Patents by Inventor Woong Sun LIM

Woong Sun LIM has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for etching atomic layer of graphene
    Patent number: 9245752
    Abstract: This present disclosure relates to an atomic layer etching method for graphene, including adsorbing reactive radicals onto a surface of the graphene and irradiating an energy source to the graphene on which the reactive radicals are adsorbed.
    Type: Grant
    Filed: January 22, 2014
    Date of Patent: January 26, 2016
    Assignee: Research & Business Foundation Sungkyunkwan University
    Inventors: Geun Young Yeom, Woong Sun Lim, Kyung Seok Min, Yi Yeon Kim, Jong Sik Oh
  • METHOD FOR ETCHING ATOMIC LAYER OF GRAPHINE
    Publication number: 20140206192
    Abstract: This present disclosure relates to an atomic layer etching method for graphene, including adsorbing reactive radicals onto a surface of the graphene and irradiating an energy source to the graphene on which the reactive radicals are adsorbed.
    Type: Application
    Filed: January 22, 2014
    Publication date: July 24, 2014
    Applicant: RESEARCH & BUSINESS FOUNDATION SUNGKYUNKWAN UNIVERSITY
    Inventors: Geun Young YEOM, Woong Sun LIM, Kyung Seok MIN, Yi Yeon KIM, Jong Sik OH
  • ATOMIC LAYER ETCHING APPARATUS AND ETCHING METHOD USING THE SAME
    Publication number: 20110192820
    Abstract: An atomic layer etching apparatus using reactive radicals and neutral beams and an etching method using the same are provided.
    Type: Application
    Filed: February 25, 2010
    Publication date: August 11, 2011
    Applicant: SUNGKYUNKWAN UNIVERSITY Foundation for Corporate Collaboration
    Inventors: Geun-Young Yeom, Woong-Sun Lim, Sang-Duk Park, Yi-Yeon Kim, Byoung-Jae Park, Je-Kwan Yeon