Patents by Inventor Woong-Kyu Son

Woong-Kyu Son has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9551653
    Abstract: The inventive concept provides apparatuses and methods for monitoring semiconductor fabrication processes in real time using polarized light. In some embodiments, the apparatus comprises a light source configured to generate light, a beam splitter configured to reflect the light toward the wafer being processed, an objective polarizer configured to polarize the light reflected toward the wafer and to allow light reflected by the wafer to pass therethrough, a blaze grating configured to separate light reflected by the wafer according to wavelength, an array detector configured to detect the separated light and an analyzer to analyze the three-dimensional profile of the structure/pattern being formed in the wafer.
    Type: Grant
    Filed: March 23, 2016
    Date of Patent: January 24, 2017
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Woong-Kyu Son, Kwang-Hoon Kim, Deok-Yong Kim, Sung-Soo Moon, Jung-Hoon Byun, Ji-Hye Lee, Choon-Shik Leem, Soo-Bok Chin
  • Publication number: 20160204043
    Abstract: The inventive concept provides apparatuses and methods for monitoring semiconductor fabrication processes in real time using polarized light. In some embodiments, the apparatus comprises a light source configured to generate light, a beam splitter configured to reflect the light toward the wafer being processed, an objective polarizer configured to polarize the light reflected toward the wafer and to allow light reflected by the wafer to pass therethrough, a blaze grating configured to separate light reflected by the wafer according to wavelength, an array detector configured to detect the separated light and an analyzer to analyze the three-dimensional profile of the structure/pattern being formed in the wafer.
    Type: Application
    Filed: March 23, 2016
    Publication date: July 14, 2016
    Inventors: Woong-Kyu Son, Kwang-Hoon KIM, Deok-Yong KIM, Sung-Soo MOON, Jung-Hoon BYUN, Ji-Hye LEE, Choon-Shik LEEM, Soo-Bok CHIN
  • Patent number: 9322771
    Abstract: The inventive concept provides apparatuses and methods for monitoring semiconductor fabrication processes in real time using polarized light. In some embodiments, the apparatus comprises a light source configured to generate light, a beam splitter configured to reflect the light toward the wafer being processed, an objective polarizer configured to polarize the light reflected toward the wafer and to allow light reflected by the wafer to pass therethrough, a blaze grating configured to separate light reflected by the wafer according to wavelength, an array detector configured to detect the separated light and an analyzer to analyze the three-dimensional profile of the structure/pattern being formed in the wafer.
    Type: Grant
    Filed: March 5, 2014
    Date of Patent: April 26, 2016
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Woong-Kyu Son, Kwang-Hoon Kim, Deok-Yong Kim, Sung-Soo Moon, Jung-Hoon Byun, Ji-Hye Lee, Choon-Shik Leem, Soo-Bok Chin
  • Patent number: 9165354
    Abstract: Methods of analyzing photolithography processes are provided. The methods may include obtaining an image from a pattern formed on a wafer and obtaining dimensions of the image. The methods may further include converting the dimensions into a profile graph and then dividing the profile graph into a low-frequency band profile graph and a high-frequency band profile graph.
    Type: Grant
    Filed: June 3, 2013
    Date of Patent: October 20, 2015
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Woong-Kyu Son, Hyo-Cheon Kang, Deok-Yong Kim, Jae-Kwan Park, Jeong-Ho Ahn, Soo-Bok Chin
  • Publication number: 20140264052
    Abstract: The inventive concept provides apparatuses and methods for monitoring semiconductor fabrication processes in real time using polarized light. In some embodiments, the apparatus comprises a light source configured to generate light, a beam splitter configured to reflect the light toward the wafer being processed, an objective polarizer configured to polarize the light reflected toward the wafer and to allow light reflected by the wafer to pass therethrough, a blaze grating configured to separate light reflected by the wafer according to wavelength, an array detector configured to detect the separated light and an analyzer to analyze the three-dimensional profile of the structure/pattern being formed in the wafer.
    Type: Application
    Filed: March 5, 2014
    Publication date: September 18, 2014
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Woong-Kyu SON, Kwang-Hoon KIM, Deok-Yong KIM, Sung-Soo MOON, Jung-Hoon BYUN, Ji-Hye LEE, Choon-Shik LEEM, Soo-Bok CHIN
  • Publication number: 20140037186
    Abstract: Methods of analyzing photolithography processes are provided. The methods may include obtaining an image from a pattern formed on a wafer and obtaining dimensions of the image. The methods may further include converting the dimensions into a profile graph and then dividing the profile graph into a low-frequency band profile graph and a high-frequency band profile graph.
    Type: Application
    Filed: June 3, 2013
    Publication date: February 6, 2014
    Inventors: Woong-Kyu Son, Hyo-Cheon Kang, Deok-Yong Kim, Jae-Kwan Park, Jeong-Ho Ahn, Soo-Bok Chin