Patents by Inventor Wouter Anton Soer

Wouter Anton Soer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Getter and cleaning arrangement for a lithographic apparatus and method for cleaning a surface
    Patent number: 7473908
    Abstract: A lithographic apparatus includes a radiation source and an object with a first surface which is configured to retain metal contaminants. This surface has the function of a getter. The first surface is arranged substantially outside the region traversed by the radiation beam generated by the radiation source during lithographic processing. The first surface may further be used to retain volatile contaminants generated in a cleaning method.
    Type: Grant
    Filed: July 14, 2006
    Date of Patent: January 6, 2009
    Assignee: ASML Netherlands B.V.
    Inventors: Maarten Marinus Johannes Wilhelmus Van Herpen, Vadim Yevgenyevich Banine, Johannes Hubertus Josephina Moors, Wouter Anton Soer
  • Lithographic apparatus, and device manufacturing method
    Publication number: 20080083885
    Abstract: A lithographic apparatus configured to project a patterned beam of radiation onto a target portion of a substrate is disclosed. The apparatus includes a first radiation dose detector and a second radiation dose detector, each detector comprising a secondary electron emission surface configured to receive a radiation flux and to emit secondary electrons due to the receipt of the radiation flux, the first radiation dose detector located upstream with respect to the second radiation dose detector viewed with respect to a direction of radiation transmission, and a meter, connected to each detector, to detect a current or voltage resulting from the secondary electron emission from the respective electron emission surface.
    Type: Application
    Filed: October 10, 2006
    Publication date: April 10, 2008
    Applicants: ASML Netherlands B.V., Carl Zeiss SMT AG
    Inventors: Maarten Marinus Johannes Wilhelmus Van Herpen, Vadim Yevgenyevich Banine, Johannes Peterus Henricus De Kuster, Johannes Hubertus Josephina Moors, Lucas Henricus Johannes Stevens, Bastiaan Theodoor Wolschrijn, Yurii Victorovitch Sidelnikov, Marc Hubertus Lorenz Van Der Velden, Wouter Anton Soer, Thomas Stein, Kurt Gielissen
  • Getter and cleaning arrangement for a lithographic apparatus and method for cleaning a surface
    Publication number: 20080011967
    Abstract: A lithographic apparatus includes a radiation source and an object with a first surface which is configured to retain metal contaminants. This surface has the function of a getter. The first surface is arranged substantially outside the region traversed by the radiation beam generated by the radiation source during lithographic processing. The first surface may further be used to retain volatile contaminants generated in a cleaning method.
    Type: Application
    Filed: July 14, 2006
    Publication date: January 17, 2008
    Applicant: ASML Netherlands B.V.
    Inventors: Maarten Marinus Johannes Wilhelmus Van Herpen, Vadim Yevgenyevich Banine, Johannes Hubertus Josephina Moors, Wouter Anton Soer