Patents by Inventor Wouter VANESCH

Wouter VANESCH has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • SUBSTRATE HOLDER FOR USE IN A LITHOGRAPHIC APPARATUS
    Publication number: 20220357675
    Abstract: A substrate holder, for a lithographic apparatus, having a main body, a plurality of support elements to support a substrate and a seal unit. The seal unit may include a first seal positioned outward of and surrounding the plurality of support elements. A position of a substrate contact region of an upper surface of the first seal may be arranged at a distance from the plurality of support elements sufficient enough such that during the loading/unloading of the substrate, a force applied to the first seal by the substrate is greater than a force applied to the plurality of support elements by the substrate. A profile of the contact region, in a cross section through the seal, may have a shape which is configured such that during the loading/unloading of the substrate, the substrate contacts the seal via at least two different points of the profile.
    Type: Application
    Filed: July 21, 2022
    Publication date: November 10, 2022
    Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.
    Inventors: Thomas POIESZ, Coen Hubertus Matheus BALTIS, Abraham Alexander SOETHOUDT, Mehmet Ali AKBAS, Dennis VAN DEN BERG, Wouter VANESCH, Marcel Maria Cornelius Franciscus TEUNISSEN
  • Substrate holder for use in a lithographic apparatus
    Patent number: 11448976
    Abstract: A substrate holder, for a lithographic apparatus, having a main body, a plurality of support elements to support a substrate and a seal unit. The seal unit may include a first seal positioned outward of and surrounding the plurality of support elements. A position of a substrate contact region of an upper surface of the first seal may be arranged at a distance from the plurality of support elements sufficient enough such that during the loading/unloading of the substrate, a force applied to the first seal by the substrate is greater than a force applied to the plurality of support elements by the substrate. A profile of the contact region, in a cross section through the seal, may have a shape which is configured such that during the loading/unloading of the substrate, the substrate contacts the seal via at least two different points of the profile.
    Type: Grant
    Filed: November 22, 2018
    Date of Patent: September 20, 2022
    Assignees: ASML NETHERLANDS B.V., ASML HOLDING N.V.
    Inventors: Thomas Poiesz, Coen Hubertus Matheus Baltis, Abraham Alexander Soethoudt, Mehmet Ali Akbas, Dennis Van Den Berg, Wouter Vanesch, Marcel Maria Cornelius Franciscus Teunissen
  • SUBSTRATE HOLDER FOR USE IN A LITHOGRAPHIC APPARATUS
    Publication number: 20210165334
    Abstract: A substrate holder, for a lithographic apparatus, having a main body, a plurality of support elements to support a substrate and a seal unit. The seal unit may include a first seal positioned outward of and surrounding the plurality of support elements. A position of a substrate contact region of an upper surface of the first seal may be arranged at a distance from the plurality of support elements sufficient enough such that during the loading/unloading of the substrate, a force applied to the first seal by the substrate is greater than a force applied to the plurality of support elements by the substrate. A profile of the contact region, in a cross section through the seal, may have a shape which is configured such that during the loading/unloading of the substrate, the substrate contacts the seal via at least two different points of the profile.
    Type: Application
    Filed: November 22, 2018
    Publication date: June 3, 2021
    Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.
    Inventors: Thomas POIESZ, Coen Hubertus Matheus BALTIS, Abraham Alexander SOETHOUDT, Mehmet Ali AKBAS, Dennis VAN DEN BERG, Wouter VANESCH, Marcel Maria Cornelius Franciscus TEUNISSEN