Abstract: An in-plane switching mode liquid crystal display device includes, among other features, a gate line, a common line, a data line, a thin film transistor connected to the gate line and the data line, a drain electrode, a first insulating layer to cover the entire surface of a first substrate except a pixel region and portions of the drain electrode and the common line; a first pixel line layer connected to the drain electrode and on a side of the first insulating layer, a first common line layer connected to the common line and on a side of the first insulating layer, a second insulating layer in a region that is not covered by the first insulating layer, a second pixel line layer on the second insulating layer and connected to the first pixel line layer, and a second common line layer on the second insulating layer and connected on the first common line layer.

Abstract: An array substrate device has a color filter-on-thin film transistor (COT) structure for use in a liquid crystal display device. The array substrate device includes a gate line disposed in a first direction on a substrate; a data line disposed over the substrate in a second direction, the data line perpendicularly crossing the gate line to define a pixel region; a thin film transistor near a crossing of the gate and data lines, the thin film transistor including a gate electrode, a semiconductor layer, a source electrode and a drain electrode; a capacitor electrode overlapping the gate line; a color filter having an island pattern corresponding to the pixel region, the color filter exposing portions of the drain electrode and the capacitor electrode; and a pixel electrode disposed over the cover filter, corresponding to the pixel region, and contacting the portions of the drain electrode and the capacitor electrode.

Abstract: Method of fabricating a thin-film transistor (TFT) in which a gate metal is deposited onto a substrate in order to form the gate of the thin-film transistor. The substrate may be an insulative substrate or a color filter. In a first method, the gate metal is subjected to an H2 plasma. After subjecting the gate metal to an H2 plasma, the gate insulating film is deposited onto the gate. In a second method, first and second layers of gate insulating film are respectively deposited on the gate at a first and second deposition rates. One layer is deposited under H2 or argon dilution conditions and has improved insulating conditions while the other layer serves to lower the overall compressive stress of the dual layer gate insulator. In a third method, an n+ silicon film is formed on a substrate by maintaining a flow of silane, phosphine and hydrogen gas into a processing chamber at substrate temperatures of about 300° C. or less.

Abstract: A thin film transistor array substrate, and its manufacturing method, that is made using a three-round mask process. Gate patterns, each of which includes a gate line consisting of a transparent metal pattern and a gate metal pattern, a gate electrode, a lower gate pad, a lower data pad, and a pixel electrode are formed using a first mask process. A second mask process forms a gate insulating pattern and a semiconductor pattern. A third mask process forms source and drain patterns, each of which includes a data line, a source electrode, a drain electrode, an upper gate pad and an upper data pad. Additionally, the gate metal pattern on an upper portion of the pixel electrode is removed.

Abstract: The present invention discloses an array substrate for use in a liquid crystal display device, which includes a transparent substrate that includes a display area and a non-display area. A plurality of red, green and blue color filters are formed on the transparent substrate in the display area. A first alignment key is formed on the transparent substrate in the non-display area and made of the same material as the color filters. An overcoat layer is formed on the plurality of red, green and blue color filters to cover the color filters in the display area. A passivation layer covers gate and data lines and a thin film transistor in the display area and covers the first alignment key in the non-display area, the passivation layer having a drain contact hole to the thin film transistor. A pixel electrode is formed on the passivation layer in the display area, the pixel electrode contacting the thin film transistor through the drain contact hole.

Abstract: A transflective liquid crystal display device includes a thin film transistor disposed at a corner of a pixel region, the thin film transistor including a gate electrode, a semiconductor layer, a source electrode, and a drain electrode, a reflector disposed in the pixel region and spaced apart from the thin film transistor, the reflector formed of the same material as one of the gate, source, and drain electrodes, a color filter disposed within the pixel region, the color filter having one of red, green, and blue colors, a black matrix over the thin film transistor along color filter borders of adjacent pixel regions, and a pixel electrode formed of a transparent conductive material adjacent to the color filter, the pixel electrode having a first end portion contacting the drain electrode of the thin film transistor, wherein the pixel region is divided into a reflective portion including the reflector and a transmissive portion absent of the reflector.

Abstract: A liquid crystal display (LCD) device having a color filter on a thin film transistor (TFT) structure (COT structure). The color filter layers are formed on the same substrate as the TFT to be in direct contact with the source and drain electrodes without any intermediaries therebetween. In particular, there is no need for a passivation layer between the TFT and the color filter layers. Preferred embodiments include a back etched type TFT that does not require a light shielding layer, an etch-stopped type TFT having an etch stop layer, and a coplanar type TFT having a light shielding layer below the gate electrode of the TFT.

Abstract: Disclosed are a reflective and transflective liquid crystal display device and its manufacturing method, which can raise light efficiency by removing a depressed part in a reflective device without forming a capacitor contact hole in a storage capacitor.

Abstract: A liquid crystal display device includes gate and data lines defining a pixel region on a first substrate. A first insulating layer covers the gate line and a gate electrode. A thin film transistor, formed at a crossing region of the gate and data lines, has the gate electrode, a semiconductor layer, a source electrode, and a drain electrode. A red, green or blue color filter is formed over the first insulating layer in the pixel region. A drain contact hole exposes the drain electrode. A light-shielding color filter pattern including at least two of red, green and blue resins is formed over the semiconductor layer. A pixel electrode is formed over the color filter in the pixel region and contacts the drain electrode. A common electrode is formed on a second substrate facing the first substrate with a liquid crystal layer interposed between the common and pixel electrodes.

Abstract: A method for fabricating an array substrate having a color filter on a thin film transistor structure for a liquid crystal display device is disclosed in the present invention.

Abstract: An array substrate device having a color filter-on-thin film transistor (COT) structure for a liquid crystal display device includes a gate line formed on a substrate along a transverse direction, the gate line including a gate pad at one end thereof, a first insulating layer formed on the substrate to cover the gate line, the first insulating layer exposing a first portion of the gate pad, a data line formed over the first insulating layer along a longitudinal direction on the substrate, the data line defining a pixel region with the gate line and including a data pad at one end thereof, a thin film transistor formed at a crossing region of the gate and data lines, the thin film transistor including a gate electrode, a semiconductor layer, a source electrode, and a drain electrode, a black matrix overlapping the thin film transistor, the gate line, and the data line except a second portion of the drain electrode, a second insulating layer formed over an entire surface of the substrate to cover the black matr

Abstract: An array substrate device includes a gate line formed on a substrate extending along a first direction having a gate electrode, a data line formed on the substrate extending along a second direction having a data pad disposed apart from a first end of the data line, the data and gate lines defining a pixel region, a gate pad formed on the substrate disposed apart from a first end of the gate line, a thin film transistor formed at a crossing region of the gate and data lines and including the gate electrode, a semiconductor layer, a source electrode, and a drain electrode, a black matrix overlapping the thin film transistor, the gate line, and the data line except for a first portion of the drain electrode, a first pixel electrode at the pixel region contacting the first portion of the drain electrode and the substrate, a color filter on the first pixel electrode at the pixel region, and a second pixel electrode on the color filter contacting the first pixel electrode.

Abstract: An array substrate of a liquid crystal display device having a color filter on a thin film transistor structure and a method of fabricating the same are disclosed in the present invention. The liquid crystal display device having a COT structure array substrate includes a top gate type thin film transistor formed on a substrate and having an active layer, a gate electrode, a source electrode, and a drain electrode, a storage capacitor adjacent to the top gate type thin film transistor and having a first storage electrode and a second storage electrode, a black matrix on the top gate type thin film transistor, a first pixel electrode at a pixel region and contacting a drain electrode, a color filter on the first pixel electrode at the pixel region, and a second pixel electrode on the color filter and contacting the first pixel electrode at the portion over the black matrix.

Abstract: A manufacturing method of a liquid crystal display device includes steps of forming liquid crystal display by patterning the passivation layer and the gate insulating layer by using the black matrix as an etching mask to expose the portion of the drain electrode, the gate pad, and the data pad, forming a first transparent conductive layer on the black matrix, wherein the first transparent conductive layer contacts the portion of the drain electrode, the gate pad, and the data pad, forming a color filter layer on the first transparent conductive layer in the opening, forming a second transparent conductive layer on the color filter layer, the second transparent conductive layer contacting the first transparent conductive layer, and forming a pixel electrode, a gate pad terminal and a data pad terminal by patterning the first and second transparent conductive layers, wherein the pixel electrode is disposed in the pixel area, the gate pad terminal is disposed on the gate pad, and the data pad terminal is dispose

Abstract: A liquid crystal display device includes an upper substrate including a first soda lime glass material, an ion blocking layer on the first soda lime glass material, a color filter layer, and a common electrode, a lower substrate including a second soda lime glass material, a transparent organic insulator on the second soda lime glass material, and a thin film transistor on the transparent organic insulator, and a liquid crystal material layer interposed between the upper substrate and the lower substrate.

Abstract: An array substrate for a transflective liquid crystal display device, including a substrate; at least one gate line and at least one gate electrode formed on the transparent substrate; a gate-insulating layer formed over the at least one gate line and the at least one gate electrode; a silicon layer formed on the gate-insulating layer, the silicon layer being positioned above the at least one gate electrode; a source electrode and a drain electrode formed on the silicon layer and spaced apart from each other with the silicon layer overlapped therebetween, wherein the at least one gate electrode, the source electrode, the drain electrode, and the silicon layer define a thin film transistor (TFT); at least one data line; a first passivation layer covering the at least one data line; a transparent electrode formed on the first passivation layer; and a reflective electrode formed on the transparent electrode.

Abstract: A liquid crystal display (LCD) device having a color filter on a thin film transistor (TFT) structure (COT structure). The color filter layers are formed on the same substrate as the TFT to be in direct contact with the source and drain electrodes without any intermediaries therebetween. In particular, there is no need for a passivation layer between the TFT and the color filter layers. Preferred embodiments include a back etched type TFT that does not require a light shielding layer, an etch-stopped type TFT having an etch stop layer, and a coplanar type TFT having a light shielding layer below the gate electrode of the TFT.

Abstract: A transflective liquid crystal display (LCD) device is used both in transmissive and reflective modes. An array substrate for a transflective liquid crystal display device includes a substrate, a plurality of thin film transistors, a first passivation layer having a plurality of first contact holes, a plurality of transparent electrodes, a second passivation layer having a plurality of second contact holes and a plurality of reflective electrodes having a plurality of first transmissive holes, wherein the first and second passivation layers have different thicknesses and an area of the contact holes in the thicker passivation layer is narrower than that of the contact holes in the other passivation layer.

Abstract: Disclosed are a reflective and transflective liquid crystal display device and its manufacturing method, which can raise light efficiency by removing a depressed part in a reflective device without forming a capacitor contact hole in a storage capacitor.

Abstract: A liquid crystal display device includes a plurality of gate lines and data lines arranged horizontally and vertically, respectively, for defining a plurality of pixel areas; a plurality of switching devices formed at intersections of the gate lines and the data lines; and a pixel electrode formed in a pixel area connected to the switching device corresponding to the pixel area and partially overlapping the data lines adjacent to the corresponding pixel area, wherein a first parasitic capacitance generated by the pixel electrode overlapping a data line for the corresponding pixel area and a second parasitic capacitance generated the pixel electrode overlapping a data line for an adjacent pixel area are substantially equal to each other.