Patents by Inventor Wun Wang

Wun Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20060072006
    Abstract: A 3D stereo display method and a device thereof. Two sets of shutters are disposed in a display. The shutters are complementarily interlaced with each other. The opening/closing of the two sets of shutters are controlled by time interval concept. When the display frequency is odd frequency, one set of shutters is activated. When the display frequency is even frequency, the other set of shutters is activated. The two sets of shutters are continuously opened and closed according to the variation of the frequency so that in odd and even frequencies, the left and right eyes can respectively see independent images formed of different subpixels. Therefore, a 3D display effect is presented to bare eyes without reducing resolution.
    Type: Application
    Filed: October 5, 2004
    Publication date: April 6, 2006
    Inventors: Lin Lin, Han Lin, Wun Wang
  • Patent number: 6947806
    Abstract: This invention relates to a method for yield loss analysis of process steps of semiconductor wafers having a plurality of dies, and more particularly relates to a defect inspection technique to determine a hit ratio, computation of yield impact contributions for the defects, and determination of a kill ratio for a specific type of defect. Yield loss is estimated ultimately upon a choice of a defect density distribution function. A defect calibrated factor and a yield impact calibrated factor are introduced herein.
    Type: Grant
    Filed: September 4, 2003
    Date of Patent: September 20, 2005
    Assignee: ProMOS Technologies Inc.
    Inventor: Wun Wang
  • Publication number: 20050055121
    Abstract: This invention relates to a method for yield loss analysis of process steps of semiconductor wafers having a plurality of dies, and more particularly relates to a defect inspection technique to determine a hit ratio, computation of yield impact contributions for the defects, and determination of a kill ratio for a specific type of defect. Yield loss is estimated ultimately upon a choice of a defect density distribution function. A defect calibrated factor and a yield impact calibrated factor are introduced herein.
    Type: Application
    Filed: September 4, 2003
    Publication date: March 10, 2005
    Inventor: Wun Wang