Patents by Inventor Woon-Ik PARK

Woon-Ik PARK has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Complex patterning device and operation method thereof
    Patent number: 11073759
    Abstract: Provided is a complex patterning device. The complex patterning device includes a patterning module, on which a master substrate including a master pattern that contacts and is separated from a target substrate and which forms a plurality of target patterns having a reverse image of the master pattern on the target substrate by applying a pressure onto the target substrate, and a punching module including a punching mold that contacts and is separated from the target substrate, in which the plurality of target patterns are formed, and which divides at least any one of the plurality of target patterns by applying a pressure onto the target substrate.
    Type: Grant
    Filed: July 18, 2019
    Date of Patent: July 27, 2021
    Assignees: KOREA INSTITUTE OF CERAMIC ENGINEERING AND TECHNOLOGY, GLOBAL FRONTIER HYBRID INTERFACE MATERIALS
    Inventors: Woon Ik Park, Tae Wan Park, Kwang Ho Kim
  • COMPLEX PATTERNING DEVICE AND OPERATION METHOD THEREOF
    Publication number: 20200371433
    Abstract: Provided is a complex patterning device. The complex patterning device includes a patterning module, on which a master substrate including a master pattern that contacts and is separated from a target substrate and which forms a plurality of target patterns having a reverse image of the master pattern on the target substrate by applying a pressure onto the target substrate, and a punching module including a punching mold that contacts and is separated from the target substrate, in which the plurality of target patterns are formed, and which divides at least any one of the plurality of target patterns by applying a pressure onto the target substrate.
    Type: Application
    Filed: July 18, 2019
    Publication date: November 26, 2020
    Applicants: KOREA INSTITUTE OF CERAMIC ENGINEERING AND TECHNOLOGY, GLOBAL FRONTIER HYBRID INTERFACE MATERIALS
    Inventors: Woon Ik Park, Tae Wan Park, Kwang Ho Kim
  • Nano-structure of block copolymer and method of manufacturing the same
    Patent number: 10253187
    Abstract: A nano-structured block copolymer that includes a self-assembled block copolymer disposed on a substrate, wherein the block copolymer includes a plurality of block structural units, and at least two block structural units have a solubility parameter difference of greater than or equal to about 5 megaPascal1/2.
    Type: Grant
    Filed: September 26, 2012
    Date of Patent: April 9, 2019
    Assignees: SAMSUNG ELECTRONICS CO., LTD., KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY
    Inventors: Mi-Jeong Kim, Yeon-Sik Jung, Woon-Ik Park, Jae-Won Jeong
  • NANO-STRUCTURE OF BLOCK COPOLYMER AND METHOD OF MANUFACTURING THE SAME
    Publication number: 20130224442
    Abstract: A nano-structured block copolymer that includes a self-assembled block copolymer disposed on a substrate, wherein the block copolymer includes a plurality of block structural units, and at least two block structural units have a solubility parameter difference of greater than or equal to about 5 megaPascal1/2.
    Type: Application
    Filed: September 26, 2012
    Publication date: August 29, 2013
    Applicants: KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY, SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Mi-Jeong KIM, Yeon-Sik JUNG, Woon-Ik PARK, Jae-Won JEONG