Patents by Inventor Woodrow J. Olsen

Woodrow J. Olsen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • System and method for using a two part cover and a box for protecting a reticle
    Patent number: 8446570
    Abstract: Systems and methods to protect a mask from being contaminated by airborne particles are described. The systems and methods include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside a pod or box that can be used to transport the cover through a lithography system from an atmospheric section to a vacuum section. While in the vacuum section, the removable cover can be moved during an exposure process during which a pattern on the reticle can be formed on a wafer.
    Type: Grant
    Filed: September 15, 2010
    Date of Patent: May 21, 2013
    Assignee: ASML Holding N.V.
    Inventors: Santiago Del Puerto, Erik R. Loopstra, Andrew Massar, Duane P. Kish, Abdullah Alikhan, Woodrow J. Olsen, Jonathan H. Feroce
  • System and Method for Using a Two Part Cover and a Box for Protecting a Reticle
    Publication number: 20130010277
    Abstract: Systems and methods to protect a mask from being contaminated by airborne particles are described. The systems and methods include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside a pod or box that can be used to transport the cover through a lithography system from an atmospheric section to a vacuum section. While in the vacuum section, the removable cover can be moved during an exposure process during which a pattern on the reticle can be formed on a wafer.
    Type: Application
    Filed: September 14, 2012
    Publication date: January 10, 2013
    Applicant: ASML Holding N.V.
    Inventors: Santiago del Puerto, Erik R. Loopstra, Andrew Massar, Duane P. Kish, Abdullah Alikhan, Woodrow J. Olsen, Jonathan H. Feroce
  • System and method for using a two part cover and a box for protecting a reticle
    Patent number: 7830497
    Abstract: Systems and methods to protect a mask from being contaminated by airborne particles are described. The systems and methods include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside a pod or box that can be used to transport the cover through a lithography system from an atmospheric section to a vacuum section. While in the vacuum section, the removable cover can be moved during an exposure process during which a pattern on the reticle can be formed on a wafer.
    Type: Grant
    Filed: April 18, 2007
    Date of Patent: November 9, 2010
    Assignee: ASML Holding N.V.
    Inventors: Santiago del Puerto, Erik R. Loopstra, Andrew Massar, Duane P. Kish, Abdullah Alikhan, Woodrow J. Olsen, Jonathan H. Feroce