Patents by Inventor X. Cass Shang

X. Cass Shang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Compounds for Photoresist Stripping
    Publication number: 20090111726
    Abstract: A composition for removing undesired matter from a substrate, the composition comprising hydroxylamine or a hydroxylamine derivative, a quaternary ammonium compound and at least one polar organic solvent. The composition is capable of removing photoresist from wafer level packaging and solder bumping applications.
    Type: Application
    Filed: September 29, 2008
    Publication date: April 30, 2009
    Inventor: X. Cass Shang