Abstract: The invention relates to a method of directional self-assembly lithography, said method comprising a step of depositing a block copolymer film on a layer (20) neutral with respect the block copolymer, said block copolymer film being for use as a lithography mask, said method being characterized in that it comprises the following steps of: depositing said neutral layer (20) on a surface of a substrate (10), said neutral layer (20) being of the carbon or fluoro-carbon type deposited to a thickness greater than 1.

Abstract: A device is provided for correcting the contours in an image comprising in the green channel a contour extraction circuit followed by a circuit for processing these contours. It also comprises in the red channel a second contour extraction circuit followed by a second circuit for processing the contours. A validation circuit only validates the contour signal coming from the red channel when the red level is relatively high with respect to the green level. In this case, the red contour signal is superimposed on the contour from the green channel for correcting the contours of the three chrominance channels, by means of a mixing circuit.