Patents by Inventor Woon Sung Hwang

Woon Sung Hwang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Cycloolefin polymer compound and method of preparing the same
    Patent number: 8981026
    Abstract: This invention relates to a cycloolefin copolymer, which is prepared via ring-opening metathesis polymerization using, as monomers, dicyclopentadiene obtained by chemically bonding two cyclopentadiene molecules using a Diels-Alder reaction and tricyclopentadiene obtained by chemically bonding three cyclopentadiene molecules using a Diels-Alder reaction, in which the cyclopentadiene is a C5-fraction of naphtha cracking, and to a method of preparing the same. This copolymer is a non-crystalline transparent resin and is useful for a variety of end uses.
    Type: Grant
    Filed: August 6, 2012
    Date of Patent: March 17, 2015
    Assignee: Kolon Industries, Inc.
    Inventors: Woon Sung Hwang, Jong Un Sung, Woon Jin Park, Sung Rak Joo, Bun Yeoul Lee, Eun Seok Park
  • CYCLOOLEFIN POLYMER COMPOUND AND METHOD OF PREPARING THE SAME
    Publication number: 20140296436
    Abstract: This invention relates to a cycloolefin copolymer, which is prepared via ring-opening metathesis polymerization using, as monomers, dicyclopentadiene obtained by chemically bonding two cyclopentadiene molecules using a Diels-Alder reaction and tricyclopentadiene obtained by chemically bonding three cyclopentadiene molecules using a Diels-Alder reaction, in which the cyclopentadiene is a C5-fraction of naphtha cracking, and to a method of preparing the same. This copolymer is a non-crystalline transparent resin and is useful for a variety of end uses.
    Type: Application
    Filed: August 6, 2012
    Publication date: October 2, 2014
    Applicant: KOLON INDUSTRIES, INC.
    Inventors: Woon Sung Hwang, Jong Un Sung, Woon Jin Park, Sung Rak Joo, Bun Yeoul Lee, Eun Seok Park
  • Cycloolefin-based polymer compound, preparation method thereof and selective hydrogenation process
    Patent number: 8735521
    Abstract: A cycloolefin-based copolymer and a hydrogenation process are disclosed, wherein the cycloolefin-based copolymer is prepared by using: a monomer which can be easily and economically obtained by hydrogenating dicyclopentadiene that occupies much of C5 fractions from naphtha cracking; or a monomer which can be obtained by chemically bonding three molecules of cyclopentadiene via Diels-Alder reactions and then hydrogenating the cyclopentadiene. The copolymer can be used in various fields as an amorphous transparent resin.
    Type: Grant
    Filed: February 11, 2009
    Date of Patent: May 27, 2014
    Assignee: Kolon Industries, Inc.
    Inventors: Ik Kyung Sung, Woon Sung Hwang, Jung Hoon Seo, Bun Yeoul Lee, Sung Jae Na, Seung Taek Yu
  • CYCLOOLEFIN-BASED POLYMER COMPOUND, PREPARATION METHOD THEREOF AND SELECTIVE HYDROGENATION PROCESS
    Publication number: 20110054131
    Abstract: A cycloolefin-based copolymer and a hydrogenation process are disclosed, wherein the cycloolefin-based copolymer is prepared by using: a monomer which can be easily and economically obtained by hydrogenating dicyclopentadiene that occupies much of C5 fractions from naphtha cracking; or a monomer which can be obtained by chemically bonding three molecules of cyclopentadiene via Diels-Alder reactions and then hydrogenating the cyclopentadiene. The copolymer can be used in various fields as an amorphous transparent resin.
    Type: Application
    Filed: February 11, 2009
    Publication date: March 3, 2011
    Applicant: KOLON INDUSTRIES, INC.
    Inventors: Ik Kyung Sung, Woon Sung Hwang, Jung Hoon Seo, Bun Yeoul Lee, Sung Jae Na, Seung Taek Yu