Patents by Inventor Xianfeng QUE

Xianfeng QUE has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220157609
    Abstract: The present invention discloses a precise etching apparatus for preparing a recessed-gate enhancement device and an etching method for the same. The apparatus provided by the present invention includes an inductively-coupled plasma etching chamber, a current detection device, an inductive coil, a radio frequency source, a mechanical pump, and a molecular pump. The current detection device is connected with the inductively-coupled plasma etching chamber. The inductive coil is connected with the inductively-coupled plasma etching chamber. The radio frequency source is connected with the inductive coil. The mechanical pump and the molecular pump are connected with the inductively-coupled plasma etching chamber.
    Type: Application
    Filed: October 27, 2019
    Publication date: May 19, 2022
    Applicant: SOUTH CHINA UNIVERSITY OF TECHNOLOGY
    Inventors: Guoqiang LI, Peiye SUN, Zhikun LIU, Lijun WAN, Dingbo CHEN, Xianfeng QUE, Shunan YAO, Runze LI