Patents by Inventor Xianbo Shi

Xianbo Shi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230258234
    Abstract: The present disclosure relates to a flexure mechanism that includes a plurality of thin material structures, each thin material structure including a weak-link portion and a separable constraint portion. The separable constraint portion is linked to the weak-link portion and configured to stabilize the weak-link portion. Additionally, the plurality of thin material structures are stacked and secured together to form a laminar structure.
    Type: Application
    Filed: February 16, 2022
    Publication date: August 17, 2023
    Inventors: Deming Shu, Steven P. Kearney, Jayson W. Anton, Ross J. Harder, Xianbo Shi, Tim M. Mooney, Lahsen Assoufid
  • Patent number: 11701077
    Abstract: Phase contrast and dark-field X-ray imaging enable imaging of objects that absorb or reflect very little X-ray light. Disclosed is a method and systems for performing coded-mask-based multi-contrast imaging (CMMI). The method includes providing radiation to a coded mask that has a known phase and absorption profile according to a pre-determined pattern. The radiation is then impingent upon a sample, and the radiation is detected to perform phase-reconstruction and image processing. The method and associated systems allow for the use of maximum-likelihood and machine learning methods for reconstruction images of the sample from the detected radiation.
    Type: Grant
    Filed: February 25, 2021
    Date of Patent: July 18, 2023
    Assignee: UCHICAGO ARGONNE, LLC
    Inventors: Xianbo Shi, Zhi Qiao, Michael J. Wojcik, Lahsen Assoufid
  • Publication number: 20220265231
    Abstract: Phase contrast and dark-field X-ray imaging enable imaging of objects that absorb or reflect very little X-ray light. Disclosed is a method and systems for performing coded-mask-based multi-contrast imaging (CMMI). The method includes providing radiation to a coded mask that has a known phase and absorption profile according to a pre-determined pattern. The radiation is then impingent upon a sample, and the radiation is detected to perform phase-reconstruction and image processing. The method and associated systems allow for the use of maximum-likelihood and machine learning methods for reconstruction images of the sample from the detected radiation.
    Type: Application
    Filed: February 25, 2021
    Publication date: August 25, 2022
    Inventors: Xianbo Shi, Zhi Qiao, Michael J. Wojcik, Lahsen Assoufid
  • Patent number: 11348703
    Abstract: Monochromators selectively transmit a narrow band of wavelengths of radiation from a broader band of wavelengths for use in a variety of applications and industries. Disclosed is a method and system for fixed-exit angle tunable monochromator. The system includes a first diffraction element configured to reflect an input beam incident on a surface of the first diffraction element. The input beam has an input beam vector and the first diffraction element is rotatable about the input beam vector. The system further includes a second diffraction element configured to reflect the beam as an output beam having a fixed beam exit angle. The beam is incident on a surface of the second diffraction element and the reflected beam has a reflected beam vector. The second diffraction element is rotatable about both the input beam vector and the reflected beam vector.
    Type: Grant
    Filed: September 16, 2020
    Date of Patent: May 31, 2022
    Assignee: UCHICAGO ARGONNE, LLC
    Inventors: Hawoong Hong, Jonathan Z. Tischler, Xianbo Shi
  • Publication number: 20220084711
    Abstract: Monochromators selectively transmit a narrow band of wavelengths of radiation from a broader band of wavelengths for use in a variety of applications and industries. Disclosed is a method and system for fixed-exit angle tunable monochromator. The system includes a first diffraction element configured to reflect an input beam incident on a surface of the first diffraction element. The input beam has an input beam vector and the first diffraction element is rotatable about the input beam vector. The system further includes a second diffraction element configured to reflect the beam as an output beam having a fixed beam exit angle. The beam is incident on a surface of the second diffraction element and the reflected beam has a reflected beam vector. The second diffraction element is rotatable about both the input beam vector and the reflected beam vector.
    Type: Application
    Filed: September 16, 2020
    Publication date: March 17, 2022
    Inventors: Hawoong Hong, Jonathan Z. Tischler, Xianbo Shi