Patents by Inventor Xavier Duten

Xavier Duten has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12102974
    Abstract: The present invention concerns a reactor for the conversion of carbon dioxide or carbon monoxide into hydrocarbon and/or alcohol comprising a support made from an electrically and thermally conductive material, forming the wall or walls of at least one longitudinal channel that passes through the support and also acting as the cathode of the reactor, at least one wire electrode forming an anode of the reactor, and extending within each longitudinal channel, and being arranged at a distance from the wall or walls of the longitudinal channel, each wire electrode optionally being covered with an electrically insulating layer along the part of the wire electrode extending within the longitudinal channel, a catalyst capable of catalysing a conversion reaction for the conversion of carbon dioxide or carbon monoxide into hydrocarbon and/or alcohol, the catalyst being situated between the wire electrode and the wall or walls of each longitudinal channel.
    Type: Grant
    Filed: December 20, 2019
    Date of Patent: October 1, 2024
    Assignees: Paris Sciences et Lettres, Centre National de la Recherche Scientifique (CNRS), Sorbonne Universite, Ecole Nationale Superieure de Chimie de Paris, Univ Paris XIII Paris-Nord Villetaneuse
    Inventors: Vincent Piepiora, Stéphanie Ognier, Simeon Cavadias, Xavier Duten, Michael Tatoulian, Maria Elena Galvez-Parruca, Patrick Da Costa
  • Publication number: 20220040664
    Abstract: The present invention concerns a reactor for the conversion of carbon dioxide or carbon monoxide into hydrocarbon and/or alcohol comprising a support made from an electrically and thermally conductive material, forming the wall or walls of at least one longitudinal channel that passes through the support and also acting as the cathode of the reactor, at least one wire electrode forming an anode of the reactor, and extending within each longitudinal channel, and being arranged at a distance from the wall or walls of the longitudinal channel, each wire electrode optionally being covered with an electrically insulating layer along the part of the wire electrode extending within the longitudinal channel, a catalyst capable of catalysing a conversion reaction for the conversion of carbon dioxide or carbon monoxide into hydrocarbon and/or alcohol, the catalyst being situated between the wire electrode and the wall or walls of each longitudinal channel.
    Type: Application
    Filed: December 20, 2019
    Publication date: February 10, 2022
    Applicants: Paris Sciences et Lettres, Centre National de la Recherche Scientifique (CNRS), Sorbonne Universite, Ecole Nationale Superieure de Chimie de Paris, Univ Paris XIII Paris-Nord Villetaneuse
    Inventors: Vincent Piepiora, Stéphanie Ognier, Simeon Cavadias, Xavier Duten, Michael Tatoulian, Maria Elena Galvez-Parruca, Patrick Da Costa
  • Patent number: 7662441
    Abstract: Disclosed is a method for manufacturing a diamond film of electronic quality at a high rate using a pulsed microwave plasma. The plasma that has a finite volume is formed near a substrate (in a vacuum chamber) by subjecting a gas containing at least hydrogen and carbon to a pulsed discharge. The pulsed discharge has a succession of low-power states and of high-power states and a peak absorbed power PC, in order to obtain carbon-containing radicals in the plasma. These carbon-containing radicals are deposited on the substrate in order to form a diamond film. Power is injected into the volume of the plasma with a peak power density of at least 100 W/cm3, while maintaining the substrate to a substrate temperature of between 700° C. and 1000 ° C.
    Type: Grant
    Filed: June 18, 2003
    Date of Patent: February 16, 2010
    Assignees: Centre National de la Recherche Scientifique - CNRS, Universite Paris Nord (Paris XII) Institut Galilee
    Inventors: Alix Hélène Gicquel, François Silva, Xavier Duten, Khaled Hassouni, Guillaume Vincent Lombardi, Antoine Rousseau
  • Publication number: 20060153994
    Abstract: Method for manufacturing a diamond film of electronic quality at a high rate using a pulsed microwave plasma, in which, in a vacuum chamber, a plasma of finite volume is formed near a substrate by subjecting a gas containing at least hydrogen and carbon to a pulsed discharge, which has a succession of low-power states and of high-power states, and having a peak absorbed power Pc, so as to obtain at least carbon-containing radicals in the plasma and to deposit the said carbon-containing radicals on the substrate in order to form a diamond film thereon. Power is injected into the volume of the plasma with a peak power density of at least 100 W/cm3, while maintaining the substrate to a substrate temperature of between 700° C. and 1000° C.
    Type: Application
    Filed: June 18, 2003
    Publication date: July 13, 2006
    Inventors: Alix Gicquel, Francois Silva, Xavier Duten, Khaled Hassouni, Guillaume Lombardi, Antoine Rousseau