Inventor Woo-Jae CHUNG
Woo-Jae CHUNG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11957697Abstract: Disclosed is a viral receptor that contains a sialic acid compound at one side thereof to provide binding affinity to a virus, and contains a lipid at the other side thereof, and that can be widely used for the treatment of viral infections based on this characteristic.Type: GrantFiled: September 17, 2021Date of Patent: April 16, 2024Assignee: MVRIX CO., LTD.Inventors: Woo Jae Chung, Dae Hyuk Kweon, Jinhyo Chung, Caleb Hong
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Patent number: 11541100Abstract: The present invention relates to a nanoperforator having a lipid-bilayer nanodisc and a membrane-structured protein surrounding the nanodisc and to a pharmaceutical composition having the nanoperforator as an active ingredient for preventing or treating viral infectious diseases. The use of the lipid-bilayer nanoperforator provided in the present invention can lead to the safe prevention or treatment of a disease caused by viral infection regardless of whether the virus is a variant or not, and thus the present invention can be widely used for the safe and effective treatment of viral infectious diseases.Type: GrantFiled: July 14, 2017Date of Patent: January 3, 2023Assignee: MVRIX CO., LTD.Inventors: Dae-Hyuk Kweon, Byoungjae Kong, Woo-Jae Chung, Baik Lin Seong, Sukchan Lee
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Publication number: 20220088046Abstract: Disclosed is a viral receptor that contains a sialic acid compound at one side thereof to provide binding affinity to a virus, and contains a lipid at the other side thereof, and that can be widely used for the treatment of viral infections based on this characteristic.Type: ApplicationFiled: September 17, 2021Publication date: March 24, 2022Applicant: MVRIX Co., Ltd.Inventors: Woo Jae Chung, Dae Hyuk Kweon, Jinhyo Chung, Caleb Hong
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Patent number: 10801054Abstract: The present invention provides, inter alia, a device comprising a colorimetric detection layer configured to undergo a color change upon interaction with a first analyte of interest. The detection layer comprises a first plurality of self-assembled fiber bundles. At least a fraction of the fiber bundles undergo a change from a first conformation to a second conformation upon interaction with the first analyte of interest, thereby undergoing a color change. The invention also provides a method for using the system to detect an analyte of interest.Type: GrantFiled: June 4, 2019Date of Patent: October 13, 2020Assignee: The Regents of the University of CaliforniaInventors: Seung-Wuk Lee, Woo-Jae Chung, Jin-Woo Oh
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Patent number: 10756112Abstract: Provided herein is a semiconductor device and a method of manufacturing the same. The method includes alternately forming sacrificial layers and interlayer insulating layers on a semiconductor substrate. The method further includes forming a slit to expose the sacrificial layers by etching through the sacrificial layers and the interlayer insulating layers and forming interlayer openings by removing the exposed sacrificial layers. The method also includes depositing a conductive material in the interlayer openings and forming seams in which core patterns are deposited. The method additionally includes oxidizing a portion of the conductive material in the interlayer openings using a wet etching process and forming conductive patterns by removing the oxidized portion of the conductive material from the interlayer openings while leaving the seams intact.Type: GrantFiled: January 3, 2020Date of Patent: August 25, 2020Assignee: SK hynix Inc.Inventors: Seung Cheol Lee, Woo Jae Chung, Choung Sik Song
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Patent number: 10714499Abstract: The method of manufacturing a semiconductor device include: forming conductive patterns in interlayer spaces between interlayer insulating layers, the conductive patterns being separated from each other by a slit passing through the interlayer insulating layers, wherein the conductive patterns include a first by-product; generating a second by-product of a gas phase by reacting the first by-product remaining in the conductive patterns with source gas; and performing an out-gassing process to remove the second by-product.Type: GrantFiled: June 25, 2019Date of Patent: July 14, 2020Assignee: SK hynix Inc.Inventors: Won Joon Choi, Min Sung Ko, Kyeong Bae Kim, Jong Gi Kim, Dong Sun Sheen, Jung Myoung Shim, Young Ho Yang, Hyeng Woo Eom, Kwang Wook Lee, Woo Jae Chung
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Patent number: 10682333Abstract: The present invention relates to a composition for inhibiting the formation of a SNARE complex, containing myricetin derivatives, and having novel structures and obtained by the acylation of myricetin, laricitrin, combretol, or syringetin. The myricetin derivatives are considered to exhibit an effect of being bioconverted into myricetin in a cell. The myricetin derivatives lost the dark color of conventional myricetin and properties thereof were changed such that the myricetin derivatives have properties of photostability and fat solubility. Therefore, since stable form myricetin derivatives are absorbed into a cell such that an activity, possessed by normal myricetin, of inhibiting the formation of a SNARE complex are exhibited, the present invention can exhibit an excellent function as a SNARE targeting prodrug, and as a composition for inhibiting the formation of a SNARE complex, containing the same.Type: GrantFiled: July 29, 2016Date of Patent: June 16, 2020Assignee: Research & Business Foundation Sungkyunkwan UniversityInventors: Dae Hyuk Kweon, Joon Bum Park, Young Hun Jung, Woo Jae Chung, Pa Ul Heo
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Publication number: 20200144289Abstract: Provided herein is a semiconductor device and a method of manufacturing the same. The method includes alternately forming sacrificial layers and interlayer insulating layers on a semiconductor substrate. The method further includes forming a slit to expose the sacrificial layers by etching through the sacrificial layers and the interlayer insulating layers and forming interlayer openings by removing the exposed sacrificial layers. The method also includes depositing a conductive material in the interlayer openings and forming seams in which core patterns are deposited. The method additionally includes oxidizing a portion of the conductive material in the interlayer openings using a wet etching process and forming conductive patterns by removing the oxidized portion of the conductive material from the interlayer openings while leaving the seams intact.Type: ApplicationFiled: January 3, 2020Publication date: May 7, 2020Applicant: SK hynix Inc.Inventors: Seung Cheol LEE, Woo Jae CHUNG, Choung Sik SONG
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Patent number: 10590459Abstract: The present invention provides, inter alia, a device comprising a colorimetric detection layer configured to undergo a color change upon interaction with a first analyte of interest. The detection layer comprises a first plurality of self-assembled fiber bundles. At least a fraction of the fiber bundles undergo a change from a first conformation to a second conformation upon interaction with the first analyte of interest, thereby undergoing a color change. The invention also provides a method for using the system to detect an analyte of interest.Type: GrantFiled: December 22, 2014Date of Patent: March 17, 2020Assignee: The Regents of the University of CaliforniaInventors: Seung-Wuk Lee, Woo-Jae Chung, Jin-woo Oh
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Patent number: 10573663Abstract: Provided herein is a semiconductor device and a method of manufacturing the same. The method includes alternately forming sacrificial layers and interlayer insulating layers on a semiconductor substrate. The method further includes forming a slit to expose the sacrificial layers by etching through the sacrificial layers and the interlayer insulating layers and forming interlayer openings by removing the exposed sacrificial layers. The method also includes depositing a conductive material in the interlayer openings and forming seams in which core patterns are deposited. The method additionally includes oxidizing a portion of the conductive material in the interlayer openings using a wet etching process and forming conductive patterns by removing the oxidized portion of the conductive material from the interlayer openings while leaving the seams intact.Type: GrantFiled: May 13, 2019Date of Patent: February 25, 2020Assignee: SK hynix Inc.Inventors: Seung Cheol Lee, Woo Jae Chung, Choung sik Song
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Publication number: 20190390243Abstract: The present invention provides, inter alia, a device comprising a colorimetric detection layer configured to undergo a color change upon interaction with a first analyte of interest. The detection layer comprises a first plurality of self-assembled fiber bundles. At least a fraction of the fiber bundles undergo a change from a first conformation to a second conformation upon interaction with the first analyte of interest, thereby undergoing a color change. The invention also provides a method for using the system to detect an analyte of interest.Type: ApplicationFiled: June 4, 2019Publication date: December 26, 2019Inventors: SEUNG-WUK LEE, Woo-Jae CHUNG, Jin-Woo OH
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Publication number: 20190319045Abstract: The method of manufacturing a semiconductor device include: forming conductive patterns in interlayer spaces between interlayer insulating layers, the conductive patterns being separated from each other by a slit passing through the interlayer insulating layers, wherein the conductive patterns include a first by-product; generating a second by-product of a gas phase by reacting the first by-product remaining in the conductive patterns with source gas; and performing an out-gassing process to remove the second by-product.Type: ApplicationFiled: June 25, 2019Publication date: October 17, 2019Inventors: Won Joon CHOI, Min Sung KO, Kyeong Bae KIM, Jong Gi KIM, Dong Sun SHEEN, Jung Myoung SHIM, Young Ho YANG, Hyeng Woo EOM, Kwang Wook LEE, Woo Jae CHUNG
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Publication number: 20190267395Abstract: Provided herein is a semiconductor device and a method of manufacturing the same. The method includes alternately forming sacrificial layers and interlayer insulating layers on a semiconductor substrate. The method further includes forming a slit to expose the sacrificial layers by etching through the sacrificial layers and the interlayer insulating layers and forming interlayer openings by removing the exposed sacrificial layers. The method also includes depositing a conductive material in the interlayer openings and forming seams in which core patterns are deposited. The method additionally includes oxidizing a portion of the conductive material in the interlayer openings using a wet etching process and forming conductive patterns by removing the oxidized portion of the conductive material from the interlayer openings while leaving the seams intact.Type: ApplicationFiled: May 13, 2019Publication date: August 29, 2019Applicant: SK hynix Inc.Inventors: Seung Cheol LEE, Woo Jae CHUNG, Choung Sik SONG
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Publication number: 20190255145Abstract: The present invention relates to a nanoperforator having a lipid-bilayer nanodisc and a membrane-structured protein surrounding the nanodisc and to a pharmaceutical composition having the nanoperforator as an active ingredient for preventing or treating viral infectious diseases. The use of the lipid-bilayer nanoperforator provided in the present invention can lead to the safe prevention or treatment of a disease caused by viral infection regardless of whether the virus is a variant or not, and thus the present invention can be widely used for the safe and effective treatment of viral infectious diseases.Type: ApplicationFiled: July 14, 2017Publication date: August 22, 2019Applicants: RESEARCH & BUSINESS FOUNDATION SUNGKYUNKWAN UNIVERSITY, YONSEI UNIVERSITY, UNIVERSITY-INDUSTRY FOUNDATION (UIF)Inventors: Dae-Hyuk KWEON, Byoungjae Kong, Woo-Jae Chung, Baik Lin Seong, Sukchan Lee
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Patent number: 10373973Abstract: The method of manufacturing a semiconductor device include: forming conductive patterns in interlayer spaces between interlayer insulating layers, the conductive patterns being separated from each other by a slit passing through the interlayer insulating layers, wherein the conductive patterns include a first by-product; generating a second by-product of a gas phase by reacting the first by-product remaining in the conductive patterns with source gas; and performing an out-gassing process to remove the second by-product.Type: GrantFiled: April 24, 2018Date of Patent: August 6, 2019Assignee: SK hynix Inc.Inventors: Won Joon Choi, Min Sung Ko, Kyeong Bae Kim, Jong Gi Kim, Dong Sun Sheen, Jung Myoung Shim, Young Ho Yang, Hyeng Woo Eom, Kwang Wook Lee, Woo Jae Chung
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Patent number: 10332909Abstract: Provided herein is a semiconductor device and a method of manufacturing the same. The method includes alternately forming sacrificial layers and interlayer insulating layers on a semiconductor substrate. The method further includes forming a slit to expose the sacrificial layers by etching through the sacrificial layers and the interlayer insulating layers and forming interlayer openings by removing the exposed sacrificial layers. The method also includes depositing a conductive material in the interlayer openings and forming seams in which core patterns are deposited. The method additionally includes oxidizing a portion of the conductive material in the interlayer openings using a wet etching process and forming conductive patterns by removing the oxidized portion of the conductive material from the interlayer openings while leaving the seams intact.Type: GrantFiled: May 22, 2018Date of Patent: June 25, 2019Assignee: SK hynix Inc.Inventors: Seung Cheol Lee, Woo Jae Chung, Choung Sik Song
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Publication number: 20190115360Abstract: Provided herein is a semiconductor device and a method of manufacturing the same. The method includes alternately forming sacrificial layers and interlayer insulating layers on a semiconductor substrate. The method further includes forming a slit to expose the sacrificial layers by etching through the sacrificial layers and the interlayer insulating layers and forming interlayer openings by removing the exposed sacrificial layers. The method also includes depositing a conductive material in the interlayer openings and forming seams in which core patterns are deposited. The method additionally includes oxidizing a portion of the conductive material in the interlayer openings using a wet etching process and forming conductive patterns by removing the oxidized portion of the conductive material from the interlayer openings while leaving the seams intact.Type: ApplicationFiled: May 22, 2018Publication date: April 18, 2019Applicant: SK hynix Inc.Inventors: Seung Cheol LEE, Woo Jae CHUNG, Choung Sik SONG
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Publication number: 20190081066Abstract: The method of manufacturing a semiconductor device include: forming conductive patterns in interlayer spaces between interlayer insulating layers, the conductive patterns being separated from each other by a slit passing through the interlayer insulating layers, wherein the conductive patterns include a first by-product; generating a second by-product of a gas phase by reacting the first by-product remaining in the conductive patterns with source gas; and performing an out-gassing process to remove the second by-product.Type: ApplicationFiled: April 24, 2018Publication date: March 14, 2019Inventors: Won Joon CHOI, Min Sung KO, Kyeong Bae KIM, Jong Gi KIM, Dong Sun SHEEN, Jung Myoung SHIM, Young Ho YANG, Hyeng Woo EOM, Kwang Wook LEE, Woo Jae CHUNG
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Publication number: 20180222878Abstract: The present invention relates to a composition for inhibiting the formation of a SNARE complex, containing myricetin derivatives, and having novel structures and obtained by the acylation of myricetin, laricitrin, combretol, or syringetin. The myricetin derivatives are considered to exhibit an effect of being bioconverted into myricetin in a cell. The myricetin derivatives lost the dark color of conventional myricetin and properties thereof were changed such that the myricetin derivatives have properties of photostability and fat solubility. Therefore, since stable form myricetin derivatives are absorbed into a cell such that an activity, possessed by normal myricetin, of inhibiting the formation of a SNARE complex are exhibited, the present invention can exhibit an excellent function as a SNARE targeting prodrug, and as a composition for inhibiting the formation of a SNARE complex, containing the same.Type: ApplicationFiled: July 29, 2016Publication date: August 9, 2018Applicant: RESEARCH & BUSINESS FOUNDATION SUNGKYUNKWAN UNIVERSITYInventors: Dae Hyuk KWEON, Joon Bum PARK, Young Hun JUNG, Woo Jae CHUNG, Pa Ul HEO
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Publication number: 20160312262Abstract: The present invention provides, inter alia, a device comprising a colorimetric detection layer configured to undergo a color change upon interaction with a first analyte of interest. The detection layer comprises a first plurality of self-assembled fiber bundles. At least a fraction of the fiber bundles undergo a change from a first conformation to a second conformation upon interaction with the first analyte of interest, thereby undergoing a color change. The invention also provides a method for using the system to detect an analyte of interest.Type: ApplicationFiled: December 22, 2014Publication date: October 27, 2016Inventors: Seung-Wuk LEE, Woo-Jae CHUNG, Jin-woo OH