Patents by Inventor Wook-Sang Jang

Wook-Sang Jang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250003536
    Abstract: Proposed are a sealing member that prevents fluid leakage even in a cryogenic environment, a fluid supplying device including the sealing member, and a substrate processing apparatus including the fluid supplying device. A sealing member according to an embodiment includes a sealing jacket having a ring shape, an upper O-ring mounted on an upper surface of the sealing jacket, a lower O-ring mounted on a lower surface of the sealing jacket, and a pressure ring inserted into a receiving portion of the sealing jacket and pressing the upper surface and the lower surface.
    Type: Application
    Filed: March 17, 2024
    Publication date: January 2, 2025
    Applicant: SEMES CO., LTD.
    Inventors: Joon Hee LEE, Wook Sang JANG, Dong Uk KIM
  • Publication number: 20240404793
    Abstract: Disclosed are a substrate treating apparatus and a fluid supply unit that reduce the outer diameter while preventing condensation from occurring even without wrapping a pipe supplying a refrigerant with a heat insulating material. The substrate treating apparatus includes: a process chamber having a treatment space for treating a substrate; an inner pipe connected to the process chamber and for supplying a heat exchange fluid to an interior of the process chamber; a cooler connected to the inner pipe, and for cooling the heat exchange fluid and supplying the cooled heat exchange fluid to the inner pipe; an outer pipe disposed on an outer side of the inner pipe while surrounding the inner pipe to form a suction space between the inner pipe and the outer pipe; an intake part connected to the suction space, and for sucking the suction space; and a spacing maintaining part disposed in the suction space, and for maintaining a spacing distance between the inner pipe and the outer pipe.
    Type: Application
    Filed: January 16, 2024
    Publication date: December 5, 2024
    Applicant: SEMES CO., LTD.
    Inventors: Wook Sang JANG, Jae Woong SIM, Dong Uk KIM, In Hoe KIM
  • Patent number: 10752993
    Abstract: Provided is a substrate processing apparatus and substrate processing method for depositing a thin film on a substrate. The substrate processing apparatus may include a chamber, a susceptor rotatably mounted in the chamber, at least one satellite mounted on the susceptor, configured to place a substrate thereon, and capable of being floated and rotating due to pressure of a gas supplied through the susceptor, to rotate the substrate, and of revolving due to rotation of the susceptor, and a cart lifting module including a cart mounted on the susceptor around the satellite and supporting an edge of the substrate to take over the substrate and place the substrate on the satellite, and a cart lifting device capable of lifting and lowering the cart.
    Type: Grant
    Filed: October 17, 2017
    Date of Patent: August 25, 2020
    Assignee: WONIK IPS CO., LTD.
    Inventors: Wook Sang Jang, Sang Jun Park, Ho Young Lee
  • Publication number: 20180105934
    Abstract: Provided is a substrate processing apparatus and substrate processing method for depositing a thin film on a substrate. The substrate processing apparatus may include a chamber, a susceptor rotatably mounted in the chamber, at least one satellite mounted on the susceptor, configured to place a substrate thereon, and capable of being floated and rotating due to pressure of a gas supplied through the susceptor, to rotate the substrate, and of revolving due to rotation of the susceptor, and a cart lifting module including a cart mounted on the susceptor around the satellite and supporting an edge of the substrate to take over the substrate and place the substrate on the satellite, and a cart lifting device capable of lifting and lowering the cart.
    Type: Application
    Filed: October 17, 2017
    Publication date: April 19, 2018
    Inventors: Wook Sang JANG, Sang Jun PARK, Ho Young LEE
  • Publication number: 20130291798
    Abstract: The present invention relates to a thin film deposition apparatus and a substrate treatment system including same. The thin film deposition apparatus includes a deposition chamber, a susceptor, a rotation mechanism, an elevation member, and an elevation driving unit. The deposition chamber has an inner space in which a deposition process is performed. The susceptor is disposed within the deposition chamber, and a plurality of substrates is seated on a top surface of the susceptor. The elevation member is disposed above the susceptor to support a portion of each side of the substrates seated on the susceptor. When the elevation member is operated, the substrates are separated from the susceptor or seated on the susceptor. The elevation driving unit elevates the elevation member.
    Type: Application
    Filed: January 3, 2012
    Publication date: November 7, 2013
    Applicant: WONIK IP CO., LTD.
    Inventors: Ho-Young Lee, Sang-Joon Park, Jin-Pil Heo, Byung-Guk Son, Wook-Sang Jang, Kyung-Cheol Lee