Patents by Inventor Wouterus Johannes Petrus Maas

Wouterus Johannes Petrus Maas has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and device manufacturing method
    Publication number: 20090059192
    Abstract: A lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The apparatus also includes a barrier member, surrounding a space between the projection system and, in use, the substrate, to define in part with the projection system a reservoir for liquid. A radially outer surface of the barrier member facing a portion of projection system and a radially outer surface of the portion of the projection system facing the barrier member each have a liquidphobic outer surface. The liquidphobic outer surface of the barrier member and/or the liquidphobic outer surface of the portion of the projection system has an inner edge that defines in part the reservoir.
    Type: Application
    Filed: August 1, 2008
    Publication date: March 5, 2009
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Marcel Beckers, Marcus Adrianus Van De Kerkhof, Siebe Landheer, Wouterus Johannes Petrus Maas, Jeroen Peter Johannes Bruijstens, Ivo Adam Johannes Thomas, Franciscus Johannes Joseph Janssen, Bartholomeus Mathias Van Oerle