Patents by Inventor Xia Man

Xia Man has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Reduction of surface and embedded substrate charge by controlled exposure to vacuum ultraviolet (VUV) light in low-oxygen environment
    Patent number: 10483010
    Abstract: A system for reducing surface and embedded charge in a substrate includes a substrate support configured to support a substrate. A vacuum ultraviolet (VUV) assembly is arranged adjacent to the substrate and includes a housing and a VUV lamp that is connected to the housing and that generates and directs ultraviolet (UV) light at the substrate. A movement device is configured to move at least one of the VUV assembly and the substrate support during exposure of the substrate to the UV light to reduce surface and embedded charge in the substrate.
    Type: Grant
    Filed: September 7, 2016
    Date of Patent: November 19, 2019
    Assignee: LAM RESEARCH AG
    Inventors: Rafal Dylewicz, Reinhold Schwarzenbacher, Xia Man, Kenichi Sano, David Lou, Milan Pliska
  • REDUCTION OF SURFACE AND EMBEDDED SUBSTRATE CHARGE BY CONTROLLED EXPOSURE TO VACUUM ULTRAVIOLET (VUV) LIGHT IN LOW-OXYGEN ENVIRONMENT
    Publication number: 20180068754
    Abstract: A system for reducing surface and embedded charge in a substrate includes a substrate support configured to support a substrate. A vacuum ultraviolet (VUV) assembly is arranged adjacent to the substrate and includes a housing and a VUV lamp that is connected to the housing and that generates and directs ultraviolet (UV) light at the substrate. A movement device is configured to move at least one of the VUV assembly and the substrate support during exposure of the substrate to the UV light to reduce surface and embedded charge in the substrate.
    Type: Application
    Filed: September 7, 2016
    Publication date: March 8, 2018
    Inventors: Rafal Dylewicz, Reinhold Schwazenbacher, Xia Man, Kenichi Sano, David Lou, Milan Pliska