Patents by Inventor Xiahong BAI

Xiahong BAI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Black matrix structure and manufacturing method therefor, display substrate, and display device
    Patent number: 11960164
    Abstract: Provided is a black matrix structure. The black matrix structure includes a plurality of black matrix strips that are intersected with each other, wherein a width the black matrix strip ranges from 2 to 2.5 microns, and a distance between any two adjacent black matrix strips in the plurality of black matrix strips ranges from 4 to 5 microns.
    Type: Grant
    Filed: June 8, 2021
    Date of Patent: April 16, 2024
    Assignees: ORDOS YUANSHENG OPTOELECTRONICS CO., LTD., BOE TECHNOLOGY GROUP CO., LTD.
    Inventors: Qiang Chen, Yezhou Fang, Gaofei Xia, Xiahong Bai
  • BLACK MATRIX STRUCTURE AND MANUFACTURING METHOD THEREFOR, DISPLAY SUBSTRATE, AND DISPLAY DEVICE
    Publication number: 20230333424
    Abstract: Provided is a black matrix structure. The black matrix structure includes a plurality of black matrix strips that are intersected with each other, wherein a width the black matrix strip ranges from 2 to 2.5 microns, and a distance between any two adjacent black matrix strips in the plurality of black matrix strips ranges from 4 to 5 microns.
    Type: Application
    Filed: June 8, 2021
    Publication date: October 19, 2023
    Applicants: Ordos Yuansheng Optoelectronics Co., Ltd., BOE Technology Group Co., Ltd.
    Inventors: Qiang CHEN, Yezhou FANG, Gaofei XIA, Xiahong BAI
  • Compensating method and system for cell assembly
    Patent number: 10539823
    Abstract: The present disclosure relates to compensating method for cell assembly. According to a deviation value of a key position of a measured array substrate, a compensation value of an exposure parameter of black matrix process of a color film substrate is calculated in real time by using historical measurement data of batches. The compensation value is fed back to a manufacturing apparatus in real time. The manufacturing apparatus corrects the key parameter of the apparatus timely according to the compensation value of the exposure parameter of the black matrix, to manufacture a color film substrate matching with the array substrate.
    Type: Grant
    Filed: August 15, 2017
    Date of Patent: January 21, 2020
    Assignees: BOE TECHNOLOGY GROUP CO., LTD., ORDOS YUANSHENG OPTOELECTRONICS CO., LTD.
    Inventors: Xiaohua Zhang, Xiahong Bai, Dong Yan, Hao Lei
  • COMPENSATING METHOD AND SYSTEM FOR CELL ASSEMBLY
    Publication number: 20180074366
    Abstract: The present disclosure relates to compensating method for cell assembly. According to a deviation value of a key position of a measured array substrate, a compensation value of an exposure parameter of black matrix process of a color film substrate is calculated in real time by using historical measurement data of batches. The compensation value is fed back to a manufacturing apparatus in real time. The manufacturing apparatus corrects the key parameter of the apparatus timely according to the compensation value of the exposure parameter of the black matrix, to manufacture a color film substrate matching with the array substrate.
    Type: Application
    Filed: August 15, 2017
    Publication date: March 15, 2018
    Inventors: Xiaohua ZHANG, Xiahong BAI, Dong YAN, Hao LEI