Patents by Inventor Wusheng Li

Wusheng Li has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200235321
    Abstract: A display panel is provided, including a substrate on a base, a transistor stack on the substrate, and a fluorescent layer between the base and the transistor stack. The fluorescent layer is configured to prevent light from damaging an active layer in the transistor stack in a laser lift-off process, and an orthographic projection of the fluorescent layer on the base overlaps an orthographic projection of the active layer on the base. A display device comprising the display panel, and a manufacturing method of the display panel are further provided.
    Type: Application
    Filed: October 10, 2019
    Publication date: July 23, 2020
    Inventors: Shipei LI, Qi YAO, Wusheng LI, Jiangnan LU, Huili WU, Fang HE, Renquan GU, Dongsheng YIN, Sheng XU, Wei HE
  • Patent number: 10663855
    Abstract: The present disclosure relates to a photoetching parameter adjustment method, apparatus and mask plate, in the field of photoetching technology. The method comprises: forming a photoresist pattern on a first substrate by a photoetching process, wherein the photoresist pattern comprises a photoetching detection pattern; judging whether photoetching parameters of the photoetching process need to be adjusted or not in accordance with the photoetching detection pattern; and adjusting the photoetching parameters when the photoetching parameters need to be adjusted. The present disclosure solves the problem that the reliability of the photoetching parameters is low and improves the reliability of the photoetching parameters. The present disclosure is used for adjusting photoetching parameters.
    Type: Grant
    Filed: December 1, 2017
    Date of Patent: May 26, 2020
    Assignee: BOE Technology Group Co., Ltd.
    Inventors: Wusheng Li, Zhanfeng Cao
  • Publication number: 20200142108
    Abstract: A grating structure, a manufacturing method thereof and a display device are provided. The method of manufacturing the grating structure includes: forming a photosensitive material layer on a substrate; patterning the photosensitive material layer to form a grating transition pattern, where the grating transition pattern includes multiple grating units, the multiple grating units each include a first portion and a second portion which are symmetric, and at least one of the first portion and the second portion includes multiple subunits to have a stepped structure; and curing the grating transition pattern to form the grating structure.
    Type: Application
    Filed: October 22, 2019
    Publication date: May 7, 2020
    Applicant: BOE TECHNOLOGY GROUP CO., LTD.
    Inventors: Wusheng LI, Qi YAO
  • Publication number: 20200105790
    Abstract: The disclosure relates to an array substrate and a manufacturing method therefor, a display panel, and a display device. The array substrate comprises a base substrate, and a lead-out line and an inorganic insulating layer which are located on one side of the base substrate; the base substrate is provided with a plurality of connection vias penetrating the base substrate and filled with a first conductive material; the inorganic insulating layer is provided with a first via and a second via, the first via penetrating to the first conductive material, and the second via penetrating to the lead-out line; a second conductive layer is disposed on the side, away from the base substrate, of the first via, the second via and the inorganic insulating layer, such that the first conductive material and the lead-out line are electrically connected through the second conductive layer.
    Type: Application
    Filed: April 30, 2019
    Publication date: April 2, 2020
    Inventors: Renquan GU, Qi YAO, Wusheng LI, Dongsheng LI, Huili WU, Shipei LI, Dongsheng YIN, Fang HE, Yang YUE
  • Publication number: 20200091246
    Abstract: A photosensitive sensor and a method of manufacturing the photosensitive sensor are disclosed. The photosensitive sensor includes a thin film transistor and a photosensitive element on a substrate, wherein the photosensitive element includes a first electrode, a second electrode, and a photosensitive layer between the first electrode and the second electrode. The second electrode is connected to a drain electrode of the thin film transistor. An orthographic projection of an active layer of the thin film transistor on the substrate is within an orthographic projection of the second electrode on the substrate. The second electrode includes at least two stacked conductive layers, at least one of the at least two stacked conductive layers being a light shielding metal layer.
    Type: Application
    Filed: September 17, 2019
    Publication date: March 19, 2020
    Inventors: Shipei Li, Wusheng Li, Qi Yao, Dongsheng Li, Fang He, Huili Wu, Renquan Gu, Sheng Xu, Wei He, Dongsheng Yin, Ying Zhao
  • Patent number: 10483129
    Abstract: The disclosure discloses a method for roughening a surface of a metal layer, a thin film transistor, and a method for fabricating the same. The method for roughening the surface of a metal layer includes: forming a first photo-resist layer on the surface of the metal layer, and processing the first photo-resist layer at high temperature; and stripping the first photo-resist layer to roughen the surface of the metal layer.
    Type: Grant
    Filed: September 27, 2017
    Date of Patent: November 19, 2019
    Assignee: BOE Technology Group Co., Ltd.
    Inventors: Jing Feng, Seung Jin Choi, Fangzhen Zhang, Wusheng Li, Zhijun Lv, Ce Ning, Jiushi Wang
  • Patent number: 10467591
    Abstract: A system and a method for detecting a substrate and a manufacturing device are disclosed. The detection system includes: an emitting unit and a control unit; wherein the emitting unit provides a first reference light and a second reference light, the first reference light propagates to the control unit, the second reference light is modulated by the substrate to generate a test light, the test light propagates to the control unit; the control unit obtains and compares a power of the first reference light and a power of the test light so as to determine whether a foreign matter is present on a surface of the substrate. The detection system can prevent foreign matters such as photoresist from influencing other manufacturing devices such as cleaning and deposition devices, which is beneficial to the maintenance and service of the manufacturing devices.
    Type: Grant
    Filed: October 21, 2016
    Date of Patent: November 5, 2019
    Assignee: BOE TECHNOLOGY GROUP CO., LTD.
    Inventors: Wusheng Li, Zhengliang Li, Zhen Liu
  • Patent number: 10401741
    Abstract: Embodiments of the disclosure disclose a method and structure for detecting distortion in a pattern. In this solution, a first photosensitive material is exposed and developed to form a desirable pattern to be detected, and also a detection step including two levels at different heights is formed in a preset detection area of the pattern to be detected; and then a second photosensitive material is exposed and developed according to the same exposure machine parameters to form a detection pattern in the detection area for detecting exposure defocusing, and if preset size parameters of the detection pattern at the two levels of the detection step are consistent, then it is indicated that the formed pattern to be detected is not distorted due to exposure defocusing; otherwise, it is indicated that the pattern to be detected is distorted due to exposure defocusing.
    Type: Grant
    Filed: September 28, 2017
    Date of Patent: September 3, 2019
    Assignee: BOE TECHNOLOGY GROUP CO., LTD.
    Inventor: Wusheng Li
  • Publication number: 20190181161
    Abstract: Arrangements of the present disclosure provide a manufacturing method. The manufacturing method includes forming a first conductive pattern comprising a first signal line on a base substrate. The manufacturing method includes forming a second conductive pattern comprising a second conductive line on a side of the first conductive pattern away from the base substrate. The first signal line and the second signal line intersect with each other and are insulated from each other. An overlapping region is formed by orthogonal projections of the second signal line and the first signal line on the base substrate. A length of an edge of the overlapping region extending in a direction along with the second signal line is greater than a linear distance between two vertices of the edge.
    Type: Application
    Filed: May 15, 2018
    Publication date: June 13, 2019
    Inventor: Wusheng Li
  • Patent number: 10216317
    Abstract: Disclosed is a touch screen which includes: a display panel; a cover plate located at a light exit side of the display panel; a plurality of touch electrodes located at a side of the cover plate facing towards the display panel; and a bezel portion surrounding the touch electrodes and comprising a non-black photoresist layer, a low-reflectivity conductive layer and an insulating layer which are successively stacked in a direction from the cover plate to the display panel. Also disclosed are a display device and a method of operating the display device.
    Type: Grant
    Filed: September 9, 2016
    Date of Patent: February 26, 2019
    Assignee: BOE TECHNOLOGY GROUP CO., LTD.
    Inventor: Wusheng Li
  • Patent number: 10128321
    Abstract: The present disclosure provides a pixel isolation wall and its manufacturing method. The pixel isolation wall includes an oleophilic layer arranged on a substrate on which a TFT array and a pixel electrode array is formed, and an oleophobic layer arranged on the oleophilic layer and configured to define, together with the oleophilic layer, a plurality of recess regions corresponding to the pixel electrode array.
    Type: Grant
    Filed: March 1, 2016
    Date of Patent: November 13, 2018
    Assignee: BOE TECHNOLOGY GROUP CO., LTD.
    Inventors: Wusheng Li, Shi Shu, Xiaolong He
  • Patent number: 10126848
    Abstract: The present application discloses a touch substrate, a display device having the same, and a manufacturing method thereof. The touch substrate comprises a touch electrode and a diffusive reflector disposed on the touch electrode.
    Type: Grant
    Filed: December 10, 2015
    Date of Patent: November 13, 2018
    Assignee: BOE Technology Group Co., Ltd.
    Inventors: Wusheng Li, Zhanfeng Cao
  • Publication number: 20180246403
    Abstract: Embodiments of the disclosure disclose a method and structure for detecting distortion in a pattern. In this solution, a first photosensitive material is exposed and developed to form a desirable pattern to be detected, and also a detection step including two levels at different heights is formed in a preset detection area of the pattern to be detected; and then a second photosensitive material is exposed and developed according to the same exposure machine parameters to form a detection pattern in the detection area for detecting exposure defocusing, and if preset size parameters of the detection pattern at the two levels of the detection step are consistent, then it is indicated that the formed pattern to be detected is not distorted due to exposure defocusing; otherwise, it is indicated that the pattern to be detected is distorted due to exposure defocusing.
    Type: Application
    Filed: September 28, 2017
    Publication date: August 30, 2018
    Inventor: Wusheng Li
  • Publication number: 20180224738
    Abstract: The present disclosure relates to a photoetching parameter adjustment method, apparatus and mask plate, in the field of photoetching technology. The method comprises: forming a photoresist pattern on a first substrate by a photoetching process, wherein the photoresist pattern comprises a photoetching detection pattern; judging whether photoetching parameters of the photoetching process need to be adjusted or not in accordance with the photoetching detection pattern; and adjusting the photoetching parameters when the photoetching parameters need to be adjusted. The present disclosure solves the problem that the reliability of the photoetching parameters is low and improves the reliability of the photoetching parameters. The present disclosure is used for adjusting photoetching parameters.
    Type: Application
    Filed: December 1, 2017
    Publication date: August 9, 2018
    Inventors: Wusheng Li, Zhanfeng Cao
  • Publication number: 20180226269
    Abstract: The disclosure discloses a method for roughening a surface of a metal layer, a thin film transistor, and a method for fabricating the same. The method for roughening the surface of a metal layer includes: forming a first photo-resist layer on the surface of the metal layer, and processing the first photo-resist layer at high temperature; and stripping the first photo-resist layer to roughen the surface of the metal layer.
    Type: Application
    Filed: September 27, 2017
    Publication date: August 9, 2018
    Inventors: Jing Feng, Seung Jin Choi, Fangzhen Zhang, Wusheng Li, Zhijun Lv, Ce Ning, Jiushi Wang
  • Publication number: 20180136748
    Abstract: The present application discloses a touch substrate, a display device having the same, and a manufacturing method thereof. The touch substrate comprises a touch electrode and a diffusive reflector disposed on the touch electrode.
    Type: Application
    Filed: December 10, 2015
    Publication date: May 17, 2018
    Applicant: BOE Technology Group Co., Ltd.
    Inventors: Wusheng LI, Zhanfeng CAO
  • Publication number: 20180090396
    Abstract: A system and a method for detecting a substrate and a manufacturing device are disclosed. The detection system includes: an emitting unit and a control unit; wherein the emitting unit provides a first reference light and a second reference light, the first reference light propagates to the control unit, the second reference light is modulated by the substrate to generate a test light, the test light propagates to the control unit; the control unit obtains and compares a power of the first reference light and a power of the test light so as to determine whether a foreign matter is present on a surface of the substrate. The detection system can prevent foreign matters such as photoresist from influencing other manufacturing devices such as cleaning and deposition devices, which is beneficial to the maintenance and service of the manufacturing devices.
    Type: Application
    Filed: October 21, 2016
    Publication date: March 29, 2018
    Inventors: Wusheng LI, Zhengliang LI, Zhen LIU
  • Patent number: 9891351
    Abstract: The present disclosure provides a display substrate. The display substrate includes a substrate having a display area and a border area surrounding the display area; a non-black photo-resist layer formed on the substrate in the border area; and a black photo-resist layer formed on the non-black photo-resist layer. The non-black photo-resist layer interfaces the black photo-resist layer with a diffusion structure.
    Type: Grant
    Filed: September 18, 2015
    Date of Patent: February 13, 2018
    Assignee: BOE TECHNOLOGY GROUP CO., LTD.
    Inventors: Wusheng Li, Ki Man Kim
  • Publication number: 20170285820
    Abstract: The present disclosure provides a touch substrate and a touch display device. The touch substrate comprises a touch region and a frame region. A base substrate, a shielding layer and a wiring are sequentially layered in the frame region. The shielding layer comprises a non-black photoresist layer and a black photoresist layer. The touch substrate further comprises an anti-reflective layer disposed between the non-black photoresist layer and the black photoresist layer. The base substrate, the non-black photoresist layer, the anti-reflective layer, the black photoresist layer and the wiring are sequentially layered. The anti-reflective layer is configured to reduce the reflection of the black photoresist layer against incident light from the direction of the base substrate. By providing the anti-reflective layer, the present disclosure can achieve the technical effect of reducing the reflection of the black photoresist layer.
    Type: Application
    Filed: February 22, 2016
    Publication date: October 5, 2017
    Applicant: Boe Technology Group Co., Ltd.
    Inventors: Wusheng LI, Shi SHU
  • Publication number: 20170263688
    Abstract: The present disclosure provides a pixel isolation wall and its manufacturing method. The pixel isolation wall includes an oleophilic layer arranged on a substrate on which a TFT array and a pixel electrode array is formed, and an oleophobic layer arranged on the oleophilic layer and configured to define, together with the oleophilic layer, a plurality of recess regions corresponding to the pixel electrode array.
    Type: Application
    Filed: March 1, 2016
    Publication date: September 14, 2017
    Applicant: BOE TECHNOLOGY GROUP CO., LTD.
    Inventors: Wusheng LI, Shi SHU, Xiaolong HE