Patents by Inventor Xavier Duriez

Xavier Duriez has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240096898
    Abstract: The present description concerns an electronic device comprising: a silicon layer, an insulating layer in contact with a first surface of the silicon layer, a transistor comprising source, drain, and body regions arranged in the silicon layer, and a gate region topping the body region and comprising a gate portion laterally extending beyond the source and drain regions, the body region being continued by a body contact region not covered with the gate region, and a region of extension of the body region being located under the gate portion; the device further comprising, under the gate portion, a partial insulating trench in the silicon layer extending from a second surface of the silicon layer down to a depth smaller than the thickness of the silicon layer.
    Type: Application
    Filed: March 27, 2023
    Publication date: March 21, 2024
    Applicants: COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES, STMicroelectronics (Crolles 2) SAS
    Inventors: Tadeu MOTA FRUTUOSO, Xavier GARROS, Blandine DURIEZ, Sebastien CREMER
  • Publication number: 20240097030
    Abstract: The present description concerns an electronic device comprising: —a silicon layer having a first surface and a second surface, —an insulating layer in contact with the first surface of the silicon layer, —at least one transistor comprising source, drain, and body regions arranged in the silicon layer, and a gate region topping the body region and comprising a gate portion laterally extending beyond the source and drain regions, the body region being continued by a body contact region not covered with the gate region, and a region of extension of the body region being located under the gate portion; the gate portion being less heavily doped than the rest of the gate region.
    Type: Application
    Filed: March 27, 2023
    Publication date: March 21, 2024
    Applicants: COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES, STMicroelectronics (Crolles 2) SAS
    Inventors: Sebastien CREMER, Tadeu MOTA FRUTUOSO, Xavier GARROS, Blandine DURIEZ
  • Patent number: 6528069
    Abstract: A concentrated polyol composition, having a water content from 10-17%, preferably between 12 and 16%, and comprising from 35 to 90% of hydrogenated monosaccharides including at least 30% of sorbitol, and from 0 to 45% of hydrogenated disaccharides, these percentages being expressed as dry weight relative to the dry weight of all the hydrogenated saccharides contained in the said composition. This concentrated polyol composition may advantageously be unsweetened. This concentrated polyol composition may be used as a medium for dispersing hydrophilic polymers, and in particular cellulose, as well as for the preparation of pharmaceutical or cosmetological products such as toothpastes.
    Type: Grant
    Filed: November 29, 1999
    Date of Patent: March 4, 2003
    Assignee: Roquette Freres
    Inventors: Philippe Lefevre, Xavier Duriez, Scott L. Harris, Gina A. Steffensmeier