Patents by Inventor Wun-Ku Wang

Wun-Ku Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6280907
    Abstract: A process is disclosed for forming resistors on a printed circuit substrate. The method includes the step of applying a photoresist layer onto substrate, and forming openings in the photoresist layer to expose the preselected regions for resistors, such that polymer thick resist pastes as well as resistive metallic films can be applied onto the substrate through these openings with precise geometry. The process according to the invention has higher accuracy and greater processing flexibility than the prior art processes where the resistor pastes are directly applied onto the substrate by screen printing.
    Type: Grant
    Filed: June 30, 1999
    Date of Patent: August 28, 2001
    Assignee: Industrial Technology Research Institute
    Inventors: Chia-Tin Chung, Bin-Yuan Lin, Wun-Ku Wang, Wei-Chun Yang, Hsin-Herng Wang, Te-Yeu Su
  • Patent number: 6030553
    Abstract: Polymer thick film resistor pastes with dimensionally stability and excellent processibility, such as coating, printing, and extruding, are disclosed. The resistor paste composition in accordance with the present invention comprises a low-k cycloaliphatic epoxy resin vehicle loaded with electrically conductive particles, a cationic photoinitiator, a thermal catalyst, and optionally a reactive diluent.
    Type: Grant
    Filed: June 30, 1999
    Date of Patent: February 29, 2000
    Assignee: Industrial Technology Research Institute
    Inventors: Hui-min Huang, Chia-Tin Chung, Bin-Yuan Lin, Hsin-Herng Wang, Wun-Ku Wang, Te-Yeu Su, Su-Jen Chang