Patents by Inventor Xi PEI

Xi PEI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240183739
    Abstract: The present disclosure provides a double-vacuum four-cavity hermeticity detecting method and machine for a square housing battery. The method may include a loading device, four cavity devices, four cavity cover devices, four load transferring devices, two vacuum devices, a detecting device, and a discharging device, the cavity devices and the cavity cover devices may make a sealed cavity, and each of the vacuum devices predetermine two sealed cavities. While operating at the same time, four sealed cavities may be loaded for 8 s, vacuumed for 10 s and detected for a hermeticity for 5 s in a total of 15 s, and discharged for 8 s, a cycle time may be shortened to 8 s and a production period may be shortened to 32 s, and a productivity of a hermeticity detection may be improved to 15 PPM according to two batteries per cavity.
    Type: Application
    Filed: February 9, 2024
    Publication date: June 6, 2024
    Applicant: SHENZHEN UTIMES INTELLIGENT EQUIPMENT CO., LTD.
    Inventors: Xi CHEN, Yangdong LIU, Qiaobing DENG, Doudou PEI
  • Publication number: 20080261384
    Abstract: A method of removing a photoresist layer is provided. An ion implantation process has been performed on the photoresist layer to transform a surface of the photoresist layer to a crust and a soft photoresist layer remains within the crust. The method includes performing a first removing step to remove the crust, such that the soft photoresist layer is exposed. Thereafter, a second removing step is performed to remove the soft photoresist layer. The first and the second removing steps are performed in difference chambers, and a temperature for performing the first removing step is lower than that for performing the second removing step and lower than a gasification temperature of a solvent in the soft photoresist layer.
    Type: Application
    Filed: April 18, 2007
    Publication date: October 23, 2008
    Applicant: UNITED MICROELECTRONICS CORP.
    Inventors: Zhi-Qiang Sun, Xi PEI, Tien-Cheng Lan, Yu-Jou Chen, Guo-Fu Zhou, Kai-Ping Huang, Hong-Siek Gan, Jian-Peng Yan, Kai YANG, Sheng ZHANG