Abstract: A water molecule supply device for a plasma torch excitation device, comprising a flame outlet end formed at a bottom end of a plasma torch excitation device. The plasma torch excitation device has a water cavity therein, and the flame outlet end is fixed and provided with a mask body having a flame channel through which the plasma torch is ejected. A plurality of water guiding holes surrounding the flame channel are formed in the mask body, and the plurality of water guiding holes are respectively connected between the water cavity and the flame channel. The water molecules are supplied from the flame channel to be ejected so that water molecules contact the torch flame in the flame channel to capture the F2 gas so as to react into hydrogen fluoride (HF) which is more easily subjected to water washing filtration.

Abstract: A plasma torch excitation device includes an electrode core frame having a chamber; an electrode implanted in the chamber to form a gas collecting conduit surrounding between the electrode and a wall of the chamber; and an electrode housing fixed at a bottom end of the electrode core frame, the electrode housing having a core bore, the inner end of the core bore communicating with the gas collecting conduit, the outer end serving as a blasting port of the plasma torch. The electrode has an electric ion projecting end, the electric ion projecting end is adjacent to the inner end of the core bore, and a conical bore wall is formed between the inner end and the outer end of the core bore, the conical bore wall is formed by the inner end gradually expanding to the outer end. It can solve the conventional problems of well-known plasma torches, such as, limitation of flame temperature and flame length due to shortness of the core bore.

Abstract: The invention relates to a method of capturing a sintered product after sintering a waste gas in a semiconductor manufacturing process and its capturing device. The method comprises providing aerosolized water molecules to be entered into a reaction chamber of a waste gas treatment tank; and capturing a product generated after a sintering reaction of the waste gas by diffusion distributing of the aerosolized water molecules, wherein, the aerosolized water molecules are diffusion distributed between a bottom edge of a waste gas reaction end in the reaction chamber and a tank wall surrounding the reaction chamber. The present invention further provides a device for capturing a sintered product for implementing the method.

Abstract: A gas injection blower includes a housing forming a box around the pump chamber, wherein the perimeter of the housing is also formed with a pump chamber communicating air inlet and an exhaust outlet, a fan shaft connected to a drive shaft the form of a rotatable type arranged in the pump chamber, the air inlet, forming a pressurized chamber of the pump flow passage between the fan and air vents and communicate with each other, the drive shaft extending through the shaft connected to a pump outdoor power source, wherein the drive shaft, at least between the inner wall of the frame around the blades and the pump chamber is formed a slit communicating the boost pressure drop of the flow channel, which is housing and forming a gap communicating the pressure drop gas injection passage; with the passage of gas injected into the inner injection cleaning gas pressure, to improve the traditional drop relatively easy accumulation of dust inside the gap problem.

Abstract: A device of purifying a fluoride in a semiconductor process waste gas includes a reaction chamber formed in a waste gas treating tank, and a heat pipe disposed in the waste gas treating tank and inserted into the reaction chamber. A water injection pipe is disposed at the outside end of the heat pipe formed at an outside of the waste gas treating tank, a heating rod is disposed in and passes through the heat pipe, a passage is formed between the heating rod and the heat pipe, water is guided and enters into the passage by the water injection pipe, the water in the passage contacts with the heating rod to produce a mist gaseous water at a high temperature, the mist gaseous water is guided and enters into the reaction chamber via the plurality of spit-outs to dissolve the fluoride to be reacted into a hydrogen fluoride, and a dissolving temperature of the mist gaseous water contacting with the fluoride is 370˜1300° C.

Abstract: A device of capturing a sintered product after sintering a waste gas in a semiconductor manufacturing process includes: a cover disposed at a top of a reaction chamber formed on a waste gas treatment tank; a waste gas introducing pipe and a heater respectively disposed in the reaction chamber, a waste gas reaction end being formed at the heater in the reaction chamber corresponding to an outlet of the waste gas introducing pipe; a ring-shaped water disk disposed between the cover and the waste gas treatment tank, an inlet pipe located outside of the reaction chamber being formed on the ring-shaped water disk; and a plurality of nozzles spaced apart at a circumferential distance distributed in the reaction chamber.

Abstract: A device of purifying a fluoride in a semiconductor process waste gas includes a reaction chamber formed in a waste gas treating tank, and a heat pipe disposed in the waste gas treating tank and inserted into the reaction chamber. A water injection pipe is disposed at the outside end of the heat pipe formed at an outside of the waste gas treating tank, a heating rod is disposed in and passes through the heat pipe, a passage is formed between the heating rod and the heat pipe, water is guided and enters into the passage by the water injection pipe, the water in the passage contacts with the heating rod to produce a mist gaseous water at a high temperature, the mist gaseous water is guided and enters into the reaction chamber via the plurality of spit-outs to dissolve the fluoride to be reacted into a hydrogen fluoride, and a dissolving temperature of the mist gaseous water contacting with the fluoride is 370˜1300° C.

Abstract: A gas injection blower includes a housing forming a box around the pump chamber, wherein the perimeter of the housing is also formed with a pump chamber communicating air inlet and an exhaust outlet, a fan shaft connected to a drive shaft the form of a rotatable type arranged in the pump chamber, the air inlet, forming a pressurized chamber of the pump flow passage between the fan and air vents and communicate with each other, the drive shaft extending through the shaft connected to a pump outdoor power source, wherein the drive shaft, at least between the inner wall of the frame around the blades and the pump chamber is formed a slit communicating the boost pressure drop of the flow channel, which is housing and forming a gap communicating the pressure drop gas injection passage; with the passage of gas injected into the inner injection cleaning gas pressure, to improve the traditional drop relatively easy accumulation of dust inside the gap problem.

Abstract: The invention relates to a method of capturing a sintered product after sintering a waste gas in a semiconductor manufacturing process and its capturing device. The method comprises providing aerosolised water molecules to be entered into a reaction chamber of a waste gas treatment tank; and capturing a product generated after a sintering reaction of the waste gas by diffusion distributing of the aerosolised water molecules, wherein, the aerosolised water molecules are diffusion distributed between a bottom edge of a waste gas reaction end in the reaction chamber and a tank wall surrounding the reaction chamber. The present invention further provides a device for capturing a sintered product for implementing the method.

Abstract: A dust filter mounted in a semiconductor waste gas treatment equipment comprising a housing having a chamber in the housing for passing a gas containing a water molecular and a dust through; and one or more main filtration boxes which can be implanted into the chamber by withdrawing way. One or more capturing rings and a filtering cotton for filtering the water molecular and the dust from the gas being disposed in the main filtration box, and the gas being sequentially passed through the capturing ring and the filtering cotton. It is an objective to solve a problem saying that it is not easy to clean the conventional dust filter because the structure of it is too complex.

Abstract: A dust filter mounted in a semiconductor waste gas treatment equipment comprising a housing having a chamber in the housing for passing a gas containing a water molecular and a dust through; and one or more main filtration boxes which can be implanted into the chamber by withdrawing way. One or more capturing rings and a filtering cotton for filtering the water molecular and the dust from the gas being disposed in the main filtration box, and the gas being sequentially passed through the capturing ring and the filtering cotton. It is an objective to solve a problem saying that it is not easy to clean the conventional dust filter because the structure of it is too complex.

Abstract: The invention relates to a method of purifying a fluoride in a semiconductor process waste gas. The method comprises the steps of importing a mist gaseous water at a high temperature produced by heating water in a reaction chamber of a semiconductor waste gas treating tank; and dissolving the fluoride into a hydrogen fluoride by using the mist gaseous water, wherein a dissolving temperature of the mist gaseous water contacting with the fluoride is 370˜1300° C. This invention provides a device of purifying a fluoride in a semiconductor process waste gas. The conventional problems saying that the steps and structure of the device of purifying the fluoride in the semiconductor process waste gas are too complex and a purifying efficiency is hard to be increased.