Patents by Inventor Xiang-Xing Xu

Xiang-Xing Xu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11487369
    Abstract: A touch panel having dummy pattern is provided, including a first metal nanowire layer and a second metal nanowire layer. The first metal nanowire layer includes first electrode wires, first axial wires connected to the first electrode wires, and first dummy patterns. The second metal nanowire layer includes a plurality of second electrode wires and a plurality of second axial wires connected to the second electrode wires. The first dummy patterns are electrically insulated and deposited outside the first electrode wires and the first axial wires, and each of the first dummy patterns comprises a plurality of first etching areas extending along the first and second directions. The first dummy patterns do not expose the first etching areas along the first direction at a vertical projection area of a part where each of the second axial wires alone exists, so that the electrode pattern is difficult to observe.
    Type: Grant
    Filed: April 7, 2021
    Date of Patent: November 1, 2022
    Assignee: TPK Advanced Solutions Inc.
    Inventors: Qin-Xue Fang, Xiang-Xing Xu, Yong-Bin Ke, Yi-Peng Gan, Li-Huang Tsai
  • Publication number: 20210318768
    Abstract: A touch panel having dummy pattern is provided, including a first metal nanowire layer and a second metal nanowire layer. The first metal nanowire layer includes first electrode wires, first axial wires connected to the first electrode wires, and first dummy patterns. The second metal nanowire layer includes a plurality of second electrode wires and a plurality of second axial wires connected to the second electrode wires. The first dummy patterns are electrically insulated and deposited outside the first electrode wires and the first axial wires, and each of the first dummy patterns comprises a plurality of first etching areas extending along the first and second directions. The first dummy patterns do not expose the first etching areas along the first direction at a vertical projection area of a part where each of the second axial wires alone exists, so that the electrode pattern is difficult to observe.
    Type: Application
    Filed: April 7, 2021
    Publication date: October 14, 2021
    Inventors: Qin-Xue Fang, Xiang-Xing Xu, Yong-Bin Ke, Yi-Peng Gan, Li-Huang Tsai