Patents by Inventor Xianda Zhou

Xianda Zhou has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230283236
    Abstract: Provided is a weak-signal reading circuit for a sensor, comprising a sensing signal input amplifying unit and a signal reading unit. The sensing signal input amplifying unit comprises a first transistor, wherein a gate and a drain of the first transistor are connected with a sensor; the signal reading unit is connected to a source of the first transistor, the first transistor is turned on when the sensor generates a sensing signal, so that the sensing signal is captured by the signal reading unit. When the sensor senses a signal and generates a voltage, the first transistor tends to be switched on, then the signal reading unit reads the sensing signal through the first transistor which has been turned on, that is, by providing the first transistor, the weak-signal reading circuit for sensor can be self-driven according to the voltage generated by the sensor without an extra drive circuit, thereby achieving low power consumption.
    Type: Application
    Filed: August 26, 2020
    Publication date: September 7, 2023
    Inventors: Kai WANG, Huimin LI, Xianda ZHOU
  • Patent number: 9438227
    Abstract: The subject disclosure presents power semiconductor devices, and methods for manufacture thereof, with a low on-state voltage drop and a low turn-off energy. In an aspect, a power semiconductor device is provided that embodies a normally off trench gate-controlled p-i-n switch with a charge trapping material in the gate dielectric and a self-depleted channel.
    Type: Grant
    Filed: October 10, 2014
    Date of Patent: September 6, 2016
    Assignee: The Hong Kong University of Science and Technology
    Inventors: Johnny Kin On Sin, Xianda Zhou
  • Publication number: 20150155375
    Abstract: The subject disclosure presents power semiconductor devices, and methods for manufacture thereof, with a low on-state voltage drop and a low turn-off energy. In an aspect, a power semiconductor device is provided that embodies a normally off trench gate-controlled p-i-n switch with a charge trapping material in the gate dielectric and a self-depleted channel.
    Type: Application
    Filed: October 10, 2014
    Publication date: June 4, 2015
    Inventors: Johnny Kin On Sin, Xianda Zhou
  • Patent number: 8981460
    Abstract: The subject disclosure presents power semiconductor devices, and methods for manufacture thereof, with improved ruggedness and. In an aspect, the power semiconductor devices are power field effect transistors (FETs) having enhanced suppression of the activation of the parasitic bipolar junction transistor (BJT) and a normal threshold value. The devices comprise a doped source (14) of a first conductivity type, a doped body (15) of a second conductivity type, a source electrode (20) short-connecting the doped body and the doped source, a doped drift region (10) of the first conductivity type, a first layer (30) of a gate dielectric region (36) covering the surface of the doped drift region (10), and forming channel from the doped source (14) to the doped drift region (10), a second layer (31) of the gate dielectric region (36) over the first layer (30), a third layer (32) of the gate dielectric region (36) over the second layer (31), and a gate electrode (21) over the third layer (32).
    Type: Grant
    Filed: December 20, 2011
    Date of Patent: March 17, 2015
    Assignee: The Hong Kong University of Science and Technology
    Inventors: Johnny Kin On Sin, Xianda Zhou
  • Publication number: 20130256747
    Abstract: The subject disclosure presents power semiconductor devices, and methods for manufacture thereof, with improved ruggedness and. In an aspect, the power semiconductor devices are power field effect transistors (FETs) having enhanced suppression of the activation of the parasitic bipolar junction transistor (BJT) and a normal threshold value. The devices comprise a doped source (14) of a first conductivity type, a doped body (15) of a second conductivity type, a source electrode (20) short-connecting the doped body and the doped source, a doped drift region (10) of the first conductivity type, a first layer (30) of a gate dielectric region (36) covering the surface of the doped drift region (10), and forming channel from the doped source (14) to the doped drift region (10), a second layer (31) of the gate dielectric region (36) over the first layer (30), a third layer (32) of the gate dielectric region (36) over the second layer (31), and a gate electrode (21) over the third layer (32).
    Type: Application
    Filed: December 20, 2011
    Publication date: October 3, 2013
    Applicant: THE HONG KONG UNIVERSITY OF SCIENCE AND TECHNOLOGY
    Inventors: Johnny Kin On Sin, Xianda Zhou