Patents by Inventor Wu Jing

Wu Jing has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7803425
    Abstract: A nanoporous film and fabrication method thereof. The method for fabricating nanoporous film comprising: providing a substrate with a surface; forming a coating of a composition on the surface, curing the coating to polymerize the oxide gel, thereby forming an organic/inorganic hybrid film; and dissolving the template from the organic/inorganic hybrid film by an organic solvent. Specifically, the composition comprises the following components: an oxide gel, a template and an initiator.
    Type: Grant
    Filed: August 29, 2005
    Date of Patent: September 28, 2010
    Assignee: Industrial Technology Research Institute
    Inventors: Wu-Jing Wang, Yen-Po Wang, Yun-Ching Lee, Joung-Yei Chen, Hsi-Hsin Shih, Hsein-Pin Chen
  • Patent number: 7659352
    Abstract: An antireflective coating composition, antireflection films and fabrication method thereof. The antireflection film is constructed by stacked crosslink colloid particles, having a plurality of nanopores distributed uniformly therein. Due to the nanopores, the antireflection film has a refractive index less than 1.45, reducing the reflectivity of less than 3.0%. Furthermore, since the antireflection film comprises crosslink oxide colloid, the film exhibits superior mechanical strength and is suitable for use in display devices.
    Type: Grant
    Filed: September 9, 2005
    Date of Patent: February 9, 2010
    Assignee: Industrial Technology Research Institute
    Inventors: Wu-Jing Wang, Yen-Po Wang, Yun-Ching Lee, Joung-Yei Chen, Hsi-Hsin Shih
  • Publication number: 20070154721
    Abstract: An infrared cut-off hard coating. The infrared cut-off hard coating comprises the product through the following steps. A coating of a composition is formed, wherein the composition comprising the following components as a uniform solution in an organic solvent: a multi-functionality polymerizable resin, infrared cut-off particles, and a free radical initiator. The coating is cured to form the infrared cut-off hard coating with a thickness of not less than 1000 nm. Due to the sufficient thickness thereof, the infrared cut-off hard coating has improved supportability and surface hardness.
    Type: Application
    Filed: May 30, 2006
    Publication date: July 5, 2007
    Inventors: Wu-Jing Wang, Che-Yu Tsai, Joung-Yei Chen
  • Publication number: 20060099407
    Abstract: An antireflective coating composition, antireflection films and fabrication method thereof. The antireflection film is constructed by stacked crosslink colloid particles, having a plurality of nanopores distributed uniformly therein. Due to the nanopores, the antireflection film has a refractive index less than 1.45, reducing the reflectivity of less than 3.0%. Furthermore, since the antireflection film comprises crosslink oxide colloid, the film exhibits superior mechanical strength and is suitable for use in display devices.
    Type: Application
    Filed: September 9, 2005
    Publication date: May 11, 2006
    Inventors: Wu-Jing Wang, Yen-Po Wang, Yun-Ching Lee, Joung-Yei Chen, Hsi-Hsin Shih
  • Patent number: 7009647
    Abstract: A photodetector is formed in a CMOS circuit using a junction field-effect transistor (JFET). The JFET/CMOS photodetector can be used to create an active pixel sensor for a CMOS digital imager, performing both photodetection and electrical signal amplification, allowing higher fill factors than with conventional APS imagers. A standard CMOS fabrication process is augmented with a small number of steps to integrate the JFET within the pixel, allowing the use of conventional CMOS fabrication plants.
    Type: Grant
    Filed: April 24, 2000
    Date of Patent: March 7, 2006
    Assignee: ESS Technology, Inc.
    Inventors: Lester J. Kozlowski, Frank Chang, Wu-Jing Ho
  • Publication number: 20060046045
    Abstract: A nanoporous film and fabrication method thereof. The nanoporous film according to the present invention has a plurality of nanopores distributed uniformly therein. Due to the nanopores, the nanoporous film has a refractive index less than 1.45, reducing the reflectivity of less than 3.0%. Furthermore, since the nanoporous film comprises organic-inorganic hybrid with a high crosslink density, the film exhibits superior mechanical strength and is highly suitable for use as anti-reflection and anti-abrasion coatings.
    Type: Application
    Filed: August 29, 2005
    Publication date: March 2, 2006
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Wu-Jing Wang, Yen-Po Wang, Yun-Ching Lee, Joung-Yei Chen, Hsi-Hsin Shih, Hsein-Pin Chen
  • Publication number: 20060046046
    Abstract: A polymer film with three-dimensional nanopores and fabrication method thereof. The polymer film according to the invention has a plurality of nanopores distributed uniformly thereover and presents a sponge-like profile. Due to the nanopores being sufficiently filled by air, the polymer film has a refractive index less than 1.45, reducing the reflectivity thereof to less than 2.0%. Furthermore, the polymer film exhibits superior antifouling properties as the contact angle of the polymer film to water greater than 90°.
    Type: Application
    Filed: August 16, 2005
    Publication date: March 2, 2006
    Inventors: Wu-Jing Wang, Yen-Po Wang, Joung-Yei Chen
  • Publication number: 20060037275
    Abstract: A tilt support structure is disclosed. The structure comprises a force exerted unit and a restriction unit, characterized in that the cross section of the end portion of the force exerted unit is larger than that of the middle section and the force exerted unit is mounted into the restriction unit, the restriction unit includes a single or a plurality of sleeves and in combination with concrete, cement slurry or enhanced steel beam or steel plate to form an external frame to restrict the main force exerted unit so as to prevent damage as a result of compression and the structure is stable under compression or pulling.
    Type: Application
    Filed: August 17, 2004
    Publication date: February 23, 2006
    Inventors: Chiao-Yu Jen, Pi-Yao Chuang, Wu-Jing Huang
  • Patent number: 4981743
    Abstract: This disclosure concerns protective overcoatings for an information storage record which includes an information-layer adapted for optical data recording. The protective overcoatings are transparent to recording radiation and especially adapted to enhance service life and recording characteristics.A typical coating comprises the polymerization product of a formulation including at least one radiation-cured "bulk resin" (e.g, an acrylated epoxy or an acrylate monomer or pre-polymer), plus an associated non-yellowing photo-initiator, a non-yellowing adhesion-promoter and related coating-constituents.Once applied, this coating is cured by exposure to UV radiation such as to cure it without heating it significantly so that said radiation functions as the sole or principal polymerizing agent, acting quickly, and with little or no supplemental heat, and without extended "tackiness". This formulation will readily "level" to render the desired coating to serve as a mechanical/chemical barrier.
    Type: Grant
    Filed: July 25, 1988
    Date of Patent: January 1, 1991
    Assignee: Unisys Corporation
    Inventor: Wu-Jing Ho
  • Patent number: D937896
    Type: Grant
    Filed: May 29, 2019
    Date of Patent: December 7, 2021
    Assignee: HUAWEI TECHNOLOGIES CO., LTD.
    Inventors: Fang Liu, Wu Jing
  • Patent number: D937897
    Type: Grant
    Filed: May 29, 2019
    Date of Patent: December 7, 2021
    Assignee: HUAWEI TECHNOLOGIES CO., LTD.
    Inventors: Wu Jing, Fang Liu