Abstract: The present application can provide a thin polarizing plate having excellent antireflection performance in all directions including the side as well as the front, and having excellent folding durability and durability against short wavelengths. In addition, the present application can provide an organic light-emitting display device to which the polarizing plate is applied and a display device comprising the same.

Abstract: Disclosed are semiconductor fabrication methods and optical proximity correction (OPC) methods. The semiconductor fabrication method comprises performing OPC on a design pattern of a layout to generate a corrected layout, and forming a photoresist pattern on a substrate by using a photomask manufactured with the corrected layout. Performing the OPC includes generating shape points on a contour of the design pattern, producing a hash value of the shape point, selecting a first unique shape point that represents first shape points, determining a first correction bias of the first unique shape point, and creating a correction pattern by applying the first correction bias in common to the first shape points. Producing the hash value includes generating a query range around a target shape point and, based on geometry analysis in the query range, producing the hash value.

Abstract: A method of fabricating a semiconductor device is disclosed. The method includes performing an optical proximity correction (OPC) on a design pattern of a layout and forming a photoresist pattern on a substrate using a photomask manufacture based the corrected layout. The performing of the OPC includes analyzing a cell hierarchy to choose a representative cell in the layout, dividing the design pattern in the representative cell into a plurality of segments including first segments, choosing a first unique segment, which represents the first segments, from the plurality of segments, generating a first correction bias of the first unique segment, applying the first correction bias to all of the first segments to generate a correction pattern, and applying a correction result of the representative cell to other cells that are included in the layout and are of a same type as the representative cell.

Abstract: Disclosed is an operating method of an electronic device for manufacture of a semiconductor device. The operating method includes receiving a layout image of the semiconductor device, generating an intermediate image by generating assist features based on main features of the layout image, evaluating a process result by performing simulation based on the intermediate image, and correcting the intermediate image by correcting shapes of the main features and/or the assist features of the intermediate image based on the process result.

Abstract: Disclosed is an operating method of an electronic device for manufacture of a semiconductor device. The operating method includes receiving a layout image of the semiconductor device, generating an intermediate image by generating assist features based on main features of the layout image, evaluating a process result by performing simulation based on the intermediate image, and correcting the intermediate image by correcting shapes of the main features and/or the assist features of the intermediate image based on the process result.

Abstract: The present application provides an optical film. By controlling transmittance of a liquid crystal layer comprising a radical initiator for the maximum absorption wavelength of the radical initiator, the present application can provide an optical film having a liquid crystal layer having excellent resistance to external stimuli and excellent optical properties. Such an optical film can have various forms and can be used in various fields.

Abstract: The present application can provide a thin polarizing plate having excellent antireflection performance in all directions including the side as well as the front, and having excellent folding durability and durability against short wavelengths. In addition, the present application can provide an organic light-emitting display device to which the polarizing plate is applied and a display device comprising the same.

Abstract: Disclosed are reticle fabrication methods and semiconductor device fabrication methods. The reticle fabrication method includes performing a photolithography process on a test substrate using a first reticle having first patterns, measuring the test substrate to obtain measured images, designing a second reticle having second patterns, redesigning the second reticle based on a margin of the photolithography process, and manufacturing the redesigned second reticle. Redesigning the second reticle includes obtaining sample images from the measured images when the first patterns are the same as the second patterns, obtaining contour images that have contours of sample patterns in the sample images, overlapping the contours to obtain a contour overlay value, and comparing the contour overlay value with a reference value to determine defects of the second patterns.

Abstract: A polarizer having low orthogonal transmittance for visible light and high orthogonal transmittance for near infrared rays, a polarizing plate comprising the same, a camera comprising the polarizer or the polarizing plate, the camera configured to include a visible light sensor part and a near infrared sensor part integrated therein and applied for an augmented reality device, and a method for preparing the polarizer.

Abstract: The present application provides an optical film. By controlling transmittance of a liquid crystal layer comprising a radical initiator for the maximum absorption wavelength of the radical initiator, the present application can provide an optical film having a liquid crystal layer having excellent resistance to external stimuli and excellent optical properties. Such an optical film can have various forms and can be used in various fields.

Abstract: Disclosed are reticle fabrication methods and semiconductor device fabrication methods. The reticle fabrication method includes performing a photolithography process on a test substrate using a first reticle having first patterns, measuring the test substrate to obtain measured images, designing a second reticle having second patterns, redesigning the second reticle based on a margin of the photolithography process, and manufacturing the redesigned second reticle. Redesigning the second reticle includes obtaining sample images from the measured images when the first patterns are the same as the second patterns, obtaining contour images that have contours of sample patterns in the sample images, overlapping the contours to obtain a contour overlay value, and comparing the contour overlay value with a reference value to determine defects of the second patterns.

Abstract: Disclosed is a polarizing plate including a polarizing film and a protective film provided on the polarizing film, and a display device having the same.

Abstract: Provided are a polarizing plate including a polarizing film and protective films provided on both sides of the polarizing film and a display device including the same.

Abstract: Provided are a polarizing plate including a polarizing film and protective films provided on both sides of the polarizing film and a display device including the same.

Abstract: Disclosed is a polarizing plate including a polarizing film and a protective film provided on the polarizing film, and a display device having the same.