Patents by Inventor Xi-Zhao Wang

Xi-Zhao Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11652051
    Abstract: The present disclosure provides a contact structure and an electronic device having the same. The contact structure includes: a substrate; a copper layer disposed on the substrate; an adhesion promotion layer disposed on the copper layer, wherein the adhesion promotion layer forms a monomolecular adsorption layer on the surface of the copper layer; and a silver nanowire layer disposed on the adhesion promotion layer, and the adhesive force between the copper layer and the silver nanowire layer is 3B or more. In the present disclosure, by disposing the adhesion promotion layer on the copper layer, in the stacked structure of the copper layer and the silver nanowire layer, the adhesive force between the copper layer and the silver nanowire layer is increased, so as to prevent a peeling phenomenon of the copper layer occurring in the subsequent yellow-light process.
    Type: Grant
    Filed: January 22, 2021
    Date of Patent: May 16, 2023
    Assignee: TPK Advanced Solutions Inc.
    Inventors: Yi-Min Jiang, Xi-Zhao Wang, Li-Wei Mu, Shan-Yu Wu, Chih-Min Chen, Chao-Hui Kuo, Wei-Chuan Chao, Chia Jui Lin
  • Patent number: 11652052
    Abstract: The present disclosure provides a contact structure and an electronic device having the same. The contact structure includes a substrate, a copper layer, an organic composite protective layer, and a silver nanowire layer. The copper layer is disposed on the substrate. The nanowire-distribution-promotion layer is disposed between the copper layer and the silver nanowire layer.
    Type: Grant
    Filed: March 29, 2021
    Date of Patent: May 16, 2023
    Assignee: TPK Advanced Solutions Inc.
    Inventors: Xi-Zhao Wang, Yi-Min Jiang, Li-Wei Mu, Shan-Yu Wu, Chao-Hui Kuo, Can-Liang Zhao, Hong-Yan Lian, Chun-Wei Liu
  • Publication number: 20220308727
    Abstract: The present disclosure provides a contact structure and an electronic device having the same. The contact structure includes a substrate, a copper layer, an organic composite protective layer, and a silver nanowire layer. The copper layer is disposed on the substrate. The nanowire-distribution-promotion layer is disposed between the copper layer and the silver nanowire layer.
    Type: Application
    Filed: March 29, 2021
    Publication date: September 29, 2022
    Inventors: Xi-Zhao Wang, Yi-Min Jiang, Li-Wei Mu, Shan-Yu Wu, Chao-Hui Kuo, Can-Liang Zhao, Hong-Yan Lian, Chun-Wei Liu
  • Publication number: 20220238749
    Abstract: The present disclosure provides a contact structure and an electronic device having the same. The contact structure includes: a substrate; a copper layer disposed on the substrate; an adhesion promotion layer disposed on the copper layer, wherein the adhesion promotion layer forms a monomolecular adsorption layer on the surface of the copper layer; and a silver nanowire layer disposed on the adhesion promotion layer, and the adhesive force between the copper layer and the silver nanowire layer is 3B or more. In the present disclosure, by disposing the adhesion promotion layer on the copper layer, in the stacked structure of the copper layer and the silver nanowire layer, the adhesive force between the copper layer and the silver nanowire layer is increased, so as to prevent a peeling phenomenon of the copper layer occurring in the subsequent yellow-light process.
    Type: Application
    Filed: January 22, 2021
    Publication date: July 28, 2022
    Inventors: Yi-Min Jiang, Xi-Zhao Wang, Li-Wei Mu, Shan-Yu Wu, Chih-Min Chen, Chao-Hui Kuo, Wei-Chuan Chao, Chia Jui Lin
  • Publication number: 20220177717
    Abstract: A contact structure is provided, which includes a substrate, a copper layer, an organic composite protective layer, and a nanosilver layer. The copper layer is disposed over the substrate. The organic composite protective layer is disposed over the copper layer to avoid oxidation of the copper layer, in which the organic composite protective layer forms a monomolecular adsorption layer over a surface of the copper layer. The nanosilver layer is disposed over the organic composite protective layer. A method of manufacturing a contact structure is also provided.
    Type: Application
    Filed: December 9, 2020
    Publication date: June 9, 2022
    Inventors: Zhi-Qiang Lin, Yi-Min Jiang, Shen-Jie Chen, Ting-Ting Li, Xi-Zhao Wang, Li-Wei Mu, Shan-Yu Wu, Chih-Min Chen, Chao-Hui Kuo