Abstract: A process for manufacturing a microfluidic device including: a) providing a first substrate having a first surface including a first flat part and a first concavity and a second substrate having a second surface including a second flat part and an optional second concavity, b) coating at least one of the first surface and the second surface with a coating composition including i) a monomer A including one moiety represented by CH2=CR1R2 wherein R1 represents H or CH3 and R2 represents —COO— or —CONH—, and a non-ionic hydrophilic moiety; ii) a monomer B including two or more moieties represented by CH2=CR1R2 wherein R1 represents H or CH3 and R2 represents —COO— or —CONH—, and a non-ionic hydrophilic moiety; iii) optionally a photoinitiator; iv) optionally a diluent; c) evaporating the diluent if present, and forming a liquid coating; d) contacting the substrates so as to obtain an assembly in which the first flat part and the second flat part contact each other to define a microfluidic structure between

Abstract: A process for the modification of a surface of a solid material, having the step of contacting the surface with a surface-modifying composition under irradiation with light of a wavelength in the range of 200 to 800 nm optionally in the presence of a photoinitiator, wherein the solid material has surface groups selected from C—OH, Si—OH, C?O and C—O—C groups and wherein the surface-modifying composition has at least a hydrosilane and at least one reactive compound (A) other than the hydrosilane, wherein the reactive compound (A) has at least two functional groups selected from (meth)acrylate, (meth)acrylamide, hydroxyl, carboxylic acid, alkene, alkyne and epoxy, and wherein the amount of hydrosilane in the composition ranges between 0.5 and 99 vol %, and wherein the vol % is determined at 20° C. relative to the total of the surface modifying composition. A solid material having a partial surface modification layer.

Abstract: A process for the modification of a surface of a solid material having the step of contacting the surface with a surface-modifying composition under irradiation with light of a wavelength in the range of 200 to 800 nm, optionally in the presence of a photoinitiator, wherein the solid material is chosen from the group consisting of polyesters, polyethers, polycarbonates, polyketones polyamides, polyurethanes, (meth)acrylate and (meth)acrylamide polymers and polyetherimides and wherein the surface modifying composition includes at least a hydrosilane.

Abstract: A process for the modification of a surface of a solid material, having the step of contacting the surface with a surface-modifying composition under irradiation with light of a wavelength in the range of 200 to 800 nm optionally in the presence of a photoinitiator, wherein the solid material has surface groups selected from C—OH, Si—OH, C?O and C—O—C groups and wherein the surface-modifying composition has at least a hydrosilane and at least one reactive compound (A) other than the hydrosilane, wherein the reactive compound (A) has at least two functional groups selected from (meth)acrylate, (meth)acrylamide, hydroxyl, carboxylic acid, alkene, alkyne and epoxy, and wherein the amount of hydrosilane in the composition ranges between 0.5 and 99 vol %, and wherein the vol % is determined at 20° C. relative to the total of the surface modifying composition. A solid material having a partial surface modification layer.

Abstract: A process for the modification of a surface of a solid material having the step of contacting the surface with a surface-modifying composition under irradiation with light of a wavelength in the range of 200 to 800 nm, optionally in the presence of a photoinitiator, wherein the solid material is chosen from the group consisting of polyesters, polyethers, polycarbonates, polyketones polyamides, polyurethanes, (meth)acrylate and (meth)acrylamide polymers and polyetherimides and wherein the surface modifying composition includes at least a hydrosilane.

Abstract: A process for the modification of a surface of a solid material, including the step of contacting the surface with a surface-modifying compound under irradiation with light of a wavelength in the range of 200 to 800 nm optionally in the presence of a photoinitiator, wherein a) the surface has Si—OH groups, C—OH groups or epoxy groups and the surface-modifying compound is a hydrosilane, or b) the surface has O—Si—H groups and the surface-modifying compound is a silanol or an alcohol.

Abstract: A humidity barrier comprises a mixed matrix membrane, wherein the mixed matrix membrane comprises a polymer matrix with at least a hydrophobic surface, in which polymer matrix porous hydrophilic filler particles are dispersed. The hydrophobic surface may be formed either by hydrophobic polymer material itself or a hydrophobic coating may be provided on top of non-hydrophobic polymer material.