Abstract: A whirlwind-type oxidation combustion apparatus for processing semiconductor fabrication exhaust gas is disclosed. An inlet head is set on the top of an exhaust gas processing tank. An exhaust gas passage is set inside the inlet head and connected to an external exhaust gas supply terminal and the exhaust gas processing tank, for guiding the exhaust gas into the exhaust gas processing tank. An ignition chamber is formed between two partitions outside the exhaust gas passage. The two partitions have multiple inclined holes interconnecting an external combustion gas supply terminal, the ignition chamber, and the exhaust gas processing tank. The inclined holes guide a combustion gas to swirl into the exhaust gas processing tank through the ignition chamber. An igniter in the ignition chamber ignites the combustion gas to form a vortex flame which burns the exhaust gas. The exhaust gas is further caused to swirl onto a water screen.

Abstract: A whirlwind-type oxidation combustion apparatus for processing semiconductor fabrication exhaust gas is disclosed. An inlet head is set on the top of an exhaust gas processing tank. An exhaust gas passage is set inside the inlet head and connected to an external exhaust gas supply terminal and the exhaust gas processing tank, for guiding the exhaust gas into the exhaust gas processing tank. An ignition chamber is formed between two partitions outside the exhaust gas passage. The two partitions have multiple inclined holes interconnecting an external combustion gas supply terminal, the ignition chamber, and the exhaust gas processing tank. The inclined holes guide a combustion gas to swirl into the exhaust gas processing tank through the ignition chamber. An igniter in the ignition chamber ignites the combustion gas to form a vortex flame which burns the exhaust gas. The exhaust gas is further caused to swirl onto a water screen.