Abstract: A method for correcting aberrations of the eye applied to an ophthalmic instrument operating with an analysis light beam, including: measurement of aberrations of the eye capable of interfering with the analysis beam, correction of the phase of the wave front of the analysis beam as a function of the measured values of the aberrations, measurement of eye movements carried out independently of the measurement of aberrations, and modification of the correction of the phase of the wave front of the analysis beam as a function of the measurement of eye movements.

Abstract: A method for measuring, in a given plane, the scattering of an optical system, including: the illumination of the system by a point source emitting a light flux to be transmitted by the system, and including a direct flux component and a flux component scattered by the system; the interception of part of the transmitted flux by a sampler positioned in a plane, the intercepted flux including the direct flux component and a narrow angle of the scattered flux component; the measurement of the intercepted flux by an analyser including an array of microlenses and first image detector, each microlens forming the image of the sampler on the first image detector, the dimensions of the sampler being defined such that the images of the sampler formed by adjacent microlenses present an overlap zone smaller than the projection zone of a microlens on the image detector.

Abstract: Method for measuring, in a given measuring plane (PLM), the local scattering of an optical system (SYST), comprising: the illumination of the optical system by means of a point or quasi-point source (SC) emitting a light flux intended to be transmitted by the optical system, such that said transmitted flux comprises a component of direct flux (LD) and a component of flux scattered by said system; the interception of a central part of the transmitted flux by means for sampling the flux, of given dimensions, positioned in a plane conjugated with the plane of said source, the intercepted flux comprising the direct flux component and a part (DIFF_PA) called narrow angle of the scattered flux component; the measurement of the intercepted flux by means of an analyser comprising an array of microlenses (MLA) positioned in an image plane of the measurement plane and first means (CCD) for detecting an image, each microlens (Mli) forming the image of said sampling means on the first image detection means, the dimens

Abstract: A method for correcting aberrations of the eye applied to an ophthalmic instrument operating with an analysis light beam, including: measurement of aberrations of the eye capable of interfering with the analysis beam, correction of the phase of the wave front of the analysis beam as a function of the measured values of the aberrations, measurement of eye movements carried out independently of the measurement of aberrations, and modification of the correction of the phase of the wave front of the analysis beam as a function of the measurement of eye movements.

Abstract: A wavefront analysing device, of the Hartmann or Shack-Hartmann type, comprises in particular a set of sampling elements arranged in an analysis plane, and forming as many micro-lenses for sampling the incident wavefront, and a diffraction plane wherein are analysed the Airy discs of the different micro-lenses illuminated by the incident wavefront. The shape of each micro-lens is such that the associated diffraction figure has in the diffraction plane one or several preferential axe(s), and the microlenses are oriented in the analysis plane such that the preferential axe(s) of the diffraction figure of a micro-lens are offset relative to the preferential axes of the diffraction figures of neighbouring micro-lenses, thereby enabling to limit the overlapping of the diffraction figures.

Abstract: The invention concerns a device for analysing a wavefront with enhanced resolution. The inventive wavefront analysing device, of the Hartmann or Shack-Hartmann type, comprises in particular a set of sampling elements arranged in an analysis plane, and forming as many micro-lenses for sampling the incident wavefront, and a diffraction plane wherein are analysed the Airy discs of the different micro-lenses illuminated by the incident wavefront. The invention is characterised in that the shape of each micro-lens is such that the associated diffraction figure has in the diffraction plane one or several preferential axe(s), and the micro-lenses are oriented in the analysis plane such that the preferential axe(s) of the diffraction figure of a micro-lens are offset relative to the preferential axes of the diffraction figures of neighbouring micro-lenses, thereby enabling to limit the overlapping of the diffraction figures.

Abstract: The invention relates to a device for measuring aberrations in an eye-type system comprising, in particular, an illumination path (VE) with an illumination diaphragm (APT) and a test path (VA), imaging means (L1) and means of positioning the eye (VI) in relation to said imaging means. The inventive device also comprises a stray reflection filtration element (FLT), which is centred on the measurement axis (z) of the imaging means, and means for the optical conjugation (L2, L3) of the pupil of the eye with the plane of the illumination diaphragm and the test plane. According to the invention, the illumination beam path converges at the centre of the filtration element (FLT). The filtration element, the illumination path, the test path and the conjugation means are all interdependent and positioned on a platform (PTF1) that can move in relation to the imaging means (L1) along axis z.

Abstract: A device for the analysis of an optical wavefront includes an array (ML) of microlenses (Li), and signal processing elements. Each mircolens (Li) defines a subaperature (Spi), and focuses an elementary surface of the wavefront, intercepted by the subaperature, for forming a spot (Ti) on the detector. For each subaperature (Spi), a zone (Zi) of assumed localization of the spot is defined. The processing unit makes it possible to establish a measurement file associating to each subaperature the position of this spot. The structure of the array (ML) presents one or several local variations. By comparing the contribution of these local variations taken from the measurement file, with their contribution taken from a reference file, the displacement between the subaperature from which a detected spot is derived and the subaperature that defines the zone of assumed localization wherein the spot is located is measured.